Sergey A. Voronin

Person

Rensselaer, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Time-resolved OES data collection
- Patent number 12,158,374
- Issue date Dec 3, 2024
- Tokyo Electron Limited
- Sergey Voronin
- G01 - MEASURING TESTING
Information Patent Grant
Method for gate stack formation and etching
- Patent number 12,009,430
- Issue date Jun 11, 2024
- Tokyo Electron Limited
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lateral etching of silicon
- Patent number 12,002,683
- Issue date Jun 4, 2024
- Tokyo Electron Limited
- Hamed Hajibabaeinajafabadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal-containing liner process
- Patent number 11,699,741
- Issue date Jul 11, 2023
- Tokyo Electron Limited
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for selective ion mass segregation in pulsed pl...
- Patent number 11,651,970
- Issue date May 16, 2023
- Tokyo Electron Limited
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for resistive RAM (ReRAM) performance stabilization via dry...
- Patent number 11,637,242
- Issue date Apr 25, 2023
- Tokyo Electron Limited
- Sergey Voronin
- G11 - INFORMATION STORAGE
Information Patent Grant
Plasma etch processes
- Patent number 11,398,386
- Issue date Jul 26, 2022
- Tokyo Electron Limited
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion stratification using bias pulses of short duration
- Patent number 11,189,462
- Issue date Nov 30, 2021
- Tokyo Electron Limited
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for selective etching at an interface between materials
- Patent number 11,133,194
- Issue date Sep 28, 2021
- Tokyo Electron Limited
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for ion mass separation and ion energy control in process pl...
- Patent number 10,998,170
- Issue date May 4, 2021
- Tokyo Electron Limited
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to protect nitride layers during formation of silicon germa...
- Patent number 10,903,077
- Issue date Jan 26, 2021
- Tokyo Electron Limited
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for treating gas
- Patent number 10,814,336
- Issue date Oct 27, 2020
- Edwards Limited
- Sergey Alexandrovich Voronin
- B03 - SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES O...
Information Patent Grant
Methods for stability monitoring and improvements to plasma sources...
- Patent number 10,818,482
- Issue date Oct 27, 2020
- Tokyo Electron Limited
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of plasma discharge ignition to reduce surface pa...
- Patent number 10,818,502
- Issue date Oct 27, 2020
- Tokyo Electron Limited
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to achieve a sidewall etch
- Patent number 10,811,269
- Issue date Oct 20, 2020
- Tokyo Electron Limited
- Shyam Sridhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of surface restoration for nitride etching
- Patent number 10,811,273
- Issue date Oct 20, 2020
- Tokyo Electron Limited
- Christopher Talone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for RF power distribution in a multi-zone electrode array
- Patent number 10,777,385
- Issue date Sep 15, 2020
- Tokyo Electron Limited
- Sergey Voronin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for operation instability detection in a surface wave plasma...
- Patent number 10,651,017
- Issue date May 12, 2020
- Tokyo Electron Limited
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced methods for plasma systems operation
- Patent number 10,529,540
- Issue date Jan 7, 2020
- Tokyo Electron Limited
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for ESC temperature control
- Patent number 10,237,916
- Issue date Mar 19, 2019
- Tokyo Electron Limited
- Sergey A. Voronin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of patterning intersecting structures
- Patent number 10,204,832
- Issue date Feb 12, 2019
- Tokyo Electron Limited
- Sergey A. Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective SiARC removal
- Patent number 10,115,591
- Issue date Oct 30, 2018
- Tokyo Electron Limited
- Shyam Sridhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual-frequency surface wave plasma source
- Patent number 10,083,820
- Issue date Sep 25, 2018
- Tokyo Electron Limited
- Sergey A. Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for treating a gas stream
- Patent number 10,064,262
- Issue date Aug 28, 2018
- Edwards Limited
- Sergey Alexandrovich Voronin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of detecting plasma discharge in a plasma processing system
- Patent number 10,063,062
- Issue date Aug 28, 2018
- Tokyo Electron Limited
- Sergey Voronin
- G01 - MEASURING TESTING
Information Patent Grant
Method for etching a silicon-containing substrate
- Patent number 9,966,312
- Issue date May 8, 2018
- Tokyo Electron Limited
- Sergey Voronin
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Method for laterally trimming a hardmask
- Patent number 9,779,952
- Issue date Oct 3, 2017
- Tokyo Electron Limited
- Alok Ranjan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for ESC charge control for wafer clamping
- Patent number 9,530,626
- Issue date Dec 27, 2016
- Tokyo Electron Limited
- Jason Marion
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for treating a gas stream
- Patent number 9,512,518
- Issue date Dec 6, 2016
- Edwards Limited
- Sergey Alexandrovich Voronin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for treating a gas stream
- Patent number 9,371,581
- Issue date Jun 21, 2016
