Seiya MIURA

Person

Utsunomiya-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Imprint lithography apparatus and device manufacturing method therefor
- Patent number 9,718,234
- Issue date Aug 1, 2017
- Canon Kabushiki Kaisha
- Hironori Maeda
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Imprint apparatus, imprint method, and device manufacturing method
- Patent number 9,645,514
- Issue date May 9, 2017
- Canon Kabushiki Kaisha
- Hironori Maeda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Forming method and method of manufacturing article
- Patent number 9,564,374
- Issue date Feb 7, 2017
- Canon Kabushiki Kaisha
- Masaki Mizutani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprint apparatus, imprint method, and device manufacturing method
- Patent number 9,188,855
- Issue date Nov 17, 2015
- Canon Kabushiki Kaisha
- Hironori Maeda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Exposure apparatus and device manufacturing method
- Patent number 8,130,360
- Issue date Mar 6, 2012
- Canon Kabushiki Kaisha
- Shinichiro Hirai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and image plane detecting method
- Patent number 7,656,503
- Issue date Feb 2, 2010
- Canon Kabushiki Kaisha
- Seiya Miura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle, semiconductor exposure apparatus and method, and semicondu...
- Patent number 7,348,107
- Issue date Mar 25, 2008
- Canon Kabushiki Kaisha
- Tsutomu Takenaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method and apparatus
- Patent number 7,221,434
- Issue date May 22, 2007
- Canon Kabushiki Kaisha
- Yoshihiro Shiode
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus
- Patent number 7,193,685
- Issue date Mar 20, 2007
- Canon Kabushiki Kaisha
- Seiya Miura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, exposure method, and device manufacturing method
- Patent number 7,050,151
- Issue date May 23, 2006
- Canon Kabushiki Kaisha
- Seiya Miura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for inspecting a surface state
- Patent number 5,963,316
- Issue date Oct 5, 1999
- Canon Kabushiki Kaisha
- Seiya Miura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image reading device, and inspection apparatus and exposure apparat...
- Patent number 5,815,607
- Issue date Sep 29, 1998
- Canon Kabushiki Kaisha
- Seiya Miura
- G02 - OPTICS
Information Patent Grant
Inspection system for original with pellicle
- Patent number 5,652,657
- Issue date Jul 29, 1997
- Canon Kabushiki Kaisha
- Minoru Yoshii
- G01 - MEASURING TESTING
Information Patent Grant
Surface inspecting device
- Patent number 5,585,916
- Issue date Dec 17, 1996
- Canon Kabushiki Kaisha
- Seiya Miura
- G01 - MEASURING TESTING
Information Patent Grant
Surface inspecting device using bisected multi-mode laser beam and...
- Patent number 5,581,348
- Issue date Dec 3, 1996
- Canon Kabushiki Kaisha
- Seiya Miura
- G01 - MEASURING TESTING
Information Patent Grant
Projection exposure apparatus
- Patent number 5,160,962
- Issue date Nov 3, 1992
- Canon Kabushiki Kaisha
- Seiya Miura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
IMPRINT APPARATUS, IMPRINT METHOD, AND DEVICE MANUFACTURING METHOD
- Publication number 20160033884
- Publication date Feb 4, 2016
- Canon Kabushiki Kaisha
- Hironori Maeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FORMING METHOD AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20150262890
- Publication date Sep 17, 2015
- Canon Kabushiki Kaisha
- Masaki Mizutani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPRINT LITHOGRAPHY APPARATUS AND DEVICE MANUFACTURING METHOD THEREFOR
- Publication number 20130161868
- Publication date Jun 27, 2013
- Canon Kabushiki Kaisha
- Hironori Maeda
- B82 - NANO-TECHNOLOGY
Information Patent Application
IMPRINT APPARATUS, IMPRINT METHOD, AND DEVICE MANUFACTURING METHOD
- Publication number 20120292801
- Publication date Nov 22, 2012
- Canon Kabushiki Kaisha
- Hironori Maeda
- B82 - NANO-TECHNOLOGY
Information Patent Application
EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20080036990
- Publication date Feb 14, 2008
- Canon Kabushiki Kaisha
- Shinichiro Hirai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND IMAGE PLANE DETECTING METHOD
- Publication number 20070296945
- Publication date Dec 27, 2007
- Canon Kabushiki Kaisha
- Seiya MIURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method and apparatus
- Publication number 20060268255
- Publication date Nov 30, 2006
- Yoshihiro Shiode
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Position detecting method, surface shape estimating method, and exp...
- Publication number 20050161615
- Publication date Jul 28, 2005
- Kohei Maeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle, semiconductor exposure apparatus and method, and semicondu...
- Publication number 20050042525
- Publication date Feb 24, 2005
- Tsutomu Takenaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Seiya MIURA

Person

Patents Grantslast 30 patents

Imprint lithography apparatus and device manufacturing method therefor

Imprint apparatus, imprint method, and device manufacturing method

Forming method and method of manufacturing article

Imprint apparatus, imprint method, and device manufacturing method

Exposure apparatus and device manufacturing method

Exposure apparatus and image plane detecting method

Reticle, semiconductor exposure apparatus and method, and semicondu...

Exposure method and apparatus

Exposure apparatus

Exposure apparatus, exposure method, and device manufacturing method

Method and apparatus for inspecting a surface state

Image reading device, and inspection apparatus and exposure apparat...

Inspection system for original with pellicle

Surface inspecting device

Surface inspecting device using bisected multi-mode laser beam and...

Projection exposure apparatus

Patents Applicationslast 30 patents

IMPRINT APPARATUS, IMPRINT METHOD, AND DEVICE MANUFACTURING METHOD

FORMING METHOD AND METHOD OF MANUFACTURING ARTICLE

IMPRINT LITHOGRAPHY APPARATUS AND DEVICE MANUFACTURING METHOD THEREFOR

IMPRINT APPARATUS, IMPRINT METHOD, AND DEVICE MANUFACTURING METHOD

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

EXPOSURE APPARATUS AND IMAGE PLANE DETECTING METHOD

Exposure method and apparatus

Position detecting method, surface shape estimating method, and exp...

Reticle, semiconductor exposure apparatus and method, and semicondu...