Sebastianus Adrianus Goorden

Person

Schijf, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Metrology method and associated metrology and lithographic apparatuses
- Patent number 12,189,314
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and lithographic apparatuses
- Patent number 12,025,925
- Issue date Jul 2, 2024
- ASML Netherlands B.V.
- Filippo Alpeggiani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dark field microscope
- Patent number 11,940,608
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and methods for determining the position of a target stru...
- Patent number 11,927,891
- Issue date Mar 12, 2024
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method and associated metrology and lithographic apparatuses
- Patent number 11,906,906
- Issue date Feb 20, 2024
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment method
- Patent number 11,762,305
- Issue date Sep 19, 2023
- ASML Netherlands B.V.
- Sergei Sokolov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for measuring a position of a mark
- Patent number 11,650,513
- Issue date May 16, 2023
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology sensor, illumination system and method of generating meas...
- Patent number 11,474,435
- Issue date Oct 18, 2022
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment method and apparatus
- Patent number 11,409,206
- Issue date Aug 9, 2022
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology sensor for position metrology
- Patent number 11,360,399
- Issue date Jun 14, 2022
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position sensor
- Patent number 11,333,985
- Issue date May 17, 2022
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology sensor, lithographic apparatus and method for manufacturi...
- Patent number 11,181,835
- Issue date Nov 23, 2021
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G01 - MEASURING TESTING
Information Patent Grant
Alignment sensor apparatus for process sensitivity compensation
- Patent number 11,175,593
- Issue date Nov 16, 2021
- ASML Netherlands B.V.
- Simon Reinald Huisman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology sensor, lithographic apparatus and method for manufacturi...
- Patent number 11,086,240
- Issue date Aug 10, 2021
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment measurement system
- Patent number 11,042,096
- Issue date Jun 22, 2021
- ASML Netherlands B.V.
- Stefan Michiel Witte
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sensor, lithographic apparatus, and device manufacturing method
- Patent number 11,022,902
- Issue date Jun 1, 2021
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment measurement system
- Patent number 10,942,461
- Issue date Mar 9, 2021
- ASML Netherlands B.V.
- Simon Reinald Huisman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for measuring a structure on a substrate
- Patent number 10,788,765
- Issue date Sep 29, 2020
- ASML Netherlands B.V.
- Stefan Michiel Witte
- G01 - MEASURING TESTING
Information Patent Grant
Metrology sensor, lithographic apparatus and method for manufacturi...
- Patent number 10,788,766
- Issue date Sep 29, 2020
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G01 - MEASURING TESTING
Information Patent Grant
Methods and apparatuses for measurement of a parameter of a feature...
- Patent number 10,649,345
- Issue date May 12, 2020
- ASML Netherlands B.V.
- Maxim Pisarenco
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus, lithographic system, and method of measuring a...
- Patent number 10,599,047
- Issue date Mar 24, 2020
- ASML Netherlands B.V.
- Janneke Ravensbergen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position sensor, lithographic apparatus and method for manufacturin...
- Patent number 10,527,959
- Issue date Jan 7, 2020
- ASML Netherlands B.V.
- Simon Reinald Huisman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position sensing arrangement and lithographic apparatus including s...
- Patent number 10,317,808
- Issue date Jun 11, 2019
- ASML Netherlands B.V.
- Simon Reinald Huisman
- G01 - MEASURING TESTING
Information Patent Grant
Radiation conditioning system, illumination system and metrology ap...
- Patent number 10,303,064
- Issue date May 28, 2019
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G02 - OPTICS
Information Patent Grant
Device and method for processing a radiation beam with coherence
- Patent number 10,234,767
- Issue date Mar 19, 2019
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHOD
- Publication number 20240353761
- Publication date Oct 24, 2024
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND SYSTEM AND LITHOGRAPHIC SYSTEM
- Publication number 20240241454
- Publication date Jul 18, 2024
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DARK FIELD MICROSCOPE
- Publication number 20240231065
- Publication date Jul 11, 2024
