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Scott M. Haight
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Portland, OR, US
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last 30 patents
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Patent Grant
Tin deposition
Patent number
7,314,543
Issue date
Jan 1, 2008
Intel Corporation
Ming Fang
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
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Patent Application
Method to modulate the surface roughness of a plated deposit and cr...
Publication number
20070158199
Publication date
Jul 12, 2007
Scott M. Haight
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Tin deposition
Publication number
20050077082
Publication date
Apr 14, 2005
Ming Fang
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR