Seiji Iseda

Follow

Person

Katonah, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for etching a structure in a plasma chamber
- Patent number 7,799,237
- Issue date Sep 21, 2010
- Sony Corporation
- Seiji Iseda
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR ETCHING A STRUCTURE IN A PLASMA CHAMBER
- Publication number 20100320170
- Publication date Dec 23, 2010
- SONY CORPORATION
- Seiji Iseda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for etching a structure in a plasma chamber
- Publication number 20070272358
- Publication date Nov 29, 2007
- Seiji Iseda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYSILICON ETCHING METHODS
- Publication number 20070056930
- Publication date Mar 15, 2007
- International Business Machines Corporation
- Seiji Iseda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Removal spacer formation with carbon film
- Publication number 20060166423
- Publication date Jul 27, 2006
- Seiji Iseda
- H01 - BASIC ELECTRIC ELEMENTS