Sebastian U. Engelmann

Person

White Plains, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods for etching metal films using plasma processing
- Patent number 12,057,322
- Issue date Aug 6, 2024
- Tokyo Electron Limited
- Nicholas Joy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Layer-by-layer etching of poly-granular metal-based materials for s...
- Patent number 11,270,893
- Issue date Mar 8, 2022
- International Business Machines Corporation
- John M. Papalia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
III-V extension by high temperature plasma doping
- Patent number 11,018,225
- Issue date May 25, 2021
- International Business Machines Corporation
- Robert L. Bruce
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reactive ion etching assisted lift-off processes for fabricating th...
- Patent number 10,714,341
- Issue date Jul 14, 2020
- ELPIS TECHNOLOGIES INC.
- Guy M. Cohen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High selectivity nitride removal process based on selective polymer...
- Patent number 10,651,286
- Issue date May 12, 2020
- International Business Machines Corporation
- Ravi K. Dasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of integrated circuit (IC) chip fabrication
- Patent number 10,529,633
- Issue date Jan 7, 2020
- International Business Machines Corporation
- Sebastian U. Engelmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned trench metal-alloying for III-V nFETs
- Patent number 10,366,918
- Issue date Jul 30, 2019
- International Business Machines Corporation
- Kevin K. Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High selectivity nitride removal process based on selective polymer...
- Patent number 10,325,998
- Issue date Jun 18, 2019
- International Business Machines Corporation
- Ravi K. Dasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming field effect transistor (FET) circuits, and formi...
- Patent number 10,304,692
- Issue date May 28, 2019
- International Business Machines Corporation
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image reversal process for tight pitch pillar arrays
- Patent number 10,305,029
- Issue date May 28, 2019
- International Business Machines Corporation
- Nathan P. Marchack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rapid oxide etch for manufacturing through dielectric via structures
- Patent number 10,276,439
- Issue date Apr 30, 2019
- International Business Machines Corporation
- Sebastian U. Engelmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma shallow doping and wet removal of depth control cap
- Patent number 10,276,384
- Issue date Apr 30, 2019
- International Business Machines Corporation
- Robert L. Bruce
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High selectivity nitride removal process based on selective polymer...
- Patent number 10,269,924
- Issue date Apr 23, 2019
- International Business Machines Corporation
- Ravi K. Dasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet clean process for removing CxHyFz etch residue
- Patent number 10,167,443
- Issue date Jan 1, 2019
- International Business Machines Corporation
- Robert L. Bruce
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Selective dry etch for directed self assembly of block copolymers
- Patent number 10,043,668
- Issue date Aug 7, 2018
- International Business Machines Corporation
- Sebastian U. Engelmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective dry etch for directed self assembly of block copolymers
- Patent number 9,941,121
- Issue date Apr 10, 2018
- International Business Machines Corporation
- Sebastian U. Engelmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for fabricating horizontally aligned nanochannels for mi...
- Patent number 9,891,189
- Issue date Feb 13, 2018
- International Business Machines Corporation
- Sebastian U. Engelmann
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Neutral hard mask and its application to graphoepitaxy-based direct...
- Patent number 9,881,793
- Issue date Jan 30, 2018
- International Business Machines Corporation
- Sebastian U. Engelmann
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
High aspect ratio patterning of hard mask materials by organic soft...
- Patent number 9,728,421
- Issue date Aug 8, 2017
- International Business Machines Corporation
- Markus Brink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reactive ion etching assisted lift-off processes for fabricating th...
- Patent number 9,728,444
- Issue date Aug 8, 2017
