Scott M. Mansfield

Person

Vestal, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of simultaneous lithography and etch correction flow
- Patent number 9,910,348
- Issue date Mar 6, 2018
- GLOBALFOUNDRIES Inc.
- Geng Han
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Predicting process fail limits
- Patent number 9,471,743
- Issue date Oct 18, 2016
- GLOBALFOUNDRIES Inc.
- Geng Han
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Patterning assist feature to mitigate reactive ion etch microloadin...
- Patent number 9,252,022
- Issue date Feb 2, 2016
- GLOBALFOUNDRIES Inc.
- Daniel J. Dechene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern improvement in multiprocess patterning
- Patent number 9,087,739
- Issue date Jul 21, 2015
- International Business Machines Corporation
- Derren N. Dunn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern improvement in multiprocess patterning
- Patent number 9,034,562
- Issue date May 19, 2015
- International Business Machines Corporation
- Derren Neylon Dunn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Decomposition with multiple exposures in a process window based OPC...
- Patent number 8,392,871
- Issue date Mar 5, 2013
- International Business Machines Corporation
- Scott M. Mansfield
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Generating cut mask for double-patterning process
- Patent number 8,365,108
- Issue date Jan 29, 2013
- International Business Machines Corporation
- Zachary Baum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayer OPC for design aware manufacturing
- Patent number 8,214,770
- Issue date Jul 3, 2012
- International Business Machines Corporation
- Maharaj Mukherjee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calibration of lithographic process models
- Patent number 8,174,681
- Issue date May 8, 2012
- International Business Machines Corporation
- Ioana Graur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask design verification
- Patent number 8,166,423
- Issue date Apr 24, 2012
- International Business Machines Corporation
- Scott M. Mansfield
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fast and accurate method to simulate intermediate range flare effects
- Patent number 8,161,422
- Issue date Apr 17, 2012
- International Business Machines Corporation
- Maharaj Mukherjee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Short path customized mask correction
- Patent number 8,108,804
- Issue date Jan 31, 2012
- International Business Machines Corporation
- Ioana Graur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated circuits and methods of design and manufacture thereof
- Patent number 8,039,203
- Issue date Oct 18, 2011
- Infineon Technologies AG
- Helen Wang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Mask and method for patterning a semiconductor wafer
- Patent number 7,945,869
- Issue date May 17, 2011
- Infineon Technologies AG
- Henning Haffner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Test pattern based process model calibration
- Patent number 7,895,547
- Issue date Feb 22, 2011
- International Business Machines Corporation
- Scott M Mansfield
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to check model accuracy during wafer patterning simulation
- Patent number 7,765,021
- Issue date Jul 27, 2010
- International Business Machines Corporation
- Scott M. Mansfield
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Local coloring for hierarchical OPC
- Patent number 7,650,587
- Issue date Jan 19, 2010
- International Business Machines Corporation
- Zachary Baum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for separating optical and resist effects in process models
- Patent number 7,642,020
- Issue date Jan 5, 2010
- International Business Machines Corporation
- Geng Han
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Designer's intent tolerance bands for proximity correction and chec...
- Patent number 7,607,114
- Issue date Oct 20, 2009
- International Business Machines Corporation
- Scott M. Mansfield
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Verifying mask layout printability using simulation with adjustable...
- Patent number 7,565,633
- Issue date Jul 21, 2009
- International Business Machines Corporation
- Maharaj Mukherjee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayer OPC for design aware manufacturing
- Patent number 7,503,028
- Issue date Mar 10, 2009
- International Business Machines Corporation
- Maharaj Mukherjee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for improving optical proximity correction
- Patent number 7,350,183
- Issue date Mar 25, 2008
- International Business Machines Corporation
- Yuping Cui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical proximity correction using progressively smoothed mask shapes
- Patent number 7,343,582
- Issue date Mar 11, 2008
- International Business Machines Corporation
- Maharaj Mukherjee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Designer's intent tolerance bands for proximity correction and chec...
- Patent number 7,266,798
- Issue date Sep 4, 2007
- International Business Machines Corporation
- Scott M. Mansfield
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method of smoothing mask shapes for improved placement o...
- Patent number 7,261,981
- Issue date Aug 28, 2007
- International Business Machines Corporation
- Mark A. Lavin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Precision and apertures for lithographic systems
- Patent number 7,029,830
- Issue date Apr 18, 2006
- International Business Machines Corporation
- Steven Alan Cordes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for generating a proximity model based on proximity rules
- Patent number 6,602,728
- Issue date Aug 5, 2003
- International Business Machines Corporation
- Lars W. Liebmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to determine optical proximity correction and assist feature...
- Patent number 6,553,559
- Issue date Apr 22, 2003
- International Business Machines Corporation
- Lars W. Liebmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for lithographically printing tightly nested a...
- Patent number 6,541,166
- Issue date Apr 1, 2003
- International Business Machines Corporation
- Scott M. Mansfield
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Intelligent photomask disposition
- Patent number 6,526,164
- Issue date Feb 25, 2003
- International Business Machines Corporation
- Scott Marshall Mansfield
