Sean Michael Pursel

Person

Hillsboro, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Contact over active gate structures using directed self-assembly fo...
- Patent number 12,237,223
- Issue date Feb 25, 2025
- Intel Corporation
- Paul A. Nyhus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate spacing in integrated circuit structures
- Patent number 12,002,678
- Issue date Jun 4, 2024
- Intel Corporation
- Charles Henry Wallace
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INTEGRATED CIRCUIT STRUCTURES HAVING FIN ISOLATION REGIONS BOUND BY...
- Publication number 20250227960
- Publication date Jul 10, 2025
- Intel Corporation
- Leonard P. GULER
Information Patent Application
INTEGRATED CIRCUIT STRUCTURE WITH FRONT-SIDE-GUIDED BACKSIDE SOURCE...
- Publication number 20250228008
- Publication date Jul 10, 2025
- Intel Corporation
- Leonard P. GULER
Information Patent Application
INTEGRATED CIRCUIT STRUCTURE WITH FRONT-SIDE-GUIDED BACKSIDE SOURCE...
- Publication number 20250221041
- Publication date Jul 3, 2025
- Intel Corporation
- Leonard P. GULER
Information Patent Application
INTEGRATED CIRCUIT STRUCTURE WITH DIRECT BACKSIDE SOURCE OR DRAIN C...
- Publication number 20250220991
- Publication date Jul 3, 2025
- Intel Corporation
- Shao Ming KOH
Information Patent Application
INTEGRATED CIRCUIT STRUCTURES HAVING DIRECT-ASSEMBLED LINKS FOR UNI...
- Publication number 20250220968
- Publication date Jul 3, 2025
- Intel Corporation
- Leonard P. GULER
Information Patent Application
INTEGRATED CIRCUIT STRUCTURES HAVING UNIFORM GRID METAL GATE AND TR...
- Publication number 20250203905
- Publication date Jun 19, 2025
- Intel Corporation
- Leonard P. GULER
Information Patent Application
INTEGRATED CIRCUIT STRUCTURES HAVING UNIFORM GRID METAL GATE AND TR...
- Publication number 20250176153
- Publication date May 29, 2025
- Intel Corporation
- Leonard P. GULER
Information Patent Application
STACKED NANOWIRE TRANSISTOR STRUCTURES WITH ISOLATION REGIONS BOUND...
- Publication number 20250113563
- Publication date Apr 3, 2025
- Intel Corporation
- Leonard Guler
Information Patent Application
INTEGRATED CIRCUIT STRUCTURES HAVING DUAL STRESS GATES
- Publication number 20250098230
- Publication date Mar 20, 2025
- Intel Corporation
- Dan S. LAVRIC
Information Patent Application
INTEGRATED CIRCUIT STRUCTURE WITH BACKSIDE SOURCE OR DRAIN CONTACT...
- Publication number 20250006740
- Publication date Jan 2, 2025
- Intel Corporation
- Leonard P. GULER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT STRUCTURES HAVING REDUCED END CAP
- Publication number 20250006787
- Publication date Jan 2, 2025
- Intel Corporation
- Leonard P. GULER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSISTOR WITH CHANNEL-SYMMETRIC GATE
- Publication number 20250006810
- Publication date Jan 2, 2025
- Intel Corporation
- Shao-Ming Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT STRUCTURES WITH PARTIAL CHANNEL CAP REMOVAL
- Publication number 20240395886
- Publication date Nov 28, 2024
- Intel Corporation
- Leonard P. GULER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSISTOR WITH CHANNEL-SYMMETRIC GATE
- Publication number 20240332290
- Publication date Oct 3, 2024
- Intel Corporation
- Shao-Ming Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE SPACING IN INTEGRATED CIRCUIT STRUCTURES
- Publication number 20240249946
- Publication date Jul 25, 2024
- Intel Corporation
- Charles Henry Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SERIAL DIRECTED SELF-ASSEMBLY (DSA) PROCESSES FOR FORMING METAL LAY...
- Publication number 20240203868
- Publication date Jun 20, 2024
- Intel Corporation
- Gurpreet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT STRUCTURES HAVING FIN ISOLATION REGIONS BOUND BY...
- Publication number 20240105804
- Publication date Mar 28, 2024
- Intel Corporation
- Leonard P. GULER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT STRUCTURES WITH CHANNEL CAP REDUCTION
- Publication number 20240105771
- Publication date Mar 28, 2024
- Intel Corporation
- Leonard P. GULER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT STRUCTURES WITH GATE VOLUME REDUCTION
- Publication number 20240105801
- Publication date Mar 28, 2024
- Intel Corporation
- Leonard P. GULER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT STRUCTURES WITH BACKSIDE SELF-ALIGNED CONDUCTIVE...
- Publication number 20230290825
- Publication date Sep 14, 2023
- Intel Corporation
- Leonard P. Guler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN ISOLATION STRUCTURES FORMED AFTER GATE METALLIZATION
- Publication number 20230282700
- Publication date Sep 7, 2023
- Intel Corporation
- Leonard P. Guler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT STRUCTURES HAVING PLUGGED METAL GATES
- Publication number 20220406778
- Publication date Dec 22, 2022
- Intel Corporation
- Tahir GHANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONDUCTIVE VIA BAR SELF-ALIGNED TO GATE END
- Publication number 20220399445
- Publication date Dec 15, 2022
- Intel Corporation
- Leonard P. GULER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN CUT IN NEIGHBORING GATE AND SOURCE OR DRAIN REGIONS FOR ADVANCE...
- Publication number 20220399336
- Publication date Dec 15, 2022
- Intel Corporation
- Leonard P. GULER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT STRUCTURES HAVING CUT METAL GATES WITH DIELECTRI...
- Publication number 20220399373
- Publication date Dec 15, 2022
- Intel Corporation
- Leonard P. GULER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE ALIGNED FIN CUT FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABR...
- Publication number 20220392808
- Publication date Dec 8, 2022
- Intel Corporation
- Leonard P. GULER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE SPACING IN INTEGRATED CIRCUIT STRUCTURES
- Publication number 20220102148
- Publication date Mar 31, 2022
- Intel Corporation
- Charles Henry Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT OVER ACTIVE GATE STRUCTURES USING DIRECTED SELF-ASSEMBLY FO...
- Publication number 20220102210
- Publication date Mar 31, 2022
- Intel Corporation
- Paul A. NYHUS
- H01 - BASIC ELECTRIC ELEMENTS