- International Business Machines Corporation
- Guy M. Cohen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature encapsulation for magnetic tunnel junction
- Patent number 9,691,972
- Issue date Jun 27, 2017
- International Business Machines Corporation
- Anthony J. Annunziata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for fabricating horizontally aligned nanochannels for mi...
- Patent number 9,643,179
- Issue date May 9, 2017
- International Business Machines Corporation
- Sebastian U. Engelmann
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Low energy etch process for nitrogen-containing dielectric layer
- Patent number 9,633,948
- Issue date Apr 25, 2017
- GLOBALFOUNDRIES Inc.
- Markus Brink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High selectivity nitride removal process based on selective polymer...
- Patent number 9,627,533
- Issue date Apr 18, 2017
- International Business Machines Corporation
- Ravi K. Dasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet clean process for removing CxHyFz etch residue
- Patent number 9,536,731
- Issue date Jan 3, 2017
- International Business Machines Corporation
- Robert L. Bruce
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Techniques for forming contacts for active BEOL
- Patent number 9,490,164
- Issue date Nov 8, 2016
- International Business Machines Corporation
- Sebastian U. Engelmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-temperature sidewall image transfer process using ALD metals, m...
- Patent number 9,437,443
- Issue date Sep 6, 2016
- GLOBALFOUNDRIES Inc.
- Markus Brink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning transition metals in integrated circuits
- Patent number 9,299,639
- Issue date Mar 29, 2016
- GLOBALFOUNDRIES Inc.
- Cyril Cabral
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Patterning transition metals in integrated circuits
- Patent number 9,299,638
- Issue date Mar 29, 2016
- GLOBALFOUNDRIES Inc.
- Cyril Cabral
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Molecular radical etch chemistry for increased throughput in pulsed...
- Patent number 9,214,355
- Issue date Dec 15, 2015
- International Business Machines Corporation
- Sebastian U. Engelmann
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS FOR ETCHING METAL FILMS USING PLASMA PROCESSING
- Publication number 20210118693
- Publication date Apr 22, 2021
- TOKYO ELECTRON LIMITED
- Nicholas Joy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LAYER-BY-LAYER ETCHING OF POLY-GRANULAR METAL-BASED MATERIALS FOR S...
- Publication number 20200321220
- Publication date Oct 8, 2020
- International Business Machines Corporation
- John M. Papalia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED TRENCH METAL-ALLOYING FOR III-V NFETS
- Publication number 20190311945
- Publication date Oct 10, 2019
- International Business Machines Corporation
- Kevin K. Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER...
- Publication number 20190305109
- Publication date Oct 3, 2019
- International Business Machines Corporation
- Ravi K. Dasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF INTEGRATED CIRCUIT (IC) CHIP FABRICATION
- Publication number 20190172762
- Publication date Jun 6, 2019
- International Business Machines Corporation
- Sebastian U. Engelmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING FIELD EFFECT TRANSISTOR (FET) CIRCUITS, AND FORMI...
- Publication number 20190164773
- Publication date May 30, 2019
- International Business Machines Corporation
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RAPID OXIDE ETCH FOR MANUFACTURING THROUGH DIELECTRIC VIA STRUCTURES
- Publication number 20180350677
- Publication date Dec 6, 2018
- International Business Machines Corporation
- Sebastian U. Engelmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SHALLOW DOPING AND WET REMOVAL OF DEPTH CONTROL CAP
- Publication number 20180218908
- Publication date Aug 2, 2018
- International Business Machines Corporation
- Robert L. Bruce
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SHALLOW DOPING AND WET REMOVAL OF DEPTH CONTROL CAP
- Publication number 20180218909
- Publication date Aug 2, 2018
- International Business Machines Corporation
- Robert L. Bruce
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SHALLOW DOPING AND WET REMOVAL OF DEPTH CONTROL CAP
- Publication number 20180218907
- Publication date Aug 2, 2018
- International Business Machines Corporation
- Robert L. Bruce
