Seiichiro Tachibana

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist material and patterning process
- Patent number 12,032,287
- Issue date Jul 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material and patterning process
- Patent number 11,994,798
- Issue date May 28, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material for forming organic film, substrate for manufacturing semi...
- Patent number 11,886,118
- Issue date Jan 30, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material for forming organic film, patterning process, and polymer
- Patent number 11,851,530
- Issue date Dec 26, 2023
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Material for forming organic film, substrate for manufacturing semi...
- Patent number 11,692,066
- Issue date Jul 4, 2023
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material for forming organic film, substrate for manufacturing semi...
- Patent number 11,676,814
- Issue date Jun 13, 2023
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming organic film, substrate for manufacturing s...
- Patent number 11,635,691
- Issue date Apr 25, 2023
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and patterning process
- Patent number 11,614,686
- Issue date Mar 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Hironori Satoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material for forming organic film, substrate for manufacturing semi...
- Patent number 11,500,292
- Issue date Nov 15, 2022
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Thermosetting silicon-containing compound, composition for forming...
- Patent number 11,485,824
- Issue date Nov 1, 2022
- Shin-Etsu Chemical Co., Ltd.
- Toshiharu Yano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compound, composition for forming organic film, substrate for manuf...
- Patent number 11,307,497
- Issue date Apr 19, 2022
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing dihydroxynaphthalene condensate and dihydroxyn...
- Patent number 11,267,937
- Issue date Mar 8, 2022
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Composition for forming organic film
- Patent number 11,042,090
- Issue date Jun 22, 2021
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compound and composition for forming organic film
- Patent number 11,022,882
- Issue date Jun 1, 2021
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming organic film, substrate for manufacturing s...
- Patent number 11,018,015
- Issue date May 25, 2021
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compound, method for manufacturing the compound, and composition fo...
- Patent number 10,604,618
- Issue date Mar 31, 2020
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist multilayer film-attached substrate and patterning process
- Patent number 10,514,605
- Issue date Dec 24, 2019
- International Business Machines Corporation
- Seiichiro Tachibana
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for reducing metal of sugar-alcohol compound and sugar-alcoh...
- Patent number 10,131,603
- Issue date Nov 20, 2018
- Shin-Etsu Chemical Co., Ltd.
- Takayoshi Nakahara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound for forming organic film, and organic film composition usi...
- Patent number 10,007,183
- Issue date Jun 26, 2018
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound for forming organic film, and organic film composition usi...
- Patent number 9,977,330
- Issue date May 22, 2018
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming a coating type BPSG film, substrate, and pa...
- Patent number 9,902,875
- Issue date Feb 27, 2018
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming a coating type silicon-containing film, sub...
- Patent number 9,880,470
- Issue date Jan 30, 2018
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer for resist under layer film composition, resist under layer...
- Patent number 9,805,943
- Issue date Oct 31, 2017
- Shin-Etsu Chemical Co., Ltd.
- Rie Kikuchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wet strippable gap fill materials
- Patent number 9,671,694
- Issue date Jun 6, 2017
- International Business Machines Corporation
- Martin Glodde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming a coating type BPSG film, substrate formed...
- Patent number 9,627,204
- Issue date Apr 18, 2017
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process using a boron phosphorus silicon glass film
- Patent number 9,580,623
- Issue date Feb 28, 2017
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine-containing silicon compound, method for producing same, an...
- Patent number 9,522,979
- Issue date Dec 20, 2016
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Wet strip process for an antireflective coating layer
- Patent number 9,460,934
- Issue date Oct 4, 2016
- GLOBALFOUNDRIES Inc.
- Martin Glodde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compositon for forming metal oxide-containing film and patterning p...
- Patent number 9,377,690
- Issue date Jun 28, 2016
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organic film composition, method for forming organic film and patte...
- Patent number 9,372,404
- Issue date Jun 21, 2016
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240377730
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20240345480
- Publication date Oct 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Silicon-Containing Resist Underlayer Film A...
- Publication number 20240319598
- Publication date Sep 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takehiro SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240272550
- Publication date Aug 15, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240116958
- Publication date Apr 11, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Composition For Forming Adhesive Film, Patterning Process, And Meth...
- Publication number 20240103370
- Publication date Mar 28, 2024
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern Forming Method
- Publication number 20240103365
- Publication date Mar 28, 2024
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20230367211
- Publication date Nov 16, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HY...
- Publication number 20230260787
- Publication date Aug 17, 2023
- Shin-Etsu Chemical Co., Ltd.
- Keisuke NIIDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER
- Publication number 20220214618
- Publication date Jul 7, 2022
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, COMPOUND, AN...
- Publication number 20220214617
- Publication date Jul 7, 2022
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMI...
- Publication number 20210311395
- Publication date Oct 7, 2021
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MATERIAL FOR FORMING ORGANIC, FILM PATTERNING PROCESS, AND POLYMER
- Publication number 20210269597
- Publication date Sep 2, 2021
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST MATERIAL AND PATTERNING PROCESS
- Publication number 20210063873
- Publication date Mar 4, 2021
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST MATERIAL AND PATTERNING PROCESS
- Publication number 20210063871
- Publication date Mar 4, 2021
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING S...
- Publication number 20210003920
- Publication date Jan 7, 2021
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMI...
- Publication number 20200381247
- Publication date Dec 3, 2020
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMI...
- Publication number 20200332062
- Publication date Oct 22, 2020
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMI...
- Publication number 20200333709
- Publication date Oct 22, 2020
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING...
- Publication number 20200216670
- Publication date Jul 9, 2020
- Shin-Etsu Chemical Co., Ltd.
- Toshiharu YANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING SILICON COMPOUND, AND SILICON COMPOUND
- Publication number 20200115400
- Publication date Apr 16, 2020
- Shin-Etsu Chemical Co., Ltd.
- Ryo MITSUI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND AND COMPOSITION FOR FORMING ORGANIC FILM
- Publication number 20190391493
- Publication date Dec 26, 2019
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOUND, METHOD FOR MANUFACTURING THE COMPOUND, AND COMPOSITION FO...
- Publication number 20190390000
- Publication date Dec 26, 2019
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND, COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUF...
- Publication number 20190300498
- Publication date Oct 3, 2019
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20190258160
- Publication date Aug 22, 2019
- Shin-Etsu Chemical Co., Ltd.
- Hironori Satoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING S...
- Publication number 20190198341
- Publication date Jun 27, 2019
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PURIFYING DIHYDROXYNAPHTHALENE
- Publication number 20190194102
- Publication date Jun 27, 2019
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR PRODUCING DIHYDROXYNAPHTHALENE CONDENSATE AND DIHYDROXYN...
- Publication number 20190194391
- Publication date Jun 27, 2019
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST MULTILAYER FILM-ATTACHED SUBSTRATE AND PATTERNING PROCESS
- Publication number 20190041753
- Publication date Feb 7, 2019
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM
- Publication number 20190041752
- Publication date Feb 7, 2019
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Seiichiro Tachibana