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY TOOL CALIBRATION METHOD AND ASSOCIATED METROLOGY TOOL
- Publication number 20240184215
- Publication date Jun 6, 2024
- ASML NETHERLANDS B.V.
- Jin LIAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTENSITY ORDER DIFFERENCE BASED METROLOGY SYSTEM, LITHOGRAPHIC APP...
- Publication number 20240094641
- Publication date Mar 21, 2024
- ASML Holding N.V.
- Justin Lloyd KREUZER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, AND METHODS THEREOF
- Publication number 20240036485
- Publication date Feb 1, 2024
- ASML Netheriands B. V.
- Arjan Johannes Anton BEUKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF METROLOGY AND ASSOCIATED APPARATUSES
- Publication number 20240036484
- Publication date Feb 1, 2024
- ASML NETHERLANDS B.V.
- Timothy Dugan DAVIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SYSTEM AND COHERENCE ADJUSTERS
- Publication number 20240027913
- Publication date Jan 25, 2024
- ASML NETHERLANDS B.V.
- Sergei SOKOLOV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES
- Publication number 20240012342
- Publication date Jan 11, 2024
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH FORCE LOW VOLTAGE PIEZOELECTRIC MICROMIRROR ACTUATOR
- Publication number 20240012332
- Publication date Jan 11, 2024
- ASML NETHERLANDS B.V.
- Luc Roger Simonne HASPESLAGH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH ACCURACY TEMPERATURE-COMPENSATED PIEZORESISTIVE POSITION SENSI...
- Publication number 20240004184
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Luc Roger Simonne HASPESLAGH
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
METROLOGY SYSTEM AND LITHOGRAPHIC SYSTEM
- Publication number 20230418168
- Publication date Dec 28, 2023
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION APPARATUS AND ASSOCIATED METROLOGY AND LITHOGRAPHIC AP...
- Publication number 20230229094
- Publication date Jul 20, 2023
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC APPARATUS, MULTI-WAVELENGTH PHASE-MODULATED SCANNING M...
- Publication number 20230213871
- Publication date Jul 6, 2023
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G01 - MEASURING TESTING
Information Patent Application
A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAS...
- Publication number 20230176491
- Publication date Jun 8, 2023
- ASML NETHERLANDS B.V.
- Olger Victor ZWIER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND LITHOGRAPHIC APPARATUSES
- Publication number 20220397832
- Publication date Dec 15, 2022
- ASML NETHERLANDS B.V.
- Filippo ALPEGGIANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT METHOD
- Publication number 20220382175
- Publication date Dec 1, 2022
- ASML NETHERLANDS B.V.
- Sergei SOKOLOV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROMIRROR ARRAYS
- Publication number 20220342199
- Publication date Oct 27, 2022
- ASML NETHERLANDS B.V.
- Alexandre HALBACH
- G02 - OPTICS
Information Patent Application
MICROMIRROR ARRAYS
- Publication number 20220283428
- Publication date Sep 8, 2022
- ASML NETHERLANDS B.V.
- Luc Roger Simonne HASPESLAGH
- G02 - OPTICS
Information Patent Application
METROLOGY SYSTEM AND METHOD
- Publication number 20220283515
- Publication date Sep 8, 2022
- ASML Holding N.V.
- Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DARK FIELD MICROSCOPE
- Publication number 20220229278
- Publication date Jul 21, 2022
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES
- Publication number 20220121128
- Publication date Apr 21, 2022
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SENSOR, ILLUMINATION SYSTEM AND METHOD OF GENERATING MEAS...
- Publication number 20220057718
- Publication date Feb 24, 2022
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G02 - OPTICS
Information Patent Application
METROLOGY SENSOR FOR POSITION METROLOGY
- Publication number 20220035257
- Publication date Feb 3, 2022
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR MEASURING A POSITION OF A MARK
- Publication number 20210382403
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus and Methods for Determining the Position of a Target Stru...
- Publication number 20210364936
- Publication date Nov 25, 2021
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment Method and Apparatus
- Publication number 20210240091
- Publication date Aug 5, 2021
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Sensor, Lithographic Apparatus and Method for Manufacturi...
- Publication number 20210157248
- Publication date May 27, 2021
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G01 - MEASURING TESTING
Information Patent Application
Alignment Sensor Apparatus for Process Sensivity Compensation
- Publication number 20210132509
- Publication date May 6, 2021
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITION SENSOR
- Publication number 20210124276
- Publication date Apr 29, 2021
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Sebastianus Adrianus Goorden

