Semyon L. Kats

Person

San Francisco, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Cathode with inner and outer electrodes at different heights
- Patent number 8,607,731
- Issue date Dec 17, 2013
- Applied Materials, Inc.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support having fluid channel
- Patent number 8,279,577
- Issue date Oct 2, 2012
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support having heat transfer system
- Patent number 7,768,765
- Issue date Aug 3, 2010
- Applied Materials, Inc.
- Andrew Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck having textured contact surface
- Patent number 7,672,110
- Issue date Mar 2, 2010
- Applied Materials, Inc.
- Jennifer Y. Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature aerosol deposition of a plasma resistive layer
- Patent number 7,479,464
- Issue date Jan 20, 2009
- Applied Materials, Inc.
- Jennifer Y. Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support having heat transfer system
- Patent number 7,221,553
- Issue date May 22, 2007
- Applied Materials, Inc.
- Andrew Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck having composite dielectric layer and method of...
- Patent number 6,721,162
- Issue date Apr 13, 2004
- Applied Materials Inc.
- Edwin C. Weldon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck having heater and method
- Patent number 6,538,872
- Issue date Mar 25, 2003
- Applied Materials, Inc.
- You Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support pedestal
- Patent number 6,490,145
- Issue date Dec 3, 2002
- Applied Materials, Inc.
- Arnold V. Kholodenko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck bonded to base with a bond layer and method
- Patent number 6,490,146
- Issue date Dec 3, 2002
- Applied Materials Inc.
- You Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck having improved electrical connector and method
- Patent number 6,462,928
- Issue date Oct 8, 2002
- Applied Materials, Inc.
- Shamouil Shamouilian
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Dielectric covered electrostatic chuck
- Patent number 6,414,834
- Issue date Jul 2, 2002
- Applied Materials, Inc.
- Edwin C. Weldon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck having gas cavity and method
- Patent number 6,310,755
- Issue date Oct 30, 2001
- Applied Materials, Inc.
- Arnold Kholodenko
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Electrostatic chuck with improved temperature control and puncture...
- Patent number 6,278,600
- Issue date Aug 21, 2001
- Applied Materials, Inc.
- Shamouil Shamouilian
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Connectors for an electrostatic chuck and combination thereof
- Patent number 6,151,203
- Issue date Nov 21, 2000
- Applied Materials, Inc.
- Shamouil Shamouilian
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Electrostatic chuck having improved gas conduits
- Patent number 6,108,189
- Issue date Aug 22, 2000
- Applied Materials, Inc.
- Edwin C. Weldon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE SUPPORT HAVING FLUID CHANNEL
- Publication number 20110024047
- Publication date Feb 3, 2011
- Applied Materials, Inc.
- Andrew NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR IMPROVING FLOW UNIFORMITY IN A PROCESS CH...
- Publication number 20100081284
- Publication date Apr 1, 2010
- Applied Materials, Inc.
- AJIT BALAKRISHNA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CATHODE WITH INNER AND OUTER ELECTRODES AT DIFFERENT HEIGHTS
- Publication number 20090314433
- Publication date Dec 24, 2009
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE AEROSOL DEPOSITION OF A PLASMA RESISTIVE LAYER
- Publication number 20080108225
- Publication date May 8, 2008
- JENNIFER Y. SUN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE SUPPORT HAVING HEAT TRANSFER SYSTEM
- Publication number 20070165356
- Publication date Jul 19, 2007
- APPLIED MATERIALS, INC.
- Andrew Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic chuck having textured contact surface
- Publication number 20070047170
- Publication date Mar 1, 2007
- APPLIED MATERIALS, INC.
- Jennifer Y. Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate support having heat transfer system
- Publication number 20040212947
- Publication date Oct 28, 2004
- APPLIED MATERIALS, INC.
- Andrew Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic chuck having dielectric member with stacked layers an...
- Publication number 20040190215
- Publication date Sep 30, 2004
- APPLIED MATERIALS, INC.
- Edwin C. Weldon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cathode pedestal for a plasma etch reactor
- Publication number 20040040664
- Publication date Mar 4, 2004
- Jang Gyoo Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic chuck having composite dielectric layer and method of...
- Publication number 20020135969
- Publication date Sep 26, 2002
- APPLIED MATERIALS, INC.
- Edwin C. Weldon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electrostatic chuck bonded to base with a bond layer and method
- Publication number 20020075624
- Publication date Jun 20, 2002
- APPLIED MATERIALS, INC.
- You Wang
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
ELECTROSTATIC CHUCK HAVING COMPOSITE BASE AND METHOD
- Publication number 20020036881
- Publication date Mar 28, 2002
- SHAMOUIL SHAMOUILIAN
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES

Semyon L. Kats

Person

Patents Grantslast 30 patents

Cathode with inner and outer electrodes at different heights

Substrate support having fluid channel

Substrate support having heat transfer system

Electrostatic chuck having textured contact surface

Low temperature aerosol deposition of a plasma resistive layer

Substrate support having heat transfer system

Electrostatic chuck having composite dielectric layer and method of...

Electrostatic chuck having heater and method

Substrate support pedestal

Electrostatic chuck bonded to base with a bond layer and method

Electrostatic chuck having improved electrical connector and method

Dielectric covered electrostatic chuck

Electrostatic chuck having gas cavity and method

Electrostatic chuck with improved temperature control and puncture...

Connectors for an electrostatic chuck and combination thereof

Electrostatic chuck having improved gas conduits

Patents Applicationslast 30 patents

SUBSTRATE SUPPORT HAVING FLUID CHANNEL

METHODS AND APPARATUS FOR IMPROVING FLOW UNIFORMITY IN A PROCESS CH...

CATHODE WITH INNER AND OUTER ELECTRODES AT DIFFERENT HEIGHTS

LOW TEMPERATURE AEROSOL DEPOSITION OF A PLASMA RESISTIVE LAYER

SUBSTRATE SUPPORT HAVING HEAT TRANSFER SYSTEM

Electrostatic chuck having textured contact surface

Substrate support having heat transfer system

Electrostatic chuck having dielectric member with stacked layers an...

Cathode pedestal for a plasma etch reactor

Electrostatic chuck having composite dielectric layer and method of...

Electrostatic chuck bonded to base with a bond layer and method

ELECTROSTATIC CHUCK HAVING COMPOSITE BASE AND METHOD