TREA

Seiichiro KANNO

Follow

Person

  • Iwaki, JP
People

Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    Charged Particle Beam Device
    • Publication number 20240194439
    • Publication date Jun 13, 2024
    • HITACHI HIGH-TECH CORPORATION
    • Akito TANOKUCHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Charged Particle Beam Device
    • Publication number 20230005700
    • Publication date Jan 5, 2023
    • Hitachi High-Tech Corporation
    • Takafumi MIWA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Charged Particle Beam Device
    • Publication number 20220246387
    • Publication date Aug 4, 2022
    • HITACHI HIGH-TECH CORPORATION
    • Akito TANOKUCHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    CHARGED PARTICLE BEAM APPARATUS
    • Publication number 20220028650
    • Publication date Jan 27, 2022
    • Hitachi High-Tech Corporation
    • Takafumi Miwa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Charged Particle Beam Device
    • Publication number 20210134555
    • Publication date May 6, 2021
    • Hitachi High-Technologies Corporation
    • Akito TANOKUCHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Charged-Particle Beam Device
    • Publication number 20200395188
    • Publication date Dec 17, 2020
    • HITACHI HIGH-TECH CORPORATION
    • Seiichiro KANNO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    CHARGED PARTICLE BEAM DEVICE
    • Publication number 20200006032
    • Publication date Jan 2, 2020
    • Hitachi High-Technologies Corporation
    • Takafumi MIWA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Charged-Particle Beam Device
    • Publication number 20190355541
    • Publication date Nov 21, 2019
    • Hitachi High-Technologies Corporation
    • Seiichiro KANNO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Charged Particle Beam Apparatus
    • Publication number 20160013010
    • Publication date Jan 14, 2016
    • Hitachi High-Technologies Corporation
    • Seiichiro KANNO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Charged Particle Radiation Apparatus
    • Publication number 20150371814
    • Publication date Dec 24, 2015
    • Hitachi High-Technologies Corporation
    • Seiichiro KANNO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Charged-Particle Beam Device
    • Publication number 20150357156
    • Publication date Dec 10, 2015
    • Hitachi High-Technologies Corporation
    • Yasushi EBIZUKA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Apparatus and Method for Processing Sample, and Charged Particle Ra...
    • Publication number 20150340198
    • Publication date Nov 26, 2015
    • Hitachi High-Technologies Corporation
    • Shuichi NAKAGAWA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Electrostatic Chuck Mechanism and Charged Particle Beam Apparatus
    • Publication number 20150262857
    • Publication date Sep 17, 2015
    • Hitachi High-Technologies Corporation
    • Yasushi EBIZUKA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    CHARGED PARTICLE BEAM APPARATUS
    • Publication number 20150097123
    • Publication date Apr 9, 2015
    • Hitachi High-Technologies Corporation
    • Yasushi Ebizuka
    • H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
  • Information Patent Application

    SEMICONDUCTOR INSPECTING APPARATUS
    • Publication number 20130327939
    • Publication date Dec 12, 2013
    • Hitachi High-Technologies
    • Go MIYA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    SAMPLE OBSERVATION APPARATUS
    • Publication number 20130167665
    • Publication date Jul 4, 2013
    • Hitachi High-Technologies Corporation
    • Tetsuya NIIBORI
    • G01 - MEASURING TESTING
  • Information Patent Application

    SEMICONDUCTOR INSPECTING APPARATUS
    • Publication number 20120261589
    • Publication date Oct 18, 2012
    • Hitachi High-Technologies Corporation
    • Go Miya
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Scanning Electron Microscope
    • Publication number 20120256087
    • Publication date Oct 11, 2012
    • Hitachi High-Technologies Corporation
    • Seiichiro Kanno
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    CHARGED PARTICLE BEAM DEVICE AND EVALUATION METHOD USING THE CHARGE...
    • Publication number 20120070066
    • Publication date Mar 22, 2012
    • Hitachi High-Technologies Corporation
    • Hiroyuki Kitsunai
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ELECTRON MICROSCOPE, AND SPECIMEN HOLDING METHOD
    • Publication number 20110303844
    • Publication date Dec 15, 2011
    • Hitachi High-Technologies Corporation
    • Seiichiro Kanno
    • G01 - MEASURING TESTING
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20110139370
    • Publication date Jun 16, 2011
    • Hitachi High-Technologies Corporation
    • Naoshi Itabashi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    SEMICONDUCTOR INSPECTING APPARATUS
    • Publication number 20110095185
    • Publication date Apr 28, 2011
    • Hitachi High-Technologies Corporation
    • Go Miya
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20100282414
    • Publication date Nov 11, 2010
    • Hitachi High-Technologies Corp
    • Naoshi ITABASHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    LITHOGRAPHY APPARATUS AND MANUFACTURING METHOD USING THE SAME
    • Publication number 20100033695
    • Publication date Feb 11, 2010
    • Hitachi, Ltd
    • Seiichiro KANNO
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Plasma processing apparatus including electrostatic chuck with buil...
    • Publication number 20090178764
    • Publication date Jul 16, 2009
    • Hitachi High-Technologies Corporation
    • Seiichiro Kanno
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD
    • Publication number 20090152241
    • Publication date Jun 18, 2009
    • Go Miya
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD
    • Publication number 20080110569
    • Publication date May 15, 2008
    • Go Miya
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Plasma processing apparatus
    • Publication number 20080023147
    • Publication date Jan 31, 2008
    • Kenetsu Yokogawa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Plasma processing apparatus capable of adjusting temperature of sam...
    • Publication number 20080023448
    • Publication date Jan 31, 2008
    • Takumi Tandou
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Plasma processing apparatus
    • Publication number 20080017107
    • Publication date Jan 24, 2008
    • Masatsugu Arai
    • H01 - BASIC ELECTRIC ELEMENTS