Scott S. Halle

Person

Slingerlands, FL, US

People

Patents Grantslast 30 patents

Information Patent Grant
Predictive multi-stage modelling for complex process control
- Patent number 11,568,101
- Issue date Jan 31, 2023
- International Business Machines Corporation
- Scott Halle
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Secure wafer inspection and identification
- Patent number 11,079,337
- Issue date Aug 3, 2021
- International Business Machines Corporation
- Fee Li Lie
- G01 - MEASURING TESTING
Information Patent Grant
Baseline overlay control with residual noise reduction
- Patent number 10,642,161
- Issue date May 5, 2020
- International Business Machines Corporation
- Daniel A. Corliss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Care area generation by detection optimized methodology
- Patent number 10,437,951
- Issue date Oct 8, 2019
- International Business Machines Corporation
- Ravi K. Bonam
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process-metrology reproducibility bands for lithographic photomasks
- Patent number 10,210,292
- Issue date Feb 19, 2019
- International Business Machines Corporation
- Todd C. Bailey
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Resist having tuned interface hardmask layer for EUV exposure
- Patent number 10,141,188
- Issue date Nov 27, 2018
- International Business Machines Corporation
- Michael P Belyansky
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Resist having tuned interface hardmask layer for EUV exposure
- Patent number 10,134,592
- Issue date Nov 20, 2018
- International Business Machines Corporation
- Michael P Belyansky
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Process-metrology reproducibility bands for lithographic photomasks
- Patent number 9,928,316
- Issue date Mar 27, 2018
- International Business Machines Corporation
- Todd C. Bailey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist having tuned interface hardmask layer for EUV exposure
- Patent number 9,929,012
- Issue date Mar 27, 2018
- International Business Machines Corporation
- Michael P Belyansky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology marks for bidirectional grating superposition patterning...
- Patent number 9,257,351
- Issue date Feb 9, 2016
- GLOBALFOUNDRIES Inc.
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology marks for unidirectional grating superposition patterning...
- Patent number 9,059,102
- Issue date Jun 16, 2015
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask layout formation
- Patent number 8,875,063
- Issue date Oct 28, 2014
- International Business Machines Corporation
- Zachary Baum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process of making a lithographic structure using antireflective mat...
- Patent number 8,609,322
- Issue date Dec 17, 2013
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of forming a semiconductor device having a cut-way hole to e...
- Patent number 8,507,346
- Issue date Aug 13, 2013
- International Business Machines Corporation
- Martin Burkhardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process of making a lithographic structure using antireflective mat...
- Patent number 8,293,454
- Issue date Oct 23, 2012
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods for forming a composite pattern including printed resolutio...
- Patent number 8,158,334
- Issue date Apr 17, 2012
- International Business Machines Corporation
- Allen H. Gabor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresists and methods for optical proximity correction
- Patent number 8,053,172
- Issue date Nov 8, 2011
- International Business Machines Corporation
- Scott David Halle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated circuits and methods of design and manufacture thereof
- Patent number 8,039,203
- Issue date Oct 18, 2011
- Infineon Technologies AG
- Helen Wang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Line ends forming
- Patent number 7,993,815
- Issue date Aug 9, 2011
- International Business Machines Corporation
- Matthew E. Colburn
- G11 - INFORMATION STORAGE
Information Patent Grant
Process of making a semiconductor device using multiple antireflect...
- Patent number 7,968,270
- Issue date Jun 28, 2011
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple exposure lithography method incorporating intermediate lay...
- Patent number 7,914,975
- Issue date Mar 29, 2011
- International Business Machines Corporation
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing methods
- Patent number 7,759,235
- Issue date Jul 20, 2010
- Infineon Technologies AG
- Haoren Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate patterning scheme with self aligned independent gate etch
- Patent number 7,749,903
- Issue date Jul 6, 2010
- International Business Machines Corporation
- Scott D. Halle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process of making a semiconductor device using multiple antireflect...
- Patent number 7,485,573
- Issue date Feb 3, 2009
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Highly selective nitride etching employing surface mediated uniform...
- Patent number 7,268,082
- Issue date Sep 11, 2007
- International Business Machines Corporation
- Scott D. Halle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to reduce photoresist pattern collapse by controlled surface...
- Patent number 7,229,936
- Issue date Jun 12, 2007
- International Business Machines Corporation
- Colin J. Brodsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch selectivity enhancement for tunable etch resistant anti-reflec...
- Patent number 7,077,903
- Issue date Jul 18, 2006
- International Business Machines Corporation
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extendible process for improved top oxide layer for DRAM array and...
- Patent number 6,794,242
- Issue date Sep 21, 2004
- Infineon Technologies AG
- Thomas W. Dyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for forming a damascene structure
- Patent number 6,649,531
- Issue date Nov 18, 2003
- International Business Machines Corporation
- William J. Cote
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Removable inorganic anti-reflection coating process
- Patent number 6,607,984
- Issue date Aug 19, 2003
- International Business Machines Corporation
- Gill Yong Lee
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ENABLING DEVICE SECURITY BY DESIGN ENUMERATION SELECTIVE TARGETING
- Publication number 20230177218
