Seitaro Matsuo

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Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
ECR plasma source and ECR plasma device
- Patent number 7,485,204
- Issue date Feb 3, 2009
- MES AFTY Corporation
- Seitaro Matsuo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
Ecr plasma source and ecr plasma device
- Publication number 20050145339
- Publication date Jul 7, 2005
- Seitaro Matsuo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR