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Seiji TODOROKI
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Kawasaki-shi, JP
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Patents Grants
last 30 patents
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Patent Grant
Resist composition, method of forming resist pattern, and acid diff...
Patent number
11,762,288
Issue date
Sep 19, 2023
Tokyo Ohka Kogyo Co., Ltd.
Hiroto Yamazaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
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Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Publication number
20240302741
Publication date
Sep 12, 2024
Tokyo Ohka Kogyo Co., Ltd.
Shuichi Ishii
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR P...
Publication number
20240295812
Publication date
Sep 5, 2024
Tokyo Ohka Kogyo Co., Ltd.
Junichi Miyakawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
Publication number
20220011666
Publication date
Jan 13, 2022
Tokyo Ohka Kogyo Co., Ltd.
Koshi Onishi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND ACID DIFF...
Publication number
20210200089
Publication date
Jul 1, 2021
Tokyo Ohka Kogyo Co., Ltd.
Hiroto YAMAZAKI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210200088
Publication date
Jul 1, 2021
Tokyo Ohka Kogyo Co., Ltd.
Toshiaki YATSUNAMI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...