Seiji Katsuoka

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus, substrate processing method, substr...
- Patent number 11,426,834
- Issue date Aug 30, 2022
- Ebara Corporation
- Mitsuru Miyazaki
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing apparatus, substrate processing method, substr...
- Patent number 10,486,285
- Issue date Nov 26, 2019
- Ebara Corporation
- Mitsuru Miyazaki
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing apparatus, substrate processing method, substr...
- Patent number 9,687,957
- Issue date Jun 27, 2017
- Ebara Corporation
- Mitsuru Miyazaki
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing apparatus, substrate processing method, substr...
- Patent number 9,358,662
- Issue date Jun 7, 2016
- Ebara Corporation
- Mitsuru Miyazaki
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus and polishing method
- Patent number 9,144,881
- Issue date Sep 29, 2015
- Ebara Corporation
- Hidetaka Nakao
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing apparatus, substrate processing method, substr...
- Patent number 8,795,032
- Issue date Aug 5, 2014
- Ebara Corporation
- Mitsuru Miyazaki
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate holding apparatus, substrate holding method, and substrat...
- Patent number 8,777,198
- Issue date Jul 15, 2014
- Ebara Corporation
- Masahiko Sekimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for polishing object
- Patent number 8,257,143
- Issue date Sep 4, 2012
- Ebara Corporation
- Seiji Katsuoka
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing method and apparatus
- Patent number 8,225,803
- Issue date Jul 24, 2012
- Ebara Corporation
- Seiji Katsuoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate holding apparatus, substrate holding method, and substrat...
- Patent number 8,141,513
- Issue date Mar 27, 2012
- Ebara Corporation
- Masahiko Sekimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holder, plating apparatus, and plating method
- Patent number 8,133,376
- Issue date Mar 13, 2012
- Ebara Corporation
- Junichiro Yoshioka
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Hand having rocking mechanism and substrate delivering device havin...
- Patent number 8,038,136
- Issue date Oct 18, 2011
- Kabushiki Kaisha Yaskawa Denki
- Hiroki Sanemasa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Substrate polishing apparatus and method
- Patent number 7,976,362
- Issue date Jul 12, 2011
- Ebara Corporation
- Seiji Katsuoka
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing method and apparatus
- Patent number 7,959,977
- Issue date Jun 14, 2011
- Ebara Corporation
- Seiji Katsuoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate holding apparatus, substrate holding method, and substrat...
- Patent number 7,886,685
- Issue date Feb 15, 2011
- Ebara Corporation
- Masahiko Sekimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holder, plating apparatus, and plating method
- Patent number 7,807,027
- Issue date Oct 5, 2010
- Ebara Corporation
- Junichiro Yoshioka
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Substrate processing method and apparatus
- Patent number 7,735,451
- Issue date Jun 15, 2010
- Ebara Corporation
- Seiji Katsuoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate holding apparatus
- Patent number 7,735,450
- Issue date Jun 15, 2010
- Ebara Corporation
- Seiji Katsuoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate polishing apparatus and method
- Patent number 7,585,205
- Issue date Sep 8, 2009
- Ebara Corporation
- Seiji Katsuoka
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 7,575,636
- Issue date Aug 18, 2009
- Ebara Corporation
- Seiji Katsuoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 7,442,257
- Issue date Oct 28, 2008
- Ebara Corporation
- Seiji Katsuoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrolytic processing apparatus and substrate processing method
- Patent number 7,374,646
- Issue date May 20, 2008
- Ebara Corporation
- Hidenao Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing unit and substrate processing apparatus
- Patent number 7,368,016
- Issue date May 6, 2008
- Ebara Corporation
- Seiji Katsuoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for and method of processing substrate
- Patent number 7,341,634
- Issue date Mar 11, 2008
- Ebara Corporation
- Toshio Yokoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 7,235,135
- Issue date Jun 26, 2007
- Ebara Corporation
- Mitsuru Miyazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing apparatus
- Patent number 7,101,255
- Issue date Sep 5, 2006
- Ebara Corporation
- Seiji Katsuoka
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 7,087,117
- Issue date Aug 8, 2006
- Ebara Corporation
- Seiji Katsuoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Polishing apparatus
- Patent number 6,918,814
- Issue date Jul 19, 2005
- Ebara Corporation
- Seiji Katsuoka
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate holder, plating apparatus, and plating method
- Patent number 6,844,274
- Issue date Jan 18, 2005
- Ebara Corporation
- Junichiro Yoshioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing apparatus
- Patent number 6,629,883
- Issue date Oct 7, 2003
- Ebara Corporation
- Seiji Katsuoka
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, SUBSTR...
- Publication number 20200047309
- Publication date Feb 13, 2020
- Mitsuru MIYAZAKI
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, SUBSTR...
- Publication number 20170252894
- Publication date Sep 7, 2017
- EBARA CORPORATION
- Mitsuru Miyazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, SUBSTR...
- Publication number 20150050863
- Publication date Feb 19, 2015
- EBARA CORPORATION
- Mitsuru MIYAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, SUBSTR...
- Publication number 20140302676
- Publication date Oct 9, 2014
- Mitsuru MIYAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING APPARATUS AND POLISHING METHOD
- Publication number 20140242885
- Publication date Aug 28, 2014
- Hidetaka Nakao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HOLDING APPARATUS, SUBSTRATE HOLDING METHOD, AND SUBSTRAT...
- Publication number 20120141246
- Publication date Jun 7, 2012
- Masahiko Sekimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE POLISHING APPARATUS AND METHOD
- Publication number 20110237163
- Publication date Sep 29, 2011
- Seiji Katsuoka
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND APPARATUS
- Publication number 20110203518
- Publication date Aug 25, 2011
- Seiji Katsuoka
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SUBSTRATE HOLDING APPARATUS, SUBSTRATE HOLDING METHOD, AND SUBSTRAT...
- Publication number 20110094442
- Publication date Apr 28, 2011
- Masahiko Sekimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HOLDER, PLATING APPARATUS, AND PLATING METHOD
- Publication number 20100320090
- Publication date Dec 23, 2010
- Junichiro Yoshioka
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SUBSTRATE PROCESSING METHOD AND APPARATUS
- Publication number 20100221432
- Publication date Sep 2, 2010
- Seiji Katsuoka
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Substrate processing apparatus, substrate processing method, substr...
- Publication number 20090305612
- Publication date Dec 10, 2009
- EBARA CORPORATION
- Mitsuru Miyazaki
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE POLISHING APPARATUS AND METHOD
- Publication number 20090291624
- Publication date Nov 26, 2009
- Seiji Katsuoka
- B24 - GRINDING POLISHING
Information Patent Application
HAND HAVING ROCKING MECHANISM AND SUBSTRATE DELIVERING DEVICE HAVIN...
- Publication number 20090236786
- Publication date Sep 24, 2009
- KABUSHIKI KAISHA YASKAWA DENKI
- Hiroki SANEMASA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for polishing object
- Publication number 20090209176
- Publication date Aug 20, 2009
- EBARA CORPORATION
- Seiji Katsuoka
- B24 - GRINDING POLISHING
Information Patent Application
Substrate processing unit and substrate processing apparatus
- Publication number 20080178800
- Publication date Jul 31, 2008
- Seiji Katsuoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate polishing apparatus and method
- Publication number 20080085658
- Publication date Apr 10, 2008
- Seiji Katsuoka
- B24 - GRINDING POLISHING
Information Patent Application
Substrate Cleaning Apparatus and Substrate Processing Unit
- Publication number 20070277930
- Publication date Dec 6, 2007
- Toshi Yokoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20070214620
- Publication date Sep 20, 2007
- Mitsuru Miyazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate holding apparatus, substrate holding method, and substrat...
- Publication number 20070070575
- Publication date Mar 29, 2007
- Masahiko Sekimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20060243205
- Publication date Nov 2, 2006
- Seiji Katsuoka
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20060243204
- Publication date Nov 2, 2006
- Seiji Katsuoka
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20060236929
- Publication date Oct 26, 2006
- Seiji Katsuoka
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Substrate processing unit and substrate processing apparatus
- Publication number 20050281947
- Publication date Dec 22, 2005
- Seiji Katsuoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate processing apparatus
- Publication number 20050236268
- Publication date Oct 27, 2005
- Koji Mishima
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Polishing apparatus
- Publication number 20050227596
- Publication date Oct 13, 2005
- Seiji Katsuoka
- B24 - GRINDING POLISHING
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20050158478
- Publication date Jul 21, 2005
- Seiji Katsuoka
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Substrate holder, plating apparatus, and plating method
- Publication number 20050092600
- Publication date May 5, 2005
- Junichiro Yoshioka
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20050072358
- Publication date Apr 7, 2005
- Seiji Katsuoka
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method and apparatus for controlling electrolytic solution
- Publication number 20050051434
- Publication date Mar 10, 2005
- Koji Mishima
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Seiji Katsuoka

