Seiichi TAGAWA

Person

Suita-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist pattern formation method
- Patent number 11,796,919
- Issue date Oct 24, 2023
- Osaka University
- Seiichi Tagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist patterning method and resist material
- Patent number 11,187,984
- Issue date Nov 30, 2021
- Osaka University
- Seiichi Tagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist patterning method, latent resist image forming device, resis...
- Patent number 10,670,967
- Issue date Jun 2, 2020
- Osaka University
- Seiichi Tagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo-sensitized chemically amplified resist (PS-CAR) simulation
- Patent number 10,429,745
- Issue date Oct 1, 2019
- Osaka University
- Michael Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist-pattern-forming method and chemically amplified resist material
- Patent number 10,073,348
- Issue date Sep 11, 2018
- Osaka University
- Hisashi Nakagawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified resist material, pattern-forming method, compo...
- Patent number 10,073,349
- Issue date Sep 11, 2018
- Osaka University
- Hisashi Nakagawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitization chemical-amplification type resist material, met...
- Patent number 10,025,187
- Issue date Jul 17, 2018
- Tokyo Electron Limited
- Seiji Nagahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treatment system
- Patent number 10,025,190
- Issue date Jul 17, 2018
- Tokyo Electron Limited
- Seiji Nagahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist patterning method, latent resist image forming device, resis...
- Patent number 9,977,332
- Issue date May 22, 2018
- Osaka University
- Seiichi Tagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method
- Patent number 9,971,247
- Issue date May 15, 2018
- Osaka University
- Hisashi Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ceramic nanowires and a process for producing them by ion beam irra...
- Patent number 7,731,927
- Issue date Jun 8, 2010
- Japan Atomic Energy Research Institute
- Masaki Sugimoto
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
RESIST PATTERN FORMATION METHOD
- Publication number 20210216016
- Publication date Jul 15, 2021
- OSAKA UNIVERSITY
- Seiichi TAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERNING METHOD AND RESIST MATERIAL
- Publication number 20180356731
- Publication date Dec 13, 2018
- OSAKA UNIVERSITY
- Seiichi TAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERNING METHOD, LATENT RESIST IMAGE FORMING DEVICE, RESIS...
- Publication number 20180231892
- Publication date Aug 16, 2018
- OSAKA UNIVERSITY
- Seiichi TAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photo-sensitized Chemically Amplified Resist (PS-CAR) simulation
- Publication number 20170242342
- Publication date Aug 24, 2017
- TOKYO ELECTRON LIMITED
- Michael Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERNING METHOD, LATENT RESIST IMAGE FORMING DEVICE, AND R...
- Publication number 20170097570
- Publication date Apr 6, 2017
- OSAKA UNIVERSITY
- Seiichi TAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20170052450
- Publication date Feb 23, 2017
- Osaka University
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST-PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RESIST MATERIAL
- Publication number 20170052448
- Publication date Feb 23, 2017
- Osaka University
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPO...
- Publication number 20170052449
- Publication date Feb 23, 2017
- Osaka University
- HISASHI NAKAGAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SUBSTRATE TREATMENT SYSTEM
- Publication number 20170031245
- Publication date Feb 2, 2017
- TOKYO ELECTRON LIMITED
- Seiji NAGAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, MET...
- Publication number 20160357103
- Publication date Dec 8, 2016
- Tokyo Electron Limited
- Seiji NAGAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROSTRUCTURAL MATERIALS AND FABRICATION METHOD THEREOF
- Publication number 20160193756
- Publication date Jul 7, 2016
- DAIKIN INDUSTRIES, LTD.
- Akihiro OSHIMA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
RESIST PATTERNING METHOD, LATENT RESIST IMAGE FORMING DEVICE, RESIS...
- Publication number 20160004160
- Publication date Jan 7, 2016
- OSAKA UNIVERSITY
- Seiichi TAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROSTRUCTURAL MATERIALS AND FABRICATION METHOD THEREOF
- Publication number 20120231220
- Publication date Sep 13, 2012
- JAPAN ATOMIC ENERGY AGENCY
- Akihiro Oshima
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
CERAMIC NANOWIRES AND A PROCESS FOR PRODUCING THEM BY ION BEAM IRRA...
- Publication number 20100111805
- Publication date May 6, 2010
- Japan Atomic Energy Agency
- Masaki Sugimoto
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES

Seiichi TAGAWA

Person

Patents Grantslast 30 patents

Resist pattern formation method

Resist patterning method and resist material

Resist patterning method, latent resist image forming device, resis...

Photo-sensitized chemically amplified resist (PS-CAR) simulation

Resist-pattern-forming method and chemically amplified resist material

Chemically amplified resist material, pattern-forming method, compo...

Photosensitization chemical-amplification type resist material, met...

Substrate treatment system

Resist patterning method, latent resist image forming device, resis...

Pattern-forming method

Ceramic nanowires and a process for producing them by ion beam irra...

Patents Applicationslast 30 patents

RESIST PATTERN FORMATION METHOD

RESIST PATTERNING METHOD AND RESIST MATERIAL

RESIST PATTERNING METHOD, LATENT RESIST IMAGE FORMING DEVICE, RESIS...

Photo-sensitized Chemically Amplified Resist (PS-CAR) simulation

RESIST PATTERNING METHOD, LATENT RESIST IMAGE FORMING DEVICE, AND R...

PATTERN-FORMING METHOD

RESIST-PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RESIST MATERIAL

CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPO...

SUBSTRATE TREATMENT SYSTEM

PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, MET...

MICROSTRUCTURAL MATERIALS AND FABRICATION METHOD THEREOF

RESIST PATTERNING METHOD, LATENT RESIST IMAGE FORMING DEVICE, RESIS...

MICROSTRUCTURAL MATERIALS AND FABRICATION METHOD THEREOF

CERAMIC NANOWIRES AND A PROCESS FOR PRODUCING THEM BY ION BEAM IRRA...