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Seiji Samukawa
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Tokyo, JP
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last 30 patents
Information
Patent Grant
Plasma processing with energy supplied
Patent number
6,348,158
Issue date
Feb 19, 2002
NEC Corporation
Seiji Samukawa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Process and apparatus for treating a substrate
Patent number
6,177,147
Issue date
Jan 23, 2001
NEC Corporation
Seiji Samukawa
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method for plasma treatment and apparatus for plasma treatment
Patent number
6,054,063
Issue date
Apr 25, 2000
NEC Corporation
Hiroto Ohtake
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus
Patent number
6,043,608
Issue date
Mar 28, 2000
NEC Corporation
Seiji Samukawa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus for producing plasma at low electron te...
Patent number
5,936,352
Issue date
Aug 10, 1999
NEC Corporation
Seiji Samukawa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma generator with a shield interposing the antenna
Patent number
5,900,699
Issue date
May 4, 1999
NEC Corporation
Seiji Samukawa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing method and equipment used therefor
Patent number
5,827,435
Issue date
Oct 27, 1998
NEC Corporation
Seiji Samukawa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Neutral particle beam irradiation apparatus
Patent number
5,818,040
Issue date
Oct 6, 1998
NEC Corporation
Keizo Kinoshita
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Mass spectrometer and radical measuring method
Patent number
5,744,796
Issue date
Apr 28, 1998
NEC Corporation
Keizo Kinoshita
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus which uses a uniquely shaped antenna to...
Patent number
5,565,738
Issue date
Oct 15, 1996
NEC Corporation
Seiji Samukawa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma-etching method and apparatus therefor
Patent number
5,468,341
Issue date
Nov 21, 1995
NEC Corporation
Seiji Samukawa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Radio frequency electron cyclotron resonance plasma etching apparatus
Patent number
5,401,351
Issue date
Mar 28, 1995
NEC Corporation
Seiji Samukawa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma formation using electron cyclotron resonance and method for...
Patent number
5,366,586
Issue date
Nov 22, 1994
NEC Corporation
Seiji Samukawa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Microwave plasma etching method and apparatus
Patent number
5,013,401
Issue date
May 7, 1991
NEC Corporation
Seiji Samukawa
H01 - BASIC ELECTRIC ELEMENTS