- Edwards Limited
- Christopher James Philip Clements
- B03 - SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES O...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR SELECTIVE ETCHING BY LOCAL PHOTON SURFACE ACTIVATION
- Publication number 20240387186
- Publication date Nov 21, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Advanced OES Characterization
- Publication number 20240339309
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Methods for Plasma Processing
- Publication number 20240331979
- Publication date Oct 3, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Semiconductor Process Chamber
- Publication number 20240266149
- Publication date Aug 8, 2024
- TOKYO ELECTRON LIMITED
- Qi Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for OES Data Collection and Endpoint Detection
- Publication number 20240234111
- Publication date Jul 11, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Time-Resolved OES Data Collection
- Publication number 20240230409
- Publication date Jul 11, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- G01 - MEASURING TESTING
Information Patent Application
Time-Resolved OES Data Collection
- Publication number 20240133742
- Publication date Apr 25, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- G01 - MEASURING TESTING
Information Patent Application
Method for OES Data Collection and Endpoint Detection
- Publication number 20240136164
- Publication date Apr 25, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Plasma Process Uniformity Control
- Publication number 20240120181
- Publication date Apr 11, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Bombardment with Ions having Targeted Mass using Pulsed B...
- Publication number 20240096600
- Publication date Mar 21, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optical Emission Spectroscopy for Advanced Process Characterization
- Publication number 20240094056
- Publication date Mar 21, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cyclic Method for Reactive Development of Photoresists
- Publication number 20240053684
- Publication date Feb 15, 2024
- TOKYO ELECTRON LIMITED
- Hamed Hajibabaeinajafabadi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lateral Etching of Silicon
- Publication number 20230317465
- Publication date Oct 5, 2023
- TOKYO ELECTRON LIMITED
- Hamed Hajibabaeinajafabadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Etching of Metal
- Publication number 20230108117
- Publication date Apr 6, 2023
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Metal-Containing Liner Process
- Publication number 20220384607
- Publication date Dec 1, 2022
- TOKYO ELECTRON LIMITED
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR RESISTIVE RAM (ReRAM) PERFORMANCE STABILIZATION VIA DRY...
- Publication number 20220059765
- Publication date Feb 24, 2022
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- G11 - INFORMATION STORAGE
Information Patent Application
Ion Stratification Using Bias Pulses of Short Duration
- Publication number 20220051875
- Publication date Feb 17, 2022
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR SELECTIVE ION MASS SEGREGATION IN PULSED PL...
- Publication number 20210366723
- Publication date Nov 25, 2021
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR GATE STACK FORMATION AND ETCHING
- Publication number 20200273992
- Publication date Aug 27, 2020
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCH PROCESSES
- Publication number 20200273711
- Publication date Aug 27, 2020
- TOKYO ELECTRON LIMITED
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Selective Etching at an Interface Between Materials
- Publication number 20200266070
- Publication date Aug 20, 2020
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR STABILITY MONITORING AND IMPROVEMENTS TO PLASMA SOURCES...
- Publication number 20200105510
- Publication date Apr 2, 2020
- TOKYO ELECTRON LIMITED
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS TO PROTECT NITRIDE LAYERS DURING FORMATION OF SILICON GERMA...
- Publication number 20200027736
- Publication date Jan 23, 2020
- TOKYO ELECTRON LIMITED
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Method for Controlling Ion Energy Distribution in Pro...
- Publication number 20190318913
- Publication date Oct 17, 2019
- TOKYO ELECTRON LIMITED
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Ion Mass Separation and Ion Energy Control in Process Pl...
- Publication number 20190318916
- Publication date Oct 17, 2019
- TOKYO ELECTRON LIMITED
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADVANCED METHODS FOR PLASMA SYSTEMS OPERATION
- Publication number 20190304750
- Publication date Oct 3, 2019
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO ACHIEVE A SIDEWALL ETCH
- Publication number 20190259623
- Publication date Aug 22, 2019
- TOKYO ELECTRON LIMITED
- Shyam Sridhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Surface Restoration for Nitride Etching
- Publication number 20190080926
- Publication date Mar 14, 2019
- TOKYO ELECTRON LIMITED
- Christopher Talone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHODS TO REDUCE SURFACE PARTICLE IMPURITIES AFTER A...
- Publication number 20180323045
- Publication date Nov 8, 2018
- TOKYO ELECTRON LIMITED
- Jason Marion
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective SiARC Removal
- Publication number 20180197730
- Publication date Jul 12, 2018
- TOKYO ELECTRON LIMITED
- Shyam Sridhar
- H01 - BASIC ELECTRIC ELEMENTS

