Seiji Tono

Person

Tokuyama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Quaternary alkylammonium hypochlorite solution, method for manufact...
- Patent number 11,572,533
- Issue date Feb 7, 2023
- Tokuyama Corporation
- Takafumi Shimoda
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Silicon etching solution and method for producing silicon device us...
- Patent number 11,466,206
- Issue date Oct 11, 2022
- Tokuyama Corporation
- Yoshiki Seike
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment liquid for semiconductor wafers, which contains hypochlor...
- Patent number 11,390,829
- Issue date Jul 19, 2022
- Tokuyama Corporation
- Takafumi Shimoda
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Photoresist developer and method for fabricating substrate by using...
- Patent number 8,808,976
- Issue date Aug 19, 2014
- Tokuyama Corporation
- Shunkichi Omae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern forming method and developer
- Patent number 8,703,402
- Issue date Apr 22, 2014
- Tokuyama Corporation
- Seiji Tono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning solution for removing residue
- Patent number 6,949,495
- Issue date Sep 27, 2005
- Tokuyama Corporation
- Mizuki Suto
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...

Patents Applicationslast 30 patents

Information Patent Application
SILICON ETCHING LIQUID, AND METHOD FOR PRODUCING SILICON DEVICES AN...
- Publication number 20240124775
- Publication date Apr 18, 2024
- Tokuyama Corporation
- Yoshiki Seike
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SILIC...
- Publication number 20240112917
- Publication date Apr 4, 2024
- Tokuyama Corporation
- Yoshiki SEIKE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICON ETCHING LIQUID, AND METHOD FOR PRODUCING SILICON DEVICE AND...
- Publication number 20230295499
- Publication date Sep 21, 2023
- Tokuyama Corporation
- Yoshiki Seike
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON ETCHING LIQUID, AND METHOD FOR PRODUCING SILICON DEVICE AND...
- Publication number 20230287270
- Publication date Sep 14, 2023
- Tokuyama Corporation
- Yoshiki Seike
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICON ETCHING LIQUID CONTAINING AROMATIC ALDEHYDE
- Publication number 20230136986
- Publication date May 4, 2023
- Tokuyama Corporation
- Naoto NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon Etching Solution and Method for Producing Silicon Device Us...
- Publication number 20220403242
- Publication date Dec 22, 2022
- Tokuyama Corporation
- Yoshiki SEIKE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Treatment Liquid for Semiconductor Wafers, Which Contains Hypochlor...
- Publication number 20220325205
- Publication date Oct 13, 2022
- Tokuyama Corporation
- Takafumi Shimoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon Etching Liquid
- Publication number 20220041931
- Publication date Feb 10, 2022
- Tokuyama Corporation
- Manami Oshio
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR PRODUCING ORGANIC SOLVENT SOLUTION OF QUATERNARY AMMONIU...
- Publication number 20220033343
- Publication date Feb 3, 2022
- Tokuyama Corporation
- Shoji TACHIBANA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SEMICONDUCTOR WAFER TREATMENT LIQUID CONTAINING HYPOCHLORITE IONS A...
- Publication number 20220010206
- Publication date Jan 13, 2022
- Tokuyama Corporation
- Takafumi SHIMODA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Quaternary Alkylammonium Hypochlorite Solution, Method for Manufact...
- Publication number 20210309942
- Publication date Oct 7, 2021
- Tokuyama Corporation
- Takafumi Shimoda
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Silicon Etching Solution, Method for Manufacturing Silicon Device U...
- Publication number 20210269716
- Publication date Sep 2, 2021
- Tokuyama Corporation
- Yoshiki Seike
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Treatment Liquid for Semiconductor Wafers, Which Contains Hypochlor...
- Publication number 20210062115
- Publication date Mar 4, 2021
- Tokuyama Corporation
- Takafumi Shimoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon Etching Solution and Method for Producing Silicon Device Us...
- Publication number 20200248076
- Publication date Aug 6, 2020
- Tokuyama Corporation
- Yoshiki SEIKE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST PATTERN FORMING METHOD AND DEVELOPER
- Publication number 20120107749
- Publication date May 3, 2012
- Tokuyama Corporation
- Seiji Tono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST DEVELOPER AND METHOD FOR FABRICATING SUBSTRATE BY USING...
- Publication number 20090130606
- Publication date May 21, 2009
- Shunkichi Omae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning solution for removing residue
- Publication number 20030004075
- Publication date Jan 2, 2003
- Mizuki Suto
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...

Person

Patents Grantslast 30 patents

Quaternary alkylammonium hypochlorite solution, method for manufact...

Silicon etching solution and method for producing silicon device us...

Treatment liquid for semiconductor wafers, which contains hypochlor...

Photoresist developer and method for fabricating substrate by using...

Resist pattern forming method and developer

Cleaning solution for removing residue

Patents Applicationslast 30 patents

SILICON ETCHING LIQUID, AND METHOD FOR PRODUCING SILICON DEVICES AN...

METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SILIC...

SILICON ETCHING LIQUID, AND METHOD FOR PRODUCING SILICON DEVICE AND...

SILICON ETCHING LIQUID, AND METHOD FOR PRODUCING SILICON DEVICE AND...

SILICON ETCHING LIQUID CONTAINING AROMATIC ALDEHYDE

Silicon Etching Solution and Method for Producing Silicon Device Us...

Treatment Liquid for Semiconductor Wafers, Which Contains Hypochlor...

Silicon Etching Liquid

METHOD FOR PRODUCING ORGANIC SOLVENT SOLUTION OF QUATERNARY AMMONIU...

SEMICONDUCTOR WAFER TREATMENT LIQUID CONTAINING HYPOCHLORITE IONS A...

Quaternary Alkylammonium Hypochlorite Solution, Method for Manufact...

Silicon Etching Solution, Method for Manufacturing Silicon Device U...

Treatment Liquid for Semiconductor Wafers, Which Contains Hypochlor...

Silicon Etching Solution and Method for Producing Silicon Device Us...

RESIST PATTERN FORMING METHOD AND DEVELOPER

PHOTORESIST DEVELOPER AND METHOD FOR FABRICATING SUBSTRATE BY USING...

Cleaning solution for removing residue