Sebastian STROBEL

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Aalen, DE

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Patents Grantslast 30 patents

Information Patent Grant
Method for treating a reflective optical element for the EUV wavele...
- Patent number 11,328,831
- Issue date May 10, 2022
- Carl Zeiss SMT GmbH
- Christian Grasse
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method for producing a mirror element
- Patent number 10,423,073
- Issue date Sep 24, 2019
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
EUV mirror and optical system comprising EUV mirror
- Patent number 10,203,435
- Issue date Feb 12, 2019
- Carl Zeiss SMT GmbH
- Thomas Schicketanz
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Reflective optical element, and optical system of a microlithograph...
- Patent number 9,915,873
- Issue date Mar 13, 2018
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL ELEMENT FOR A EUV PROJECTION EXPOSURE SYSTEM
- Publication number 20230126018
- Publication date Apr 27, 2023
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD FOR TREATING A REFLECTIVE OPTICAL ELEMENT FOR THE EUV WAVELE...
- Publication number 20190035512
- Publication date Jan 31, 2019
- Carl Zeiss SMT GMBH
- Christian Grasse
- G02 - OPTICS
Information Patent Application
METHOD FOR PRODUCING A MIRROR ELEMENT
- Publication number 20160342093
- Publication date Nov 24, 2016
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G02 - OPTICS
Information Patent Application
EUV MIRROR AND OPTICAL SYSTEM COMPRISING EUV MIRROR
- Publication number 20160327702
- Publication date Nov 10, 2016
- Carl Zeiss SMT GMBH
- Thomas SCHICKETANZ
- G02 - OPTICS
Information Patent Application
REFLECTIVE OPTICAL ELEMENT, AND OPTICAL SYSTEM OF A MICROLITHOGRAPH...
- Publication number 20160266499
- Publication date Sep 15, 2016
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G02 - OPTICS