- Publication date Jun 8, 2023
- International Business Machines Corporation
- Scott David Halle
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SECURE FINGERPRINTING OF A TRUSTED PHOTOMASK
- Publication number 20230116390
- Publication date Apr 13, 2023
- International Business Machines Corporation
- Scott David HALLE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Predictive Multi-Stage Modelling for Complex Process Control
- Publication number 20210049241
- Publication date Feb 18, 2021
- International Business Machines Corporation
- Scott Halle
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Process Optimization by Clamped Monte Carlo Distribution
- Publication number 20210049242
- Publication date Feb 18, 2021
- International Business Machines Corporation
- Scott Halle
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
BASELINE OVERLAY CONTROL WITH RESIDUAL NOISE REDUCTION
- Publication number 20200117100
- Publication date Apr 16, 2020
- International Business Machines Corporation
- Daniel A. Corliss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Care Area Generation By Detection Optimized Methodology
- Publication number 20190065634
- Publication date Feb 28, 2019
- International Business Machines Corporation
- Ravi K. Bonam
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Resist Having Tuned Interface Hardmask Layer For EUV Exposure
- Publication number 20180166277
- Publication date Jun 14, 2018
- International Business Machines Corporation
- Michael P. Belyansky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Resist Having Tuned Interface Hardmask Layer For EUV Exposure
- Publication number 20180166278
- Publication date Jun 14, 2018
- International Business Machines Corporation
- Michael P. Belyansky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS-METROLOGY REPRODUCIBILITY BANDS FOR LITHOGRAPHIC PHOTOMASKS
- Publication number 20180101630
- Publication date Apr 12, 2018
- International Business Machines Corporation
- Todd C. Bailey
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROCESS-METROLOGY REPRODUCIBILITY BANDS FOR LITHOGRAPHIC PHOTOMASKS
- Publication number 20160283617
- Publication date Sep 29, 2016
- International Business Machines Corporation
- Todd C. Bailey
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY MARKS FOR BIDIRECTIONAL GRATING SUPERPOSITION PATTERNING...
- Publication number 20150050755
- Publication date Feb 19, 2015
- International Business Machines Corporation
- Christopher P. Ausschnitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY MARKS FOR UNIDIRECTIONAL GRATING SUPERPOSITION PATTERNING...
- Publication number 20150048525
- Publication date Feb 19, 2015
- International Business Machines Corporation
- Christopher P. Ausschnitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER FILL PATTERNS AND USES
- Publication number 20130181267
- Publication date Jul 18, 2013
- International Business Machines Corporation
- Martin Burkhardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS OF MAKING A LITHOGRAPHIC STRUCTURE USING ANTIREFLECTIVE MAT...
- Publication number 20130017486
- Publication date Jan 17, 2013
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
WAFER FILL PATTERNS AND USES
- Publication number 20120126294
- Publication date May 24, 2012
- International Business Machines Corporation
- Martin Burkhardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK LAYOUT FORMATION
- Publication number 20120089953
- Publication date Apr 12, 2012
- INFINEON TECHNOLOGIES NORTH AMERICA CORPORATION
- Zachary Baum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESISTS AND METHODS FOR OPTICAL PROXIMITY CORRECTION
- Publication number 20090214981
- Publication date Aug 27, 2009
- International Business Machines Corporation
- Scott David Halle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GATE PATTERNING SCHEME WITH SELF ALIGNED INDEPENDENT GATE ETCH
- Publication number 20090203200
- Publication date Aug 13, 2009
- International Business Machines Corporation
- Scott D. Halle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING A COMPOSITE PATTERN INCLUDING PRINTED RESOLUTIO...
- Publication number 20090181330
- Publication date Jul 16, 2009
- International Business Machines Corporation
- Allen H. Gabor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Integrated Circuits and Methods of Design and Manufacture Thereof
- Publication number 20090081563
- Publication date Mar 26, 2009
- Helen Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEMORY CELL
- Publication number 20090065956
- Publication date Mar 12, 2009
- International Business Machines Corporation
- Matthew E. Colburn
- G11 - INFORMATION STORAGE
Information Patent Application
LINE ENDS FORMING
- Publication number 20090068837
- Publication date Mar 12, 2009
- International Business Machines Corporation
- Matthew E. Colburn
- G11 - INFORMATION STORAGE
Information Patent Application
PROCESS OF MAKING A LITHOGRAPHIC STRUCTURE USING ANTIREFLECTIVE MAT...
- Publication number 20090061355
- Publication date Mar 5, 2009
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS OF MAKING A SEMICONDUCTOR DEVICE USING MULTIPLE ANTIREFLECT...
- Publication number 20080311508
- Publication date Dec 18, 2008
- INTERNATION BUSINESS MACHINES CORPORATION
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor device manufacturing methods
- Publication number 20080305623
- Publication date Dec 11, 2008
- Haoren Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE EXPOSURE LITHOGRAPHY METHOD INCORPORATING INTERMEDIATE LAY...
- Publication number 20080254633
- Publication date Oct 16, 2008
- International Business Machines Corporation
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process of making a semiconductor device using multiple antireflect...
- Publication number 20070196748
- Publication date Aug 23, 2007
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process of making a lithographic structure using antireflective mat...
- Publication number 20070015082
- Publication date Jan 18, 2007
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Highly selective nitride etching employing surface mediated uniform...
- Publication number 20050245155
- Publication date Nov 3, 2005
- Scott D. Halle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO REDUCE PHOTORESIST PATTERN COLLAPSE BY CONTROLLED SURFACE...
- Publication number 20050245094
- Publication date Nov 3, 2005
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Scott S. Halle

