Sergiy Yakovlevich Navala

Person

Suwon-city, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Ionized physical vapor deposition apparatus using helical self-reso...
- Patent number 7,404,879
- Issue date Jul 29, 2008
- Samsung Electronics Co., Ltd.
- Yuri Nikolaevich Tolmachev
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas injection apparatus for semiconductor processing system
- Patent number 7,252,716
- Issue date Aug 7, 2007
- Samsung Electronics Co., Ltd.
- Tae-wan Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High-density plasma processing apparatus
- Patent number 7,210,424
- Issue date May 1, 2007
- Samsung Electronics Co., Ltd.
- Yuri Nikolaevich Tolmachev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetron cathode and magnetron sputtering apparatus comprising the...
- Patent number 7,052,583
- Issue date May 30, 2006
- Samsung Electronics Co., Ltd.
- Sergiy Yakovlevich Navala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Plasma generating apparatus and plasma processing apparatus
- Publication number 20050173069
- Publication date Aug 11, 2005
- Samsung Electronics Co., Ltd.
- Yuri Nikolaevich Tolmachev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ionized physical vapor deposition apparatus using helical self-reso...
- Publication number 20050103623
- Publication date May 19, 2005
- Samsung Electronics Co., Ltd.
- Yuri Nikolaevich Tolmachev
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High-density plasma processing apparatus
- Publication number 20040261720
- Publication date Dec 30, 2004
- Yuri Nikolaevich Tolmachev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Magnetron cathode and magnetron sputtering apparatus comprising the...
- Publication number 20040140204
- Publication date Jul 22, 2004
- Sergiy Yakovlevich Navala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas injection apparatus for semiconductor processing system
- Publication number 20040099378
- Publication date May 27, 2004
- Tae-Wan Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetron sputtering apparatus and magnetron sputtering method usin...
- Publication number 20040094412
- Publication date May 20, 2004
- SAMSUNG ELECTRONICS CO., LTD.
- Sergiy Yakovlevich Navala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Sergiy Yakovlevich Navala

Person

Patents Grantslast 30 patents

Ionized physical vapor deposition apparatus using helical self-reso...

Gas injection apparatus for semiconductor processing system

High-density plasma processing apparatus

Magnetron cathode and magnetron sputtering apparatus comprising the...

Patents Applicationslast 30 patents

Plasma generating apparatus and plasma processing apparatus

Ionized physical vapor deposition apparatus using helical self-reso...

High-density plasma processing apparatus

Magnetron cathode and magnetron sputtering apparatus comprising the...

Gas injection apparatus for semiconductor processing system

Magnetron sputtering apparatus and magnetron sputtering method usin...