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF SIMULTANEOUS LITHOGRAPHY AND ETCH CORRECTION FLOW
- Publication number 20170004233
- Publication date Jan 5, 2017
- GLOBALFOUNDRIES INC.
- Geng Han
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PREDICTING PROCESS FAIL LIMITS
- Publication number 20160292342
- Publication date Oct 6, 2016
- International Business Machines Corporation
- Geng Han
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Pattern Improvement in Multiprocess Patterning
- Publication number 20140162380
- Publication date Jun 12, 2014
- International Business Machines Corporation
- Derren Neylon Dunn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GENERATING CUT MASK FOR DOUBLE-PATTERNING PROCESS
- Publication number 20120180006
- Publication date Jul 12, 2012
- International Business Machines Corporation
- Zachary Baum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DECOMPOSITION WITH MULTIPLE EXPOSURES IN A PROCESS WINDOW BASED OPC...
- Publication number 20110271238
- Publication date Nov 3, 2011
- International Business Machines Corporation
- Scott M. Mansfield
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern Improvement in Multiprocess Patterning
- Publication number 20110091815
- Publication date Apr 21, 2011
- International Business Machines Corporation
- Derren N. Dunn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK DESIGN VERIFICATION
- Publication number 20110061030
- Publication date Mar 10, 2011
- International Business Machines Corporation
- Scott M. Mansfield
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SHORT PATH CUSTOMIZED MASK CORRECTION
- Publication number 20100185999
- Publication date Jul 22, 2010
- International Business Machines Corporation
- Ioana Graur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CALIBRATION OF LITHOGRAPHIC PROCESS MODELS
- Publication number 20100171031
- Publication date Jul 8, 2010
- International Business Machines Corporation
- Ioana Graur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FAST AND ACCURATE METHOD TO SIMULATE INTERMEDIATE RANGE FLARE EFFECTS
- Publication number 20100175043
- Publication date Jul 8, 2010
- International Business Machines Corporation
- Maharaj Mukherjee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Test Pattern Based Process Model Calibration
- Publication number 20090276736
- Publication date Nov 5, 2009
- International Business Machines Corporation
- Scott M. Mansfield
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO CHECK MODEL ACCURACY DURING WAFER PATTERNING SIMULATION
- Publication number 20090182448
- Publication date Jul 16, 2009
- International Business Machines Corporation
- Scott M. Mansfield
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTILAYER OPC FOR DESIGN AWARE MANUFACTURING
- Publication number 20090125868
- Publication date May 14, 2009
- International Business Machines Corporation
- Maharaj Mukherjee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Integrated Circuits and Methods of Design and Manufacture Thereof
- Publication number 20090081563
- Publication date Mar 26, 2009
- Helen Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask and Method for Patterning a Semiconductor Wafer
- Publication number 20090053654
- Publication date Feb 26, 2009
- Henning Haffner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VERIFYING MASK LAYOUT PRINTABILITY USING SIMULATION WITH ADJUSTABLE...
- Publication number 20080163153
- Publication date Jul 3, 2008
- International Business Machines Corporation
- Maharaj Mukherjee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LOCAL COLORING FOR HIERARCHICAL OPC
- Publication number 20080134130
- Publication date Jun 5, 2008
- International Business Machines Corporation
- Zachary Baum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLOSED-LOOP DESIGN FOR MANUFACTURABILITY PROCESS
- Publication number 20080127029
- Publication date May 29, 2008
- International Business Machines Corporation
- Ioana Graur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR SEPARATING OPTICAL AND RESIST EFFECTS IN PROCESS MODELS
- Publication number 20080044748
- Publication date Feb 21, 2008
- International Business Machines Corporation
- Geng Han
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DESIGNER'S INTENT TOLERANCE BANDS FOR PROXIMITY CORRECTION AND CHEC...
- Publication number 20070261013
- Publication date Nov 8, 2007
- International Business Machines Corporation
- Scott M. Mansfield
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Multilayer OPC for Design Aware Manufacturing
- Publication number 20070220476
- Publication date Sep 20, 2007
- International Business Machines Corporation
- Maharaj Mukherjee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DESIGNER'S INTENT TOLERANCE BANDS FOR PROXIMITY CORRECTION AND CHEC...
- Publication number 20070083847
- Publication date Apr 12, 2007
- International Business Machines Corporation
- Scott M. Mansfield
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Optical proximity correction using progressively smoothed mask shapes
- Publication number 20060271905
- Publication date Nov 30, 2006
- International Business Machines Corporation
- Maharaj Mukherjee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR IMPROVING OPTICAL PROXIMITY CORRECTION
- Publication number 20060101370
- Publication date May 11, 2006
- International Business Machines Corporation
- Yuping Cui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZED PLACEMENT OF SUB-RESOLUTION ASSIST FEATURES WITHIN TWO-DI...
- Publication number 20050202326
- Publication date Sep 15, 2005
- International Business Machines Corporation
- Ronald L. Gordon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD OF SMOOTHING MASK SHAPES FOR IMPROVED PLACEMENT O...
- Publication number 20050153212
- Publication date Jul 14, 2005
- International Business Machines Corporation
- Mark A. Lavin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Precision and apertures for lithographic systems
- Publication number 20030049569
- Publication date Mar 13, 2003
- Steven Alan Cordes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for lithographically printing tightly nested a...
- Publication number 20020094482
- Publication date Jul 18, 2002
- Scott M. Mansfield
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method to determine optical proximity correction and assist feature...
- Publication number 20020091985
- Publication date Jul 11, 2002
- Lars W. Liebmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Scott M. Mansfield