Sergey A. Voronin

Person

Patents Grantslast 30 patents

Time-resolved OES data collection

Method for gate stack formation and etching

Lateral etching of silicon

Metal-containing liner process

Systems and methods for selective ion mass segregation in pulsed pl...

Methods for resistive RAM (ReRAM) performance stabilization via dry...

Plasma etch processes

Ion stratification using bias pulses of short duration

Method for selective etching at an interface between materials

Method for ion mass separation and ion energy control in process pl...

Methods to protect nitride layers during formation of silicon germa...

Apparatus for treating gas

Methods for stability monitoring and improvements to plasma sources...

System and method of plasma discharge ignition to reduce surface pa...

Method to achieve a sidewall etch

Methods of surface restoration for nitride etching

Method for RF power distribution in a multi-zone electrode array

Method for operation instability detection in a surface wave plasma...

Advanced methods for plasma systems operation

Systems and methods for ESC temperature control

Method of patterning intersecting structures

Selective SiARC removal

Dual-frequency surface wave plasma source

Apparatus for treating a gas stream

Method of detecting plasma discharge in a plasma processing system

Method for etching a silicon-containing substrate

Method for laterally trimming a hardmask

Method and apparatus for ESC charge control for wafer clamping

Apparatus for treating a gas stream

Apparatus for treating a gas stream

Patents Applicationslast 30 patents

METHOD FOR SELECTIVE ETCHING BY LOCAL PHOTON SURFACE ACTIVATION

Advanced OES Characterization

Apparatus and Methods for Plasma Processing

Methods for Semiconductor Process Chamber

Method for OES Data Collection and Endpoint Detection

Time-Resolved OES Data Collection

Time-Resolved OES Data Collection

Method for OES Data Collection and Endpoint Detection

System and Method for Plasma Process Uniformity Control

Substrate Bombardment with Ions having Targeted Mass using Pulsed B...

Optical Emission Spectroscopy for Advanced Process Characterization

Cyclic Method for Reactive Development of Photoresists

Lateral Etching of Silicon

Method for Etching of Metal

Metal-Containing Liner Process

METHODS FOR RESISTIVE RAM (ReRAM) PERFORMANCE STABILIZATION VIA DRY...

Ion Stratification Using Bias Pulses of Short Duration

SYSTEMS AND METHODS FOR SELECTIVE ION MASS SEGREGATION IN PULSED PL...

METHOD FOR GATE STACK FORMATION AND ETCHING

PLASMA ETCH PROCESSES

Method for Selective Etching at an Interface Between Materials

METHODS FOR STABILITY MONITORING AND IMPROVEMENTS TO PLASMA SOURCES...

METHODS TO PROTECT NITRIDE LAYERS DURING FORMATION OF SILICON GERMA...

Apparatus and Method for Controlling Ion Energy Distribution in Pro...

Method for Ion Mass Separation and Ion Energy Control in Process Pl...

ADVANCED METHODS FOR PLASMA SYSTEMS OPERATION

METHOD TO ACHIEVE A SIDEWALL ETCH

Methods of Surface Restoration for Nitride Etching

MANUFACTURING METHODS TO REDUCE SURFACE PARTICLE IMPURITIES AFTER A...

Selective SiARC Removal