Se-Hyuk Im

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chuck assembly, planarization process, apparatus and method of manu...
- Patent number 11,728,203
- Issue date Aug 15, 2023
- Canon Kabushiki Kaisha
- Seth J. Bamesberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planarization apparatus, planarization process, and method of manuf...
- Patent number 11,562,924
- Issue date Jan 24, 2023
- Canon Kabushiki Kaisha
- Seth J. Bamesberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for improving the performance of a nanoimprint sy...
- Patent number 11,249,405
- Issue date Feb 15, 2022
- Canon Kabushiki Kaisha
- Byung-Jin Choi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Planarization process, apparatus and method of manufacturing an art...
- Patent number 11,145,535
- Issue date Oct 12, 2021
- Canon Kabushiki Kaisha
- Byung-Jin Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Safe separation for nano imprinting
- Patent number 11,020,894
- Issue date Jun 1, 2021
- Molecular Imprints, Inc.
- Se-Hyuk Im
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Drop pattern generation for imprint lithography with directionally-...
- Patent number 9,651,862
- Issue date May 16, 2017
- Canon Nanotechnologies, Inc.
- Edward Brian Fletcher
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Safe separation for nano imprinting
- Patent number 8,968,620
- Issue date Mar 3, 2015
- Canon Nanotechnologies, Inc.
- Se-Hyuk Im
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
NANOFABRICATION METHOD WITH CORRECTION OF DISTORTION WITHIN AN IMPR...
- Publication number 20240066786
- Publication date Feb 29, 2024
- Canon Kabushiki Kaisha
- Se-Hyuk Im
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHUCK ASSEMBLY, PLANARIZATION PROCESS, APPARATUS AND METHOD OF MANU...
- Publication number 20230335428
- Publication date Oct 19, 2023
- Canon Kabushiki Kaisha
- SETH J. BAMESBERGER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLANARIZATION APPARATUS, PLANARIZATION PROCESS, AND METHOD OF MANUF...
- Publication number 20230061361
- Publication date Mar 2, 2023
- Canon Kabushiki Kaisha
- Seth J. Bamesberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHUCK ASSEMBLY, PLANARIZATION PROCESS, APPARATUS AND METHOD OF MANU...
- Publication number 20220115259
- Publication date Apr 14, 2022
- Canon Kabushiki Kaisha
- SETH J. BAMESBERGER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLANARIZATION APPARATUS, PLANARIZATION PROCESS, AND METHOD OF MANUF...
- Publication number 20210242073
- Publication date Aug 5, 2021
- Canon Kabushiki Kaisha
- Seth J. Bamesberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLANARIZATION PROCESS, APPARATUS AND METHOD OF MANUFACTURING AN ART...
- Publication number 20210050245
- Publication date Feb 18, 2021
- Canon Kabushiki Kaisha
- Byung-Jin Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Improving the Performance of a Nanoimprint Sy...
- Publication number 20190332021
- Publication date Oct 31, 2019
- Canon Kabushiki Kaisha
- Byung-Jin Choi
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Safe Separation for Nano Imprinting
- Publication number 20190061228
- Publication date Feb 28, 2019
- Molecular Imprints, Inc.
- Se-Hyuk Im
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
SAFE SEPARATION FOR NANO IMPRINTING
- Publication number 20150165671
- Publication date Jun 18, 2015
- Canon Nanotechnologies, Inc.
- Se-Hyuk Im
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
DROP PATTERN GENERATION FOR IMPRINT LITHOGRAPHY WITH DIRECTIONALLY-...
- Publication number 20150017329
- Publication date Jan 15, 2015
- TOSHIBA CORPORATION
- Edward Brian Fletcher
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
- Publication number 20150014877
- Publication date Jan 15, 2015
- Canon Kabushiki Kaisha
- Keiji Yamashita
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
- Publication number 20150014876
- Publication date Jan 15, 2015
- Canon Kabushiki Kaisha
- Keiji Yamashita
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
SAFE DEPARATION FOR NANO IMPRINTING
- Publication number 20110260361
- Publication date Oct 27, 2011
- Molecular Imprints, Inc.
- Se-Hyuk Im
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Person

Patents Grantslast 30 patents

Chuck assembly, planarization process, apparatus and method of manu...

Planarization apparatus, planarization process, and method of manuf...

System and method for improving the performance of a nanoimprint sy...

Planarization process, apparatus and method of manufacturing an art...

Safe separation for nano imprinting

Drop pattern generation for imprint lithography with directionally-...

Safe separation for nano imprinting

Patents Applicationslast 30 patents

NANOFABRICATION METHOD WITH CORRECTION OF DISTORTION WITHIN AN IMPR...

CHUCK ASSEMBLY, PLANARIZATION PROCESS, APPARATUS AND METHOD OF MANU...

PLANARIZATION APPARATUS, PLANARIZATION PROCESS, AND METHOD OF MANUF...

CHUCK ASSEMBLY, PLANARIZATION PROCESS, APPARATUS AND METHOD OF MANU...

PLANARIZATION APPARATUS, PLANARIZATION PROCESS, AND METHOD OF MANUF...

PLANARIZATION PROCESS, APPARATUS AND METHOD OF MANUFACTURING AN ART...

System and Method for Improving the Performance of a Nanoimprint Sy...

Safe Separation for Nano Imprinting

SAFE SEPARATION FOR NANO IMPRINTING

DROP PATTERN GENERATION FOR IMPRINT LITHOGRAPHY WITH DIRECTIONALLY-...

IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD

IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD

SAFE DEPARATION FOR NANO IMPRINTING