Seishi Murakami

Person

Yamanashi-Ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor film forming method using hydrazine-based compound gas
- Patent number 11,348,794
- Issue date May 31, 2022
- Tokyo Electron Limited
- Hideo Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and substrate loading mechanism
- Patent number 10,950,417
- Issue date Mar 16, 2021
- Tokyo Electron Limited
- Einosuke Tsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of removing silicon oxide film
- Patent number 10,546,753
- Issue date Jan 28, 2020
- Tokyo Electron Limited
- Hideaki Yamasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of removing silicon oxide film
- Patent number 10,504,740
- Issue date Dec 10, 2019
- Tokyo Electron Limited
- Hideaki Yamasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film formation device
- Patent number 10,221,478
- Issue date Mar 5, 2019
- Tokyo Electron Limited
- Kensaku Narushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxide film removing method, oxide film removing apparatus, contact...
- Patent number 9,984,892
- Issue date May 29, 2018
- Tokyo Electron Limited
- Takashi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming Ti film
- Patent number 9,620,370
- Issue date Apr 11, 2017
- Tokyo Electron Limited
- Seishi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming contact layer
- Patent number 9,349,642
- Issue date May 24, 2016
- Tokyo Electron Limited
- Seishi Murakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus and heater unit
- Patent number 8,106,335
- Issue date Jan 31, 2012
- Tokyo Electron Limited
- Seishi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation method, cleaning method and film formation apparatus
- Patent number 8,021,717
- Issue date Sep 20, 2011
- Tokyo Electron Limited
- Seishi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing system
- Patent number 7,351,291
- Issue date Apr 1, 2008
- Tokyo Electron Limited
- Seishi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD film formation method
- Patent number 6,169,032
- Issue date Jan 2, 2001
- Tokyo Electron Limited
- Seishi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming multilayered film
- Patent number 6,153,515
- Issue date Nov 28, 2000
- Tokyo Electron Limited
- Seishi Murakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum treatment apparatus and a method for manufacturing semicondu...
- Patent number RE36925
- Issue date Oct 31, 2000
- Tokyo Electron Kabushiki Kaisha
- Takayuki Ohba
- 134 - Cleaning and liquid contact with solids
Information Patent Grant
Liquid material supply apparatus and method
- Patent number 6,126,994
- Issue date Oct 3, 2000
- Tokyo Electron Limited
- Seishi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming a CVD film
- Patent number 5,963,834
- Issue date Oct 5, 1999
- Tokyo Electron Limited
- Tatsuo Hatano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Barrier metal layer
- Patent number 5,880,526
- Issue date Mar 9, 1999
- Tokyo Electron Limited
- Tatsuo Hatano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming and dry cleaning apparatus and method
- Patent number 5,709,757
- Issue date Jan 20, 1998
- Tokyo Electron Limited
- Tatsuo Hatano
- B08 - CLEANING
Information Patent Grant
Apparatus for removing tramp materials and method therefor
- Patent number 5,704,214
- Issue date Jan 6, 1998
- Tokyo Electron Limited
- Yuichiro Fujikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Liquid material supply apparatus and method
- Patent number 5,690,743
- Issue date Nov 25, 1997
- Tokyo Electron Limited
- Seishi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shower head and film forming apparatus using the same
- Patent number 5,595,606
- Issue date Jan 21, 1997
- Tokyo Electron Limited
- Yuichiro Fujikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum treatment apparatus and a cleaning method therefor
- Patent number 5,522,412
- Issue date Jun 4, 1996
- Tokyo Electron Kabushiki Kaisha
- Takayuki Ohba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus
- Patent number 5,462,603
- Issue date Oct 31, 1995
- Tokyo Electron Limited
- Seishi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for deposition of a refractory metal nitride and method for...
- Patent number 5,393,565
- Issue date Feb 28, 1995
- Fujitsu Limited
- Toshiya Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heat treating apparatus
- Patent number 5,088,697
- Issue date Feb 18, 1992
- Tokyo Electron Limited
- Seishi Murakami
- C30 - CRYSTAL GROWTH