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE DRY ETCH FOR DIRECTED SELF ASSEMBLY OF BLOCK COPOLYMERS
- Publication number 20180211831
- Publication date Jul 26, 2018
- International Business Machines Corporation
- SEBASTIAN U. ENGELMANN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED TRENCH METAL-ALLOYING FOR III-V NFETS
- Publication number 20180096885
- Publication date Apr 5, 2018
- International Business Machines Corporation
- Kevin K. Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR FABRICATING HORIZONTALLY ALIGNED NANOCHANNELS FOR MI...
- Publication number 20170370876
- Publication date Dec 28, 2017
- International Business Machines Corporation
- Sebastian U. Engelmann
- B82 - NANO-TECHNOLOGY
Information Patent Application
III-V EXTENSION BY HIGH TEMPERATURE PLASMA DOPING
- Publication number 20170373149
- Publication date Dec 28, 2017
- International Business Machines Corporation
- Robert L. Bruce
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REACTIVE ION ETCHING ASSISTED LIFT-OFF PROCESSES FOR FABRICATING TH...
- Publication number 20170243743
- Publication date Aug 24, 2017
- International Business Machines Corporation
- Guy M. Cohen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REACTIVE ION ETCHING ASSISTED LIFT-OFF PROCESSES FOR FABRICATING TH...
- Publication number 20170194195
- Publication date Jul 6, 2017
- International Business Machines Corporation
- Guy M. Cohen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER...
- Publication number 20170194497
- Publication date Jul 6, 2017
- International Business Machines Corporation
- Ravi K. Dasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ASPECT RATIO PATTERNING OF HARD MASK MATERIALS BY ORGANIC SOFT...
- Publication number 20170194161
- Publication date Jul 6, 2017
- International Business Machines Corporation
- Markus Brink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER...
- Publication number 20170194457
- Publication date Jul 6, 2017
- International Business Machines Corporation
- Ravi K. Dasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE ENCAPSULATION FOR MAGNETIC TUNNEL JUNCTION
- Publication number 20170179194
- Publication date Jun 22, 2017
- International Business Machines Corporation
- Anthony J. Annunziata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET CLEAN PROCESS FOR REMOVING CxHyFz ETCH RESIDUE
- Publication number 20170044470
- Publication date Feb 16, 2017
- International Business Machines Corporation
- Robert L. Bruce
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
NEUTRAL HARD MASK AND ITS APPLICATION TO GRAPHOEPITAXY-BASED DIRECT...
- Publication number 20170025274
- Publication date Jan 26, 2017
- International Business Machines Corporation
- Sebastian U. Engelmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER...
- Publication number 20160233335
- Publication date Aug 11, 2016
- International Business Machines Corporation
- Ravi K. Dasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW ENERGY ETCH PROCESS FOR NITROGEN-CONTAINING DIELECTRIC LAYER
- Publication number 20160111374
- Publication date Apr 21, 2016
- GLOBALFOUNDRIES INC.
- Markus Brink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LATERAL ETCH STOP FOR NEMS RELEASE ETCH FOR HIGH DENSITY NEMS/CMOS...
- Publication number 20150151961
- Publication date Jun 4, 2015
- International Business Machines Corporation
- Josephine B. Chang
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
WET CLEAN PROCESS FOR REMOVING CxHyFz ETCH RESIDUE
- Publication number 20150118839
- Publication date Apr 30, 2015
- International Business Machines Corporation
- Robert L. Bruce
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
MOLECULAR RADICAL ETCH CHEMISTRY FOR INCREASED THROUGHPUT IN PULSED...
- Publication number 20150118854
- Publication date Apr 30, 2015
- International Business Machines Corporation
- Sebastian U. Engelmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low-Temperature Sidewall Image Transfer Process Using ALD Metals, M...
- Publication number 20140367833
- Publication date Dec 18, 2014
- Markus Brink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING TRANSITION METALS IN INTEGRATED CIRCUITS
- Publication number 20140159242
- Publication date Jun 12, 2014
- International Business Machines Corporation
- Cyril Cabral
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERNING TRANSITION METALS IN INTEGRATED CIRCUITS
- Publication number 20140159227
- Publication date Jun 12, 2014
- International Business Machines Corporation
- Cyril Cabral
- B82 - NANO-TECHNOLOGY

