Seong-Bo Shim

Person

Suwon-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for measuring overlay
- Patent number 8,860,953
- Issue date Oct 14, 2014
- Samsung Electronics Co., Ltd.
- Seong-Bo Shim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for process proximity correction
- Patent number 8,762,901
- Issue date Jun 24, 2014
- Samsung Electronics Co., Ltd.
- WonChan Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing photo-mask
- Patent number 8,614,034
- Issue date Dec 24, 2013
- Samsung Electronics Co., Ltd.
- Seong-ho Moon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor device by using uniform optic...
- Patent number 8,392,854
- Issue date Mar 5, 2013
- Samsung Electronics Co., Ltd.
- Sang-wook Kim
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Semiconductor apparatus including alignment tool
- Patent number 8,355,139
- Issue date Jan 15, 2013
- Samsung Electronics Co., Ltd.
- Seong-Bo Shim
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE MASK AND METHOD OF DESIGNING ANTI-REFLECTION PATTERN OF...
- Publication number 20240027890
- Publication date Jan 25, 2024
- Samsung Electronics Co., Ltd.
- Hyungjong Bae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF FORMING SEMICONDUCTORS USING ETCHING EFFECT PREDICTIONS...
- Publication number 20190129297
- Publication date May 2, 2019
- SAMSUNG ELECTRONICS CO,. LTD.
- Seong Bo Shim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DESIGNING A PHOTO MASK LAYOUT
- Publication number 20130219351
- Publication date Aug 22, 2013
- Seong-Bo Shim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PROCESS PROXIMITY CORRECTION
- Publication number 20130219349
- Publication date Aug 22, 2013
- Samsung Electronics Co., Ltd.
- WonChan LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING PHOTO-MASK
- Publication number 20120208111
- Publication date Aug 16, 2012
- Seong-ho MOON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods And Apparatuses For Correcting A Mask Layout
- Publication number 20120201447
- Publication date Aug 9, 2012
- Seong-Bo Shim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR MEASURING OVERLAY
- Publication number 20120188543
- Publication date Jul 26, 2012
- Seong-Bo Shim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING UNIFORM OPTIC...
- Publication number 20110265048
- Publication date Oct 27, 2011
- Sang-wook KIM
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF PERFORMING ETCH PROXIMITY CORRECTION, METHOD OF FORMING P...
- Publication number 20110224945
- Publication date Sep 15, 2011
- Samsung Electronics Co., Ltd.
- Seong-bo Shim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor Apparatus Including Alignment Tool
- Publication number 20100214569
- Publication date Aug 26, 2010
- SAMSUNG ELECTRONICS CO., LTD.
- Seong-Bo Shim
- G01 - MEASURING TESTING

Seong-Bo Shim

Person

Patents Grantslast 30 patents

Method and apparatus for measuring overlay

Method for process proximity correction

Method of manufacturing photo-mask

Method of manufacturing semiconductor device by using uniform optic...

Semiconductor apparatus including alignment tool

Patents Applicationslast 30 patents

REFLECTIVE MASK AND METHOD OF DESIGNING ANTI-REFLECTION PATTERN OF...

METHODS OF FORMING SEMICONDUCTORS USING ETCHING EFFECT PREDICTIONS...

METHOD OF DESIGNING A PHOTO MASK LAYOUT

METHOD FOR PROCESS PROXIMITY CORRECTION

METHOD OF MANUFACTURING PHOTO-MASK

Methods And Apparatuses For Correcting A Mask Layout

METHOD AND APPARATUS FOR MEASURING OVERLAY

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING UNIFORM OPTIC...

METHOD OF PERFORMING ETCH PROXIMITY CORRECTION, METHOD OF FORMING P...

Semiconductor Apparatus Including Alignment Tool