Patents Applicationslast 30 patents

Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20190378723
- Publication date Dec 12, 2019
- TOKYO ELECTRON LIMITED
- Hideo Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of Removing Silicon Oxide Film
- Publication number 20190027371
- Publication date Jan 24, 2019
- TOKYO ELECTRON LIMITED
- Hideaki YAMASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE LOADING MECHANISM
- Publication number 20180366303
- Publication date Dec 20, 2018
- TOKYO ELECTRON LIMITED
- Einosuke TSUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXIDE FILM REMOVING METHOD, OXIDE FILM REMOVING APPARATUS, CONTACT...
- Publication number 20170338120
- Publication date Nov 23, 2017
- TOKYO ELECTRON LIMITED
- Takashi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Film Formation Device
- Publication number 20160083837
- Publication date Mar 24, 2016
- TOKYO ELECTRON LIMITED
- Kensaku NARUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING TI FILM
- Publication number 20150179462
- Publication date Jun 25, 2015
- TOKYO ELECTRON LIMITED
- Seishi MURAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING CONTACT LAYER
- Publication number 20150179518
- Publication date Jun 25, 2015
- TOKYO ELECTRON LIMITED
- Seishi MURAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus and Substrate Mount Table Used in th...
- Publication number 20100162956
- Publication date Jul 1, 2010
- Seishi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING APPARATUS USING SOURCE GAS AND REACTIVE GAS
- Publication number 20090211526
- Publication date Aug 27, 2009
- TOKYO ELECTRON LIMITED
- Masayuki TANAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMATION METHOD, CLEANING METHOD AND FILM FORMATION APPARATUS
- Publication number 20090142513
- Publication date Jun 4, 2009
- TOKYO ELECTRON LIMITED
- Seishi MURAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Processing Apparatus and Heater Unit
- Publication number 20080302781
- Publication date Dec 11, 2008
- TOKYO ELECTRON LIMITED
- Seishi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Formation of Titanium Nitride Film
- Publication number 20080057344
- Publication date Mar 6, 2008
- Seishi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film-forming method and apparatus using plasma CVD
- Publication number 20060231032
- Publication date Oct 19, 2006
- Seishi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film formation method
- Publication number 20060127601
- Publication date Jun 15, 2006
- TOKYO ELECTRON LIMITED
- Seishi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Worktable device, film formation apparatus, and film formation meth...
- Publication number 20050257747
- Publication date Nov 24, 2005
- Satoshi Wakabayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas supply device and treating device
- Publication number 20050255241
- Publication date Nov 17, 2005
- TOKYO ELECTRON LIMITED
- Seishi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor processing system
- Publication number 20030155076
- Publication date Aug 21, 2003
- Seishi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Seishi Murakami

Person

Patents Grantslast 30 patents

Semiconductor film forming method using hydrazine-based compound gas

Substrate processing apparatus and substrate loading mechanism

Method of removing silicon oxide film

Method of removing silicon oxide film

Film formation device

Oxide film removing method, oxide film removing apparatus, contact...

Method of forming Ti film

Method of forming contact layer

Processing apparatus and heater unit

Film formation method, cleaning method and film formation apparatus

Semiconductor processing system

CVD film formation method

Method of forming multilayered film

Vacuum treatment apparatus and a method for manufacturing semicondu...

Liquid material supply apparatus and method

Method for forming a CVD film

Barrier metal layer

Film forming and dry cleaning apparatus and method

Apparatus for removing tramp materials and method therefor

Liquid material supply apparatus and method

Shower head and film forming apparatus using the same

Vacuum treatment apparatus and a cleaning method therefor

Semiconductor processing apparatus

Method for deposition of a refractory metal nitride and method for...

Heat treating apparatus

Patents Applicationslast 30 patents

FILM FORMING METHOD AND FILM FORMING APPARATUS

Method of Removing Silicon Oxide Film

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE LOADING MECHANISM

OXIDE FILM REMOVING METHOD, OXIDE FILM REMOVING APPARATUS, CONTACT...

Film Formation Device

METHOD OF FORMING TI FILM

METHOD OF FORMING CONTACT LAYER

Substrate Processing Apparatus and Substrate Mount Table Used in th...

PROCESSING APPARATUS USING SOURCE GAS AND REACTIVE GAS

FILM FORMATION METHOD, CLEANING METHOD AND FILM FORMATION APPARATUS

Processing Apparatus and Heater Unit

Formation of Titanium Nitride Film

Film-forming method and apparatus using plasma CVD

Film formation method

Worktable device, film formation apparatus, and film formation meth...

Gas supply device and treating device

Semiconductor processing system