Sevim Korkmaz

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Boise, ID, US

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor processing applying supercritical drying
- Patent number 11,127,588
- Issue date Sep 21, 2021
- Micron Technology, Inc.
- Sevim Korkmaz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure patterning
- Patent number 11,011,521
- Issue date May 18, 2021
- Micron Technology, Inc.
- Sevim Korkmaz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxidative trim
- Patent number 10,985,239
- Issue date Apr 20, 2021
- Micron Technology, Inc.
- Matthew N. Rocklein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of a capacitor using a sacrificial layer
- Patent number 10,964,475
- Issue date Mar 30, 2021
- Micron Technology, Inc.
- Devesh Dadhich Shreeram
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CAPACITORS WITH ELECTRODES HAVING A PORTION OF MATERIAL REMOVED, AN...
- Publication number 20220238532
- Publication date Jul 28, 2022
- Micron Technology, Inc.
- Devesh Dadhich Shreeram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXIDATIVE TRIM
- Publication number 20210050409
- Publication date Feb 18, 2021
- Micron Technology, Inc.
- Matthew N. Rocklein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE PATTERNING
- Publication number 20200381437
- Publication date Dec 3, 2020
- Micron Technology, Inc.
- Sevim Korkmaz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING
- Publication number 20200328076
- Publication date Oct 15, 2020
- Micron Technology, Inc.
- Sevim Korkmaz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF A CAPACITOR USING A SACRIFICIAL LAYER
- Publication number 20200243258
- Publication date Jul 30, 2020
- Micron Technology, Inc.
- Devesh Dadhich Shreeram
- H01 - BASIC ELECTRIC ELEMENTS