Person

Patents Grantslast 30 patents

Method of simultaneous lithography and etch correction flow

Predicting process fail limits

Patterning assist feature to mitigate reactive ion etch microloadin...

Pattern improvement in multiprocess patterning

Pattern improvement in multiprocess patterning

Decomposition with multiple exposures in a process window based OPC...

Generating cut mask for double-patterning process

Multilayer OPC for design aware manufacturing

Calibration of lithographic process models

Photomask design verification

Fast and accurate method to simulate intermediate range flare effects

Short path customized mask correction

Integrated circuits and methods of design and manufacture thereof

Mask and method for patterning a semiconductor wafer

Test pattern based process model calibration

Method to check model accuracy during wafer patterning simulation

Local coloring for hierarchical OPC

Method for separating optical and resist effects in process models

Designer's intent tolerance bands for proximity correction and chec...

Verifying mask layout printability using simulation with adjustable...

Multilayer OPC for design aware manufacturing

Method for improving optical proximity correction

Optical proximity correction using progressively smoothed mask shapes

Designer's intent tolerance bands for proximity correction and chec...

System and method of smoothing mask shapes for improved placement o...

Precision and apertures for lithographic systems

Method for generating a proximity model based on proximity rules

Method to determine optical proximity correction and assist feature...

Method and apparatus for lithographically printing tightly nested a...

Intelligent photomask disposition

Patents Applicationslast 30 patents

METHOD OF SIMULTANEOUS LITHOGRAPHY AND ETCH CORRECTION FLOW

PREDICTING PROCESS FAIL LIMITS

Pattern Improvement in Multiprocess Patterning

GENERATING CUT MASK FOR DOUBLE-PATTERNING PROCESS

DECOMPOSITION WITH MULTIPLE EXPOSURES IN A PROCESS WINDOW BASED OPC...

Pattern Improvement in Multiprocess Patterning

PHOTOMASK DESIGN VERIFICATION

SHORT PATH CUSTOMIZED MASK CORRECTION

CALIBRATION OF LITHOGRAPHIC PROCESS MODELS

FAST AND ACCURATE METHOD TO SIMULATE INTERMEDIATE RANGE FLARE EFFECTS

Test Pattern Based Process Model Calibration

METHOD TO CHECK MODEL ACCURACY DURING WAFER PATTERNING SIMULATION

MULTILAYER OPC FOR DESIGN AWARE MANUFACTURING

Integrated Circuits and Methods of Design and Manufacture Thereof

Mask and Method for Patterning a Semiconductor Wafer

VERIFYING MASK LAYOUT PRINTABILITY USING SIMULATION WITH ADJUSTABLE...

LOCAL COLORING FOR HIERARCHICAL OPC

CLOSED-LOOP DESIGN FOR MANUFACTURABILITY PROCESS

METHOD FOR SEPARATING OPTICAL AND RESIST EFFECTS IN PROCESS MODELS

DESIGNER'S INTENT TOLERANCE BANDS FOR PROXIMITY CORRECTION AND CHEC...

Multilayer OPC for Design Aware Manufacturing

DESIGNER'S INTENT TOLERANCE BANDS FOR PROXIMITY CORRECTION AND CHEC...

Optical proximity correction using progressively smoothed mask shapes

METHOD FOR IMPROVING OPTICAL PROXIMITY CORRECTION

OPTIMIZED PLACEMENT OF SUB-RESOLUTION ASSIST FEATURES WITHIN TWO-DI...

SYSTEM AND METHOD OF SMOOTHING MASK SHAPES FOR IMPROVED PLACEMENT O...

Precision and apertures for lithographic systems

Method and apparatus for lithographically printing tightly nested a...

Method to determine optical proximity correction and assist feature...