Scott Jeffery Stevenot

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Edge seal configurations for a lower electrode assembly
- Patent number 10,892,197
- Issue date Jan 12, 2021
- Lam Research Corporation
- Keith William Gaff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge seal for lower electrode assembly
- Patent number 10,090,211
- Issue date Oct 2, 2018
- Lam Research Corporation
- Keith William Gaff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatuses for controlling gas flow conductance in a c...
- Patent number 8,784,948
- Issue date Jul 22, 2014
- Lam Research Corporation
- Rajinder Dhindsa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Adjustable gap capacitively coupled RF plasma reactor including lat...
- Patent number 8,735,765
- Issue date May 27, 2014
- Lam Research Corporation
- James E. Tappan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable gap capacitively coupled RF plasma reactor including lat...
- Patent number 8,552,334
- Issue date Oct 8, 2013
- Lam Research Corporation
- James E. Tappan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatuses for controlling gas flow conductance in a c...
- Patent number 8,043,430
- Issue date Oct 25, 2011
- Lam Research Corporation
- Rajinder Dhindsa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Edge Seal Configurations For A Lower Electrode Assembly
- Publication number 20180366379
- Publication date Dec 20, 2018
- LAM RESEARCH CORPORATION
- Keith William Gaff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE SEAL FOR LOWER ELECTRODE ASSEMBLY
- Publication number 20150187614
- Publication date Jul 2, 2015
- LAM RESEARCH CORPORATION
- Keith William Gaff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE GAP CAPACITIVELY COUPLED RF PLASMA REACTOR INCLUDING LAT...
- Publication number 20130340938
- Publication date Dec 26, 2013
- LAM RESEARCH CORPORATION
- James E. Tappan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUSES FOR CONTROLLING GAS FLOW CONDUCTANCE IN A C...
- Publication number 20120028379
- Publication date Feb 2, 2012
- LAM RESEARCH CORPORATION
- Rajinder Dhindsa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ADJUSTABLE GAP CAPACITIVELY COUPLED RF PLASMA REACTOR INCLUDING LAT...
- Publication number 20090200268
- Publication date Aug 13, 2009
- LAM RESEARCH CORPORATION
- James E. Tappan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and apparatuses for controlling gas flow conductance in a c...
- Publication number 20080149596
- Publication date Jun 26, 2008
- LAM RESEARCH CORPORATION
- Rajinder Dhindsa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Scott Jeffery Stevenot

Person

Patents Grantslast 30 patents

Edge seal configurations for a lower electrode assembly

Edge seal for lower electrode assembly

Methods and apparatuses for controlling gas flow conductance in a c...

Adjustable gap capacitively coupled RF plasma reactor including lat...

Adjustable gap capacitively coupled RF plasma reactor including lat...

Methods and apparatuses for controlling gas flow conductance in a c...

Patents Applicationslast 30 patents

Edge Seal Configurations For A Lower Electrode Assembly

EDGE SEAL FOR LOWER ELECTRODE ASSEMBLY

ADJUSTABLE GAP CAPACITIVELY COUPLED RF PLASMA REACTOR INCLUDING LAT...

METHODS AND APPARATUSES FOR CONTROLLING GAS FLOW CONDUCTANCE IN A C...

ADJUSTABLE GAP CAPACITIVELY COUPLED RF PLASMA REACTOR INCLUDING LAT...

Methods and apparatuses for controlling gas flow conductance in a c...