Seiji Samukawa

Person

Imosawa Aoba-ku Sendai-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of forming structures using a neutral beam
- Patent number 12,129,548
- Issue date Oct 29, 2024
- ASM IP Holding B.V.
- Tomohiro Kubota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming structures using a neutral beam
- Patent number 11,643,724
- Issue date May 9, 2023
- ASM IP Holding B.V.
- Tomohiro Kubota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System, method, and program for predicting processing shape by plas...
- Patent number 9,620,338
- Issue date Apr 11, 2017
- MIZUHO INFORMATION & RESEARCH INSTITUTE, INC.
- Seiji Samukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma monitoring method and plasma monitoring system
- Patent number 9,412,567
- Issue date Aug 9, 2016
- Lapis Semiconductor Co., Ltd.
- Tomohiko Tatsumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for etching film having transition metal
- Patent number 9,096,937
- Issue date Aug 4, 2015
- Tokyo Electron Limited
- Xun Gu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma monitoring method and plasma monitoring system
- Patent number 9,005,461
- Issue date Apr 14, 2015
- Lapis Semiconductor Co., Ltd.
- Tomohiko Tatsumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low dielectric constant insulating film and method for forming the...
- Patent number 8,828,886
- Issue date Sep 9, 2014
- Tohoku University
- Seiji Samukawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma monitoring method
- Patent number 8,427,168
- Issue date Apr 23, 2013
- Oki Semiconductor Co., Ltd.
- Tomohiko Tatsumi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of measuring resistivity of sidewall of contact hole
- Patent number 7,923,268
- Issue date Apr 12, 2011
- Oki Semiconductor Co., Ltd.
- Youichi Yatagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method and production method of magnetic memory device
- Patent number 7,808,026
- Issue date Oct 5, 2010
- Sony Corporation
- Toshiaki Shiraiwa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ultraviolet light monitoring system
- Patent number 7,732,783
- Issue date Jun 8, 2010
- Oki Semiconductor Co., Ltd.
- Jun Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
On-wafer monitoring system
- Patent number 7,520,956
- Issue date Apr 21, 2009
- Tohoku Techno Arch Co., Ltd.
- Seiji Samukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method and production method of magnetic memory device
- Patent number 7,473,646
- Issue date Jan 6, 2009
- Sony Corporation
- Toshiaki Shiraiwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and apparatus
- Patent number 7,314,574
- Issue date Jan 1, 2008
- Ebara Corporation
- Katsunori Ichiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real-time monitoring apparatus for plasma process
- Patent number 7,184,134
- Issue date Feb 27, 2007
- Semiconductor Technology Academic Research Center
- Seiji Samukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and apparatus
- Patent number 7,144,520
- Issue date Dec 5, 2006
- Ebara Corporation
- Katsunori Ichiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam source and beam processing apparatus
- Patent number 7,078,862
- Issue date Jul 18, 2006
- Ebara Corporation
- Akira Fukuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam source and beam processing apparatus
- Patent number 7,034,285
- Issue date Apr 25, 2006
- Ebara Corporation
- Katsunori Ichiki
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma surface treatment system and plasma surface treatment method
- Patent number 7,000,565
- Issue date Feb 21, 2006
- Sony Corporation
- Seiichi Fukuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Neutral particle beam processing apparatus
- Patent number 6,909,086
- Issue date Jun 21, 2005
- Ebara Corporation
- Seiji Samukawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of processing a surface of a workpiece
- Patent number 6,909,087
- Issue date Jun 21, 2005
- Ebara Corporation
- Katsunori Ichiki
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Neutral particle beam processing apparatus
- Patent number 6,861,643
- Issue date Mar 1, 2005
- Ebara Corporation
- Katsunori Ichiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Neutral particle beam processing apparatus
- Patent number 6,861,642
- Issue date Mar 1, 2005
- Ebara Corporation
- Katsunori Ichiki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Neutral particle beam processing apparatus
- Patent number 6,858,838
- Issue date Feb 22, 2005
- Ebara Corporation
- Katsunori Ichiki
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Beam processing apparatus
- Patent number 6,849,857
- Issue date Feb 1, 2005
- Ebara Corporation
- Katsunori Ichiki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FORMING STRUCTURES USING A NEUTRAL BEAM, STRUCTURES FORME...
- Publication number 20230250531
- Publication date Aug 10, 2023
- ASM IP HOLDING B.V.
- Tomohiro Kubota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MOLDING DIE AND LENS
- Publication number 20210247550
- Publication date Aug 12, 2021
- TOHOKU TECHNO ARCH CO., LTD.
- Seiji SAMUKAWA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
METHOD OF FORMING STRUCTURES USING A NEUTRAL BEAM, STRUCTURES FORME...
- Publication number 20210017648
- Publication date Jan 21, 2021
- ASM IP HOLDING B.V.