Person

Patents Grantslast 30 patents

Metrology method and associated metrology and lithographic apparatuses

Metrology method and lithographic apparatuses

Dark field microscope

Apparatus and methods for determining the position of a target stru...

Metrology method and associated metrology and lithographic apparatuses

Alignment method

Apparatus and method for measuring a position of a mark

Metrology sensor, illumination system and method of generating meas...

Alignment method and apparatus

Metrology sensor for position metrology

Position sensor

Metrology sensor, lithographic apparatus and method for manufacturi...

Alignment sensor apparatus for process sensitivity compensation

Metrology sensor, lithographic apparatus and method for manufacturi...

Alignment measurement system

Sensor, lithographic apparatus, and device manufacturing method

Alignment measurement system

Method and apparatus for measuring a structure on a substrate

Metrology sensor, lithographic apparatus and method for manufacturi...

Methods and apparatuses for measurement of a parameter of a feature...

Metrology apparatus, lithographic system, and method of measuring a...

Position sensor, lithographic apparatus and method for manufacturin...

Position sensing arrangement and lithographic apparatus including s...

Radiation conditioning system, illumination system and metrology ap...

Device and method for processing a radiation beam with coherence

Patents Applicationslast 30 patents

METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHOD

METROLOGY METHOD AND SYSTEM AND LITHOGRAPHIC SYSTEM

DARK FIELD MICROSCOPE

METROLOGY TOOL CALIBRATION METHOD AND ASSOCIATED METROLOGY TOOL

INTENSITY ORDER DIFFERENCE BASED METROLOGY SYSTEM, LITHOGRAPHIC APP...

LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, AND METHODS THEREOF

METHOD OF METROLOGY AND ASSOCIATED APPARATUSES

METROLOGY SYSTEM AND COHERENCE ADJUSTERS

METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES

HIGH FORCE LOW VOLTAGE PIEZOELECTRIC MICROMIRROR ACTUATOR

HIGH ACCURACY TEMPERATURE-COMPENSATED PIEZORESISTIVE POSITION SENSI...

METROLOGY SYSTEM AND LITHOGRAPHIC SYSTEM

ILLUMINATION APPARATUS AND ASSOCIATED METROLOGY AND LITHOGRAPHIC AP...

LITHOGRAPHIC APPARATUS, MULTI-WAVELENGTH PHASE-MODULATED SCANNING M...

A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAS...

METROLOGY METHOD AND LITHOGRAPHIC APPARATUSES

ALIGNMENT METHOD

MICROMIRROR ARRAYS

MICROMIRROR ARRAYS

METROLOGY SYSTEM AND METHOD

DARK FIELD MICROSCOPE

METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES

METROLOGY SENSOR, ILLUMINATION SYSTEM AND METHOD OF GENERATING MEAS...

METROLOGY SENSOR FOR POSITION METROLOGY

APPARATUS AND METHOD FOR MEASURING A POSITION OF A MARK

Apparatus and Methods for Determining the Position of a Target Stru...

Alignment Method and Apparatus

Metrology Sensor, Lithographic Apparatus and Method for Manufacturi...

Alignment Sensor Apparatus for Process Sensivity Compensation

POSITION SENSOR