Sebastian U. Engelmann

Person

Patents Grantslast 30 patents

Methods for etching metal films using plasma processing

Layer-by-layer etching of poly-granular metal-based materials for s...

III-V extension by high temperature plasma doping

Reactive ion etching assisted lift-off processes for fabricating th...

High selectivity nitride removal process based on selective polymer...

Method of integrated circuit (IC) chip fabrication

Self-aligned trench metal-alloying for III-V nFETs

High selectivity nitride removal process based on selective polymer...

Method of forming field effect transistor (FET) circuits, and formi...

Image reversal process for tight pitch pillar arrays

Rapid oxide etch for manufacturing through dielectric via structures

Plasma shallow doping and wet removal of depth control cap

High selectivity nitride removal process based on selective polymer...

Wet clean process for removing CxHyFz etch residue

Selective dry etch for directed self assembly of block copolymers

Selective dry etch for directed self assembly of block copolymers

Techniques for fabricating horizontally aligned nanochannels for mi...

Neutral hard mask and its application to graphoepitaxy-based direct...

High aspect ratio patterning of hard mask materials by organic soft...

Reactive ion etching assisted lift-off processes for fabricating th...

Low temperature encapsulation for magnetic tunnel junction

Techniques for fabricating horizontally aligned nanochannels for mi...

Low energy etch process for nitrogen-containing dielectric layer

High selectivity nitride removal process based on selective polymer...

Wet clean process for removing CxHyFz etch residue

Techniques for forming contacts for active BEOL

Low-temperature sidewall image transfer process using ALD metals, m...

Patterning transition metals in integrated circuits

Patterning transition metals in integrated circuits

Molecular radical etch chemistry for increased throughput in pulsed...

Patents Applicationslast 30 patents

METHODS FOR ETCHING METAL FILMS USING PLASMA PROCESSING

LAYER-BY-LAYER ETCHING OF POLY-GRANULAR METAL-BASED MATERIALS FOR S...

SELF-ALIGNED TRENCH METAL-ALLOYING FOR III-V NFETS

HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER...

METHOD OF INTEGRATED CIRCUIT (IC) CHIP FABRICATION

METHOD OF FORMING FIELD EFFECT TRANSISTOR (FET) CIRCUITS, AND FORMI...

RAPID OXIDE ETCH FOR MANUFACTURING THROUGH DIELECTRIC VIA STRUCTURES

PLASMA SHALLOW DOPING AND WET REMOVAL OF DEPTH CONTROL CAP

PLASMA SHALLOW DOPING AND WET REMOVAL OF DEPTH CONTROL CAP

PLASMA SHALLOW DOPING AND WET REMOVAL OF DEPTH CONTROL CAP

SELECTIVE DRY ETCH FOR DIRECTED SELF ASSEMBLY OF BLOCK COPOLYMERS

SELF-ALIGNED TRENCH METAL-ALLOYING FOR III-V NFETS

TECHNIQUES FOR FABRICATING HORIZONTALLY ALIGNED NANOCHANNELS FOR MI...

III-V EXTENSION BY HIGH TEMPERATURE PLASMA DOPING

REACTIVE ION ETCHING ASSISTED LIFT-OFF PROCESSES FOR FABRICATING TH...

REACTIVE ION ETCHING ASSISTED LIFT-OFF PROCESSES FOR FABRICATING TH...

HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER...

HIGH ASPECT RATIO PATTERNING OF HARD MASK MATERIALS BY ORGANIC SOFT...

HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER...

LOW TEMPERATURE ENCAPSULATION FOR MAGNETIC TUNNEL JUNCTION

WET CLEAN PROCESS FOR REMOVING CxHyFz ETCH RESIDUE

NEUTRAL HARD MASK AND ITS APPLICATION TO GRAPHOEPITAXY-BASED DIRECT...

HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER...

LOW ENERGY ETCH PROCESS FOR NITROGEN-CONTAINING DIELECTRIC LAYER

LATERAL ETCH STOP FOR NEMS RELEASE ETCH FOR HIGH DENSITY NEMS/CMOS...

WET CLEAN PROCESS FOR REMOVING CxHyFz ETCH RESIDUE

MOLECULAR RADICAL ETCH CHEMISTRY FOR INCREASED THROUGHPUT IN PULSED...

Low-Temperature Sidewall Image Transfer Process Using ALD Metals, M...

PATTERNING TRANSITION METALS IN INTEGRATED CIRCUITS

PATTERNING TRANSITION METALS IN INTEGRATED CIRCUITS