Sean Michael Pursel

Person

Patents Grantslast 30 patents

Contact over active gate structures using directed self-assembly fo...

Gate spacing in integrated circuit structures

Patents Applicationslast 30 patents

INTEGRATED CIRCUIT STRUCTURES HAVING FIN ISOLATION REGIONS BOUND BY...

INTEGRATED CIRCUIT STRUCTURE WITH FRONT-SIDE-GUIDED BACKSIDE SOURCE...

INTEGRATED CIRCUIT STRUCTURE WITH FRONT-SIDE-GUIDED BACKSIDE SOURCE...

INTEGRATED CIRCUIT STRUCTURE WITH DIRECT BACKSIDE SOURCE OR DRAIN C...

INTEGRATED CIRCUIT STRUCTURES HAVING DIRECT-ASSEMBLED LINKS FOR UNI...

INTEGRATED CIRCUIT STRUCTURES HAVING UNIFORM GRID METAL GATE AND TR...

INTEGRATED CIRCUIT STRUCTURES HAVING UNIFORM GRID METAL GATE AND TR...

STACKED NANOWIRE TRANSISTOR STRUCTURES WITH ISOLATION REGIONS BOUND...

INTEGRATED CIRCUIT STRUCTURES HAVING DUAL STRESS GATES

INTEGRATED CIRCUIT STRUCTURE WITH BACKSIDE SOURCE OR DRAIN CONTACT...

INTEGRATED CIRCUIT STRUCTURES HAVING REDUCED END CAP

TRANSISTOR WITH CHANNEL-SYMMETRIC GATE

INTEGRATED CIRCUIT STRUCTURES WITH PARTIAL CHANNEL CAP REMOVAL

TRANSISTOR WITH CHANNEL-SYMMETRIC GATE

GATE SPACING IN INTEGRATED CIRCUIT STRUCTURES

SERIAL DIRECTED SELF-ASSEMBLY (DSA) PROCESSES FOR FORMING METAL LAY...

INTEGRATED CIRCUIT STRUCTURES HAVING FIN ISOLATION REGIONS BOUND BY...

INTEGRATED CIRCUIT STRUCTURES WITH CHANNEL CAP REDUCTION

INTEGRATED CIRCUIT STRUCTURES WITH GATE VOLUME REDUCTION

INTEGRATED CIRCUIT STRUCTURES WITH BACKSIDE SELF-ALIGNED CONDUCTIVE...

FIN ISOLATION STRUCTURES FORMED AFTER GATE METALLIZATION

INTEGRATED CIRCUIT STRUCTURES HAVING PLUGGED METAL GATES

CONDUCTIVE VIA BAR SELF-ALIGNED TO GATE END

FIN CUT IN NEIGHBORING GATE AND SOURCE OR DRAIN REGIONS FOR ADVANCE...

INTEGRATED CIRCUIT STRUCTURES HAVING CUT METAL GATES WITH DIELECTRI...

GATE ALIGNED FIN CUT FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABR...

GATE SPACING IN INTEGRATED CIRCUIT STRUCTURES

CONTACT OVER ACTIVE GATE STRUCTURES USING DIRECTED SELF-ASSEMBLY FO...