Person

Patents Grantslast 30 patents

Predictive multi-stage modelling for complex process control

Secure wafer inspection and identification

Baseline overlay control with residual noise reduction

Care area generation by detection optimized methodology

Process-metrology reproducibility bands for lithographic photomasks

Resist having tuned interface hardmask layer for EUV exposure

Resist having tuned interface hardmask layer for EUV exposure

Process-metrology reproducibility bands for lithographic photomasks

Resist having tuned interface hardmask layer for EUV exposure

Metrology marks for bidirectional grating superposition patterning...

Metrology marks for unidirectional grating superposition patterning...

Mask layout formation

Process of making a lithographic structure using antireflective mat...

Method of forming a semiconductor device having a cut-way hole to e...

Process of making a lithographic structure using antireflective mat...

Methods for forming a composite pattern including printed resolutio...

Photoresists and methods for optical proximity correction

Integrated circuits and methods of design and manufacture thereof

Line ends forming

Process of making a semiconductor device using multiple antireflect...

Multiple exposure lithography method incorporating intermediate lay...

Semiconductor device manufacturing methods

Gate patterning scheme with self aligned independent gate etch

Process of making a semiconductor device using multiple antireflect...

Highly selective nitride etching employing surface mediated uniform...

Method to reduce photoresist pattern collapse by controlled surface...

Etch selectivity enhancement for tunable etch resistant anti-reflec...

Extendible process for improved top oxide layer for DRAM array and...

Process for forming a damascene structure

Removable inorganic anti-reflection coating process

Patents Applicationslast 30 patents

ENABLING DEVICE SECURITY BY DESIGN ENUMERATION SELECTIVE TARGETING

SECURE FINGERPRINTING OF A TRUSTED PHOTOMASK

Predictive Multi-Stage Modelling for Complex Process Control

Process Optimization by Clamped Monte Carlo Distribution

BASELINE OVERLAY CONTROL WITH RESIDUAL NOISE REDUCTION

Care Area Generation By Detection Optimized Methodology

Resist Having Tuned Interface Hardmask Layer For EUV Exposure

Resist Having Tuned Interface Hardmask Layer For EUV Exposure

PROCESS-METROLOGY REPRODUCIBILITY BANDS FOR LITHOGRAPHIC PHOTOMASKS

PROCESS-METROLOGY REPRODUCIBILITY BANDS FOR LITHOGRAPHIC PHOTOMASKS

METROLOGY MARKS FOR BIDIRECTIONAL GRATING SUPERPOSITION PATTERNING...

METROLOGY MARKS FOR UNIDIRECTIONAL GRATING SUPERPOSITION PATTERNING...

WAFER FILL PATTERNS AND USES

PROCESS OF MAKING A LITHOGRAPHIC STRUCTURE USING ANTIREFLECTIVE MAT...

WAFER FILL PATTERNS AND USES

MASK LAYOUT FORMATION

PHOTORESISTS AND METHODS FOR OPTICAL PROXIMITY CORRECTION

GATE PATTERNING SCHEME WITH SELF ALIGNED INDEPENDENT GATE ETCH

METHODS FOR FORMING A COMPOSITE PATTERN INCLUDING PRINTED RESOLUTIO...

Integrated Circuits and Methods of Design and Manufacture Thereof

MEMORY CELL

LINE ENDS FORMING

PROCESS OF MAKING A LITHOGRAPHIC STRUCTURE USING ANTIREFLECTIVE MAT...

PROCESS OF MAKING A SEMICONDUCTOR DEVICE USING MULTIPLE ANTIREFLECT...

Semiconductor device manufacturing methods

MULTIPLE EXPOSURE LITHOGRAPHY METHOD INCORPORATING INTERMEDIATE LAY...

Process of making a semiconductor device using multiple antireflect...

Process of making a lithographic structure using antireflective mat...

Highly selective nitride etching employing surface mediated uniform...

METHOD TO REDUCE PHOTORESIST PATTERN COLLAPSE BY CONTROLLED SURFACE...