- Tomohiro Kubota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THERMOELECTRIC CONVERSION MATERIAL AND METHOD FOR PRODUCING SAME
- Publication number 20180212131
- Publication date Jul 26, 2018
- CENTRAL GLASS COMPANY, LIMITED
- Akiou KIKUCHI
- C01 - INORGANIC CHEMISTRY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20170253972
- Publication date Sep 7, 2017
- TOKYO ELECTRON LIMITED
- Kiyotaka ISHIBASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20170011886
- Publication date Jan 12, 2017
- TOKYO ELECTRON LIMITED
- Toshihisa NOZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND HEAT TREATMENT APPARATUS
- Publication number 20160336190
- Publication date Nov 17, 2016
- TOKYO ELECTRON LIMITED
- Yoshiyuki KIKUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR ETCHING GROUP III-V SEMICONDUCTOR AND APPARATUS FOR ETCH...
- Publication number 20160211145
- Publication date Jul 21, 2016
- TOKYO ELECTRON LIMITED
- Xun Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBON FILM FORMATION METHOD, AND CARBON FILM
- Publication number 20160017484
- Publication date Jan 21, 2016
- Tohoku University
- Yoshiyuki KIKUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS, METHOD OF FORMING LOW-PERMITTIVITY FILM, Si...
- Publication number 20150214015
- Publication date Jul 30, 2015
- Tohoku University
- Yoshiyuki Kikuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20150197853
- Publication date Jul 16, 2015
- TOHOKU TECHNO ARCH CO., LTD.
- Kiyotaka ISHIBASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA MONITORING METHOD AND PLASMA MONITORING SYSTEM
- Publication number 20150179417
- Publication date Jun 25, 2015
- LAPIS SEMICONDUCTOR CO., LTD.
- Tomohiko TATSUMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR ETCHING FILM HAVING TRANSITION METAL
- Publication number 20140291288
- Publication date Oct 2, 2014
- Tohoku University
- Xun GU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
QUANTUM NANODOTS, TWO-DIMENSIONAL QUANTUM NANODOT ARRAY AS WELL AS...
- Publication number 20140116502
- Publication date May 1, 2014
- TOHOKU UNIVERSITY
- Seiji Samukawa
- B82 - NANO-TECHNOLOGY
Information Patent Application
SYSTEM, METHOD, AND PROGRAM FOR PREDICTING PROCESSING SHAPE BY PLAS...
- Publication number 20130013253
- Publication date Jan 10, 2013
- TOHOKU TECHNOARCH CO., LTD.
- Seiji Samukawa
- G01 - MEASURING TESTING
Information Patent Application
NANOSTRUCTURE FORMING METHOD AND BASE HAVING NANOSTRUCTURE
- Publication number 20120308765
- Publication date Dec 6, 2012
- FUJIKURA LTD.
- Osamu NUKAGA
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SURFACE NANOSTRUCTURE FORMING METHOD AND BASE HAVING SURFACE NANOST...
- Publication number 20120295066
- Publication date Nov 22, 2012
- FUJIKURA LTD.
- Osamu NUKAGA
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
LOW DIELECTRIC CONSTANT INSULATING FILM AND METHOD FOR FORMING THE...
- Publication number 20120190212
- Publication date Jul 26, 2012
- Seiji SAMUKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA MONITORING METHOD
- Publication number 20100244861
- Publication date Sep 30, 2010
- Oki Semiconductor Co., Ltd.
- Tomohiko Tatsumi
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF MEASURING RESISTIVITY OF SIDEWALL OF CONTACT HOLE
- Publication number 20100068836
- Publication date Mar 18, 2010
- Youichi Yatagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20090325328
- Publication date Dec 31, 2009
- SEMICONDUCTOR TECHNOLOGY ACADEMIC RESEARCH CENTER
- Seiji Samukawa
- G01 - MEASURING TESTING
Information Patent Application
Plasma monitoring method and plasma monitoring system
- Publication number 20090058424
- Publication date Mar 5, 2009
- Oki Electric Industry Co., Ltd.
- Tomohiko Tatsumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ultraviolet light monitoring system
- Publication number 20090058432
- Publication date Mar 5, 2009
- Oki Electric Industry Co., Ltd.
- Jun Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dry etching method and production method of magnetic memory device
- Publication number 20080286883
- Publication date Nov 20, 2008
- SONY CORPORATION
- Toshiaki Shiraiwa
- B82 - NANO-TECHNOLOGY
Information Patent Application
Surface-treating apparatus
- Publication number 20080169064
- Publication date Jul 17, 2008
- Ushio Denki Kabushiki Kaisha
- Seiji Samukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Treatment Method and Plasma Etching Method
- Publication number 20080085604
- Publication date Apr 10, 2008
- SHOWA DENKO K.K.
- Yasuyuki Hoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dry etching process and method for manufacturing magnetic memory de...
- Publication number 20070026681
- Publication date Feb 1, 2007
- SONY CORPORATION
- Toshiaki Shiraiwa
- B82 - NANO-TECHNOLOGY
Information Patent Application
Deposition apparatus and deposition method
- Publication number 20060213444
- Publication date Sep 28, 2006
- TOKYO ELECTRON LIMITED
- Seiji Samukawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20050263247
- Publication date Dec 1, 2005
- Semiconductor Technology Academic Research Center
- Seiji Samukawa
- G01 - MEASURING TESTING
Information Patent Application
Real-time monitoring apparatus for plasma process
- Publication number 20050185171
- Publication date Aug 25, 2005
- Semiconductor Technology Academic Research Center
- Seiji Samukawa
- H01 - BASIC ELECTRIC ELEMENTS