Person

Patents Grantslast 30 patents

Resist material and patterning process

Resist material and patterning process

Material for forming organic film, substrate for manufacturing semi...

Material for forming organic film, patterning process, and polymer

Material for forming organic film, substrate for manufacturing semi...

Material for forming organic film, substrate for manufacturing semi...

Composition for forming organic film, substrate for manufacturing s...

Resist composition and patterning process

Material for forming organic film, substrate for manufacturing semi...

Thermosetting silicon-containing compound, composition for forming...

Compound, composition for forming organic film, substrate for manuf...

Method for producing dihydroxynaphthalene condensate and dihydroxyn...

Composition for forming organic film

Compound and composition for forming organic film

Composition for forming organic film, substrate for manufacturing s...

Compound, method for manufacturing the compound, and composition fo...

Resist multilayer film-attached substrate and patterning process

Method for reducing metal of sugar-alcohol compound and sugar-alcoh...

Compound for forming organic film, and organic film composition usi...

Compound for forming organic film, and organic film composition usi...

Composition for forming a coating type BPSG film, substrate, and pa...

Composition for forming a coating type silicon-containing film, sub...

Polymer for resist under layer film composition, resist under layer...

Wet strippable gap fill materials

Composition for forming a coating type BPSG film, substrate formed...

Patterning process using a boron phosphorus silicon glass film

Fluorine-containing silicon compound, method for producing same, an...

Wet strip process for an antireflective coating layer

Compositon for forming metal oxide-containing film and patterning p...

Organic film composition, method for forming organic film and patte...

Patents Applicationslast 30 patents

RESIST COMPOSITION AND PATTERN FORMING PROCESS

MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS

Composition For Forming Silicon-Containing Resist Underlayer Film A...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

Compound For Forming Metal-Containing Film, Composition For Forming...

Composition For Forming Adhesive Film, Patterning Process, And Meth...

Pattern Forming Method

RESIST COMPOSITION AND PATTERNING PROCESS

COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HY...

MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER

MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, COMPOUND, AN...

MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMI...

MATERIAL FOR FORMING ORGANIC, FILM PATTERNING PROCESS, AND POLYMER

RESIST MATERIAL AND PATTERNING PROCESS

RESIST MATERIAL AND PATTERNING PROCESS

COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING S...

MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMI...

MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMI...

MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMI...

THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING...

METHOD FOR PRODUCING SILICON COMPOUND, AND SILICON COMPOUND

COMPOUND AND COMPOSITION FOR FORMING ORGANIC FILM

COMPOUND, METHOD FOR MANUFACTURING THE COMPOUND, AND COMPOSITION FO...

COMPOUND, COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUF...

RESIST COMPOSITION AND PATTERNING PROCESS

COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING S...

METHOD FOR PURIFYING DIHYDROXYNAPHTHALENE

METHOD FOR PRODUCING DIHYDROXYNAPHTHALENE CONDENSATE AND DIHYDROXYN...

RESIST MULTILAYER FILM-ATTACHED SUBSTRATE AND PATTERNING PROCESS

COMPOSITION FOR FORMING ORGANIC FILM