Scott Falk

Person

Essex, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Highly etch selective amorphous carbon film
- Patent number 12,112,949
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Rajesh Prasad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Highly etch selective amorphous carbon film
- Patent number 12,014,927
- Issue date Jun 18, 2024
- Applied Materials, Inc.
- Rajesh Prasad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Techniques and apparatus for anisotropic stress compensation in sub...
- Patent number 11,875,995
- Issue date Jan 16, 2024
- Applied Materials, Inc.
- Scott Falk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and technique for profile modulation using high tilt angles
- Patent number 11,551,904
- Issue date Jan 10, 2023
- Applied Materials, Inc.
- Venkataramana R. Chavva
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Highly etch selective amorphous carbon film
- Patent number 11,469,107
- Issue date Oct 11, 2022
- Applied Materials, Inc.
- Rajesh Prasad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Techniques and apparatus for anisotropic stress compensation in sub...
- Patent number 11,201,057
- Issue date Dec 14, 2021
- Applied Materials, Inc.
- Scott Falk
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGHLY ETCH SELECTIVE AMORPHOUS CARBON FILM
- Publication number 20230041963
- Publication date Feb 9, 2023
- Applied Materials, Inc.
- Rajesh PRASAD
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGHLY ETCH SELECTIVE AMORPHOUS CARBON FILM
- Publication number 20230029929
- Publication date Feb 2, 2023
- Applied Materials, Inc.
- Rajesh PRASAD
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
System And Technique For Profile Modulation Using High Tilt Angles
- Publication number 20220076915
- Publication date Mar 10, 2022
- Applied Materials, Inc.
- Venkataramana R. Chavva
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES AND APPARATUS FOR ANISOTROPIC STRESS COMPENSATION IN SUB...
- Publication number 20220068648
- Publication date Mar 3, 2022
- Applied Materials, Inc.
- Scott Falk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGHLY ETCH SELECTIVE AMORPHOUS CARBON FILM
- Publication number 20200357640
- Publication date Nov 12, 2020
- Applied Materials, Inc.
- Rajesh PRASAD
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TECHNIQUES AND APPARATUS FOR ANISOTROPIC STRESS COMPENSATION IN SUB...
- Publication number 20200118822
- Publication date Apr 16, 2020
- Applied Materials, Inc.
- Scott Falk
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Highly etch selective amorphous carbon film

Highly etch selective amorphous carbon film

Techniques and apparatus for anisotropic stress compensation in sub...

System and technique for profile modulation using high tilt angles

Highly etch selective amorphous carbon film

Techniques and apparatus for anisotropic stress compensation in sub...

Patents Applicationslast 30 patents

HIGHLY ETCH SELECTIVE AMORPHOUS CARBON FILM

HIGHLY ETCH SELECTIVE AMORPHOUS CARBON FILM

System And Technique For Profile Modulation Using High Tilt Angles

TECHNIQUES AND APPARATUS FOR ANISOTROPIC STRESS COMPENSATION IN SUB...

HIGHLY ETCH SELECTIVE AMORPHOUS CARBON FILM

TECHNIQUES AND APPARATUS FOR ANISOTROPIC STRESS COMPENSATION IN SUB...