Seyed Jafar Jafarian-Tehrani

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
High power cable for heated components in RF environment
- Patent number 11,837,446
- Issue date Dec 5, 2023
- Lam Research Corporation
- Seyed Jafar Jafarian-Tehrani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-power radio-frequency spiral-coil filter
- Patent number 10,812,033
- Issue date Oct 20, 2020
- Lam Research Corporation
- Sean Kelly O'Brien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Identifying components associated with a fault in a plasma system
- Patent number 10,690,727
- Issue date Jun 23, 2020
- Lam Research Corporation
- Seyed Jafar Jafarian-Tehrani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Control of etch rate using modeling, feedback and impedance match
- Patent number 10,381,201
- Issue date Aug 13, 2019
- Lam Research Corporation
- Bradford J. Lyndaker
- G05 - CONTROLLING REGULATING
Information Patent Grant
Identifying components associated with a fault in a plasma system
- Patent number 9,851,389
- Issue date Dec 26, 2017
- Lam Research Corporation
- Seyed Jafar Jafarian-Tehrani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for providing characteristics of an impedance m...
- Patent number 9,720,022
- Issue date Aug 1, 2017
- Lam Research Corporation
- Arthur M. Howald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of etch rate using modeling, feedback and impedance match
- Patent number 9,620,334
- Issue date Apr 11, 2017
- Lam Research Corporation
- Bradford J. Lyndaker
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
High power filter with single adjust for multiple channels
- Patent number 9,312,832
- Issue date Apr 12, 2016
- Lam Research Corporation
- Seyