Seiji NAGAHARA

Person

Sagamihara, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of simulating resist pattern, resist material and method of...
- Patent number 11,353,793
- Issue date Jun 7, 2022
- Tokyo Electron Limited
- Seiji Nagahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and process for stochastic driven detectivity healing
- Patent number 11,163,236
- Issue date Nov 2, 2021
- Tokyo Electron Limited
- Michael Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for sensitizing photoresist using flood exposures
- Patent number 11,061,332
- Issue date Jul 13, 2021
- Tokyo Electron Limited
- Michael A. Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical processing apparatus and substrate processing apparatus
- Patent number 10,747,121
- Issue date Aug 18, 2020
- Tokyo Electron Limited
- Teruhiko Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus, exposure apparatus adjustment method and storag...
- Patent number 10,558,125
- Issue date Feb 11, 2020
- Tokyo Electron Limited
- Teruhiko Moriya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and techniques to use with photosensitized chemically ampli...
- Patent number 10,534,266
- Issue date Jan 14, 2020
- Tokyo Electron Limited
- Michael A. Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical processing apparatus, coating/development apparatus, optica...
- Patent number 10,527,948
- Issue date Jan 7, 2020
- Tokyo Electron Limited
- Seiji Nagahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photo-sensitized chemically amplified resist (PS-CAR) simulation
- Patent number 10,429,745
- Issue date Oct 1, 2019
- Osaka University
- Michael Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, exposure method and storage medium
- Patent number 10,274,843
- Issue date Apr 30, 2019
- Tokyo Electron Limited
- Seiji Nagahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus, resist pattern forming method, and storage medium
- Patent number 10,101,669
- Issue date Oct 16, 2018
- Tokyo Electron Limited
- Seiji Nagahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist-pattern-forming method and chemically amplified resist material
- Patent number 10,073,348
- Issue date Sep 11, 2018
- Osaka University
- Hisashi Nakagawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified resist material, pattern-forming method, compo...
- Patent number 10,073,349
- Issue date Sep 11, 2018
- Osaka University
- Hisashi Nakagawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitization chemical-amplification type resist material, met...
- Patent number 10,025,187
- Issue date Jul 17, 2018
- Tokyo Electron Limited
- Seiji Nagahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treatment system
- Patent number 10,025,190
- Issue date Jul 17, 2018
- Tokyo Electron Limited
- Seiji Nagahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method
- Patent number 9,971,247
- Issue date May 15, 2018
- Osaka University
- Hisashi Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and techniques to use with photosensitized chemically ampli...
- Patent number 9,618,848
- Issue date Apr 11, 2017
- Tokyo Electron Limited
- Michael A. Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology for measurement of photosensitizer concentration within p...
- Patent number 9,519,227
- Issue date Dec 13, 2016
- Tokyo Electron Limited
- Michael A. Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming wiring structure by using photo resist having opt...
- Patent number 6,774,028
- Issue date Aug 10, 2004
- NEC Electronics Corporation
- Seiji Nagahara
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PHOTORESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD...
- Publication number 20240288768
- Publication date Aug 29, 2024
- TOKYO ELECTRON LIMITED
- Seiji NAGAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING SEMICONDUCT...
- Publication number 20240126175
- Publication date Apr 18, 2024
- TOKYO ELECTRON LIMITED
- Seiji NAGAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Modified Thioxanthone Photoinitiators
- Publication number 20230082557
- Publication date Mar 16, 2023
- LINTFIELD LIMITED
- Christopher WALL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Hybrid Development of EUV Resists
- Publication number 20230078946
- Publication date Mar 16, 2023
- TOKYO ELECTRON LIMITED
- Steven Grzeskowiak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thioxanthone Derivatives, Composition Comprising the Same and Patte...
- Publication number 20210277017
- Publication date Sep 9, 2021
- LINTFIELD LIMITED
- Christopher Wall
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Method and Process for Stochastic Driven Defectivity Healing
- Publication number 20210048749
- Publication date Feb 18, 2021
- TOKYO ELECTRON LIMITED
- Michael Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist Composition and Resist Pattern Forming Method
- Publication number 20200201176
- Publication date Jun 25, 2020
- TOKYO ELECTRON LIMITED
- Seiji NAGAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF SIMULATING RESIST PATTERN, RESIST MATERIAL AND METHOD OF...
- Publication number 20200057371
- Publication date Feb 20, 2020
- TOKYO ELECTRON LIMITED
- Seiji NAGAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR SENSITIZING PHOTORESIST USING FLOOD EXPOSURES
- Publication number 20190094698
- Publication date Mar 28, 2019
- TOKYO ELECTRON LIMITED
- Michael A. Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL PROCESSING APPARATUS, COATING/DEVELOPMENT APPARATUS, OPTICA...
- Publication number 20180173103
- Publication date Jun 21, 2018
- TOKYO ELECTRON LIMITED
- Seiji NAGAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20180164696
- Publication date Jun 14, 2018
- TOKYO ELECTRON LIMITED
- Teruhiko MORIYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD AND STORAGE MEDIUM
- Publication number 20180143540
- Publication date May 24, 2018
- TOKYO ELECTRON LIMITED
- Seiji NAGAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE APPARATUS ADJUSTMENT METHOD AND STORAG...
- Publication number 20180136567
- Publication date May 17, 2018
- TOKYO ELECTRON LIMITED
- Teruhiko MORIYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photo-sensitized Chemically Amplified Resist (PS-CAR) simulation
- Publication number 20170242342
- Publication date Aug 24, 2017
- TOKYO ELECTRON LIMITED
- Michael Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND TECHNIQUES TO USE WITH PHOTOSENSITIZED CHEMICALLY AMPLI...
- Publication number 20170192357
- Publication date Jul 6, 2017
- TOKYO ELECTRON LIMITED
- Michael A. CARCASI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20170052450
- Publication date Feb 23, 2017
- Osaka University
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST-PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RESIST MATERIAL
- Publication number 20170052448
- Publication date Feb 23, 2017
- Osaka University
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPO...
- Publication number 20170052449
- Publication date Feb 23, 2017
- Osaka University
- HISASHI NAKAGAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SUBSTRATE TREATMENT SYSTEM
- Publication number 20170031245
- Publication date Feb 2, 2017
- TOKYO ELECTRON LIMITED
- Seiji NAGAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, MET...
- Publication number 20160357103
- Publication date Dec 8, 2016
- Tokyo Electron Limited
- Seiji NAGAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, RESIST PATTERN FORMING METHOD, AND STORAGE MEDIUM
- Publication number 20160327869
- Publication date Nov 10, 2016
- TOKYO ELECTRON LIMITED
- Seiji NAGAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and Techniques to use with Photosensitized Chemically Ampli...
- Publication number 20150241783
- Publication date Aug 27, 2015
- TOKYO ELECTRON LIMITED
- Michael A. CARCASI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY FOR MEASUREMENT OF PHOTOSENSITIZER CONCENTRATION WITHIN P...
- Publication number 20150241793
- Publication date Aug 27, 2015
- Michael A. CARCASI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING WIRING STRUCTURE BY USING PHOTO RESIST HAVING OPT...
- Publication number 20020192945
- Publication date Dec 19, 2002
- NEC Corporation
- Seiji Nagahara
- H01 - BASIC ELECTRIC ELEMENTS

Seiji NAGAHARA

Person

Patents Grantslast 30 patents

Method of simulating resist pattern, resist material and method of...

Method and process for stochastic driven detectivity healing

Methods for sensitizing photoresist using flood exposures

Optical processing apparatus and substrate processing apparatus

Exposure apparatus, exposure apparatus adjustment method and storag...

Methods and techniques to use with photosensitized chemically ampli...

Optical processing apparatus, coating/development apparatus, optica...

Photo-sensitized chemically amplified resist (PS-CAR) simulation

Exposure apparatus, exposure method and storage medium

Exposure apparatus, resist pattern forming method, and storage medium

Resist-pattern-forming method and chemically amplified resist material

Chemically amplified resist material, pattern-forming method, compo...

Photosensitization chemical-amplification type resist material, met...

Substrate treatment system

Pattern-forming method

Methods and techniques to use with photosensitized chemically ampli...

Metrology for measurement of photosensitizer concentration within p...

Method of forming wiring structure by using photo resist having opt...

Patents Applicationslast 30 patents

PHOTORESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD...

METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING SEMICONDUCT...

Modified Thioxanthone Photoinitiators

Hybrid Development of EUV Resists

Thioxanthone Derivatives, Composition Comprising the Same and Patte...

Method and Process for Stochastic Driven Defectivity Healing

Resist Composition and Resist Pattern Forming Method

METHOD OF SIMULATING RESIST PATTERN, RESIST MATERIAL AND METHOD OF...

METHODS FOR SENSITIZING PHOTORESIST USING FLOOD EXPOSURES

OPTICAL PROCESSING APPARATUS, COATING/DEVELOPMENT APPARATUS, OPTICA...

OPTICAL PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS

EXPOSURE APPARATUS, EXPOSURE METHOD AND STORAGE MEDIUM

EXPOSURE APPARATUS, EXPOSURE APPARATUS ADJUSTMENT METHOD AND STORAG...

Photo-sensitized Chemically Amplified Resist (PS-CAR) simulation

METHODS AND TECHNIQUES TO USE WITH PHOTOSENSITIZED CHEMICALLY AMPLI...

PATTERN-FORMING METHOD

RESIST-PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RESIST MATERIAL

CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPO...

SUBSTRATE TREATMENT SYSTEM

PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, MET...

EXPOSURE APPARATUS, RESIST PATTERN FORMING METHOD, AND STORAGE MEDIUM

Methods and Techniques to use with Photosensitized Chemically Ampli...

METROLOGY FOR MEASUREMENT OF PHOTOSENSITIZER CONCENTRATION WITHIN P...

METHOD OF FORMING WIRING STRUCTURE BY USING PHOTO RESIST HAVING OPT...