Seiji Samukawa

Person

Patents Grantslast 30 patents

Method of forming structures using a neutral beam

Method of forming structures using a neutral beam

System, method, and program for predicting processing shape by plas...

Plasma monitoring method and plasma monitoring system

Method for etching film having transition metal

Plasma monitoring method and plasma monitoring system

Low dielectric constant insulating film and method for forming the...

Plasma monitoring method

Method of measuring resistivity of sidewall of contact hole

Dry etching method and production method of magnetic memory device

Ultraviolet light monitoring system

On-wafer monitoring system

Dry etching method and production method of magnetic memory device

Etching method and apparatus

Real-time monitoring apparatus for plasma process

Etching method and apparatus

Beam source and beam processing apparatus

Beam source and beam processing apparatus

Plasma surface treatment system and plasma surface treatment method

Neutral particle beam processing apparatus

Method of processing a surface of a workpiece

Neutral particle beam processing apparatus

Neutral particle beam processing apparatus

Neutral particle beam processing apparatus

Beam processing apparatus

Patents Applicationslast 30 patents

METHOD OF FORMING STRUCTURES USING A NEUTRAL BEAM, STRUCTURES FORME...

MOLDING DIE AND LENS

METHOD OF FORMING STRUCTURES USING A NEUTRAL BEAM, STRUCTURES FORME...

THERMOELECTRIC CONVERSION MATERIAL AND METHOD FOR PRODUCING SAME

SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

FILM FORMING METHOD AND HEAT TREATMENT APPARATUS

METHOD FOR ETCHING GROUP III-V SEMICONDUCTOR AND APPARATUS FOR ETCH...

CARBON FILM FORMATION METHOD, AND CARBON FILM

FILM FORMING APPARATUS, METHOD OF FORMING LOW-PERMITTIVITY FILM, Si...

SUBSTRATE PROCESSING APPARATUS

PLASMA MONITORING METHOD AND PLASMA MONITORING SYSTEM

METHOD FOR ETCHING FILM HAVING TRANSITION METAL

QUANTUM NANODOTS, TWO-DIMENSIONAL QUANTUM NANODOT ARRAY AS WELL AS...

SYSTEM, METHOD, AND PROGRAM FOR PREDICTING PROCESSING SHAPE BY PLAS...

NANOSTRUCTURE FORMING METHOD AND BASE HAVING NANOSTRUCTURE

SURFACE NANOSTRUCTURE FORMING METHOD AND BASE HAVING SURFACE NANOST...

LOW DIELECTRIC CONSTANT INSULATING FILM AND METHOD FOR FORMING THE...

PLASMA MONITORING METHOD

METHOD OF MEASURING RESISTIVITY OF SIDEWALL OF CONTACT HOLE

Plasma processing apparatus and plasma processing method

Plasma monitoring method and plasma monitoring system

Ultraviolet light monitoring system

Dry etching method and production method of magnetic memory device

Surface-treating apparatus

Plasma Treatment Method and Plasma Etching Method

Dry etching process and method for manufacturing magnetic memory de...

Deposition apparatus and deposition method

Plasma processing apparatus and plasma processing method

Real-time monitoring apparatus for plasma process