Person

Patents Grantslast 30 patents

Substrate processing apparatus, substrate processing method, substr...

Substrate processing apparatus, substrate processing method, substr...

Substrate processing apparatus, substrate processing method, substr...

Substrate processing apparatus, substrate processing method, substr...

Polishing apparatus and polishing method

Substrate processing apparatus, substrate processing method, substr...

Substrate holding apparatus, substrate holding method, and substrat...

Method and apparatus for polishing object

Substrate processing method and apparatus

Substrate holding apparatus, substrate holding method, and substrat...

Substrate holder, plating apparatus, and plating method

Hand having rocking mechanism and substrate delivering device havin...

Substrate polishing apparatus and method

Substrate processing method and apparatus

Substrate holding apparatus, substrate holding method, and substrat...

Substrate holder, plating apparatus, and plating method

Substrate processing method and apparatus

Substrate holding apparatus

Substrate polishing apparatus and method

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Electrolytic processing apparatus and substrate processing method

Substrate processing unit and substrate processing apparatus

Apparatus for and method of processing substrate

Substrate processing apparatus and substrate processing method

Polishing apparatus

Substrate processing apparatus and substrate processing method

Polishing apparatus

Substrate holder, plating apparatus, and plating method

Polishing apparatus

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, SUBSTR...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, SUBSTR...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, SUBSTR...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, SUBSTR...

POLISHING APPARATUS AND POLISHING METHOD

SUBSTRATE HOLDING APPARATUS, SUBSTRATE HOLDING METHOD, AND SUBSTRAT...

SUBSTRATE POLISHING APPARATUS AND METHOD

SUBSTRATE PROCESSING METHOD AND APPARATUS

SUBSTRATE HOLDING APPARATUS, SUBSTRATE HOLDING METHOD, AND SUBSTRAT...

SUBSTRATE HOLDER, PLATING APPARATUS, AND PLATING METHOD

SUBSTRATE PROCESSING METHOD AND APPARATUS

Substrate processing apparatus, substrate processing method, substr...

SUBSTRATE POLISHING APPARATUS AND METHOD

HAND HAVING ROCKING MECHANISM AND SUBSTRATE DELIVERING DEVICE HAVIN...

Method and apparatus for polishing object

Substrate processing unit and substrate processing apparatus

Substrate polishing apparatus and method

Substrate Cleaning Apparatus and Substrate Processing Unit

Substrate processing apparatus and substrate processing method

Substrate holding apparatus, substrate holding method, and substrat...

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Substrate processing unit and substrate processing apparatus

Substrate processing apparatus

Polishing apparatus

Substrate processing apparatus and substrate processing method

Substrate holder, plating apparatus, and plating method

Substrate processing apparatus and substrate processing method

Method and apparatus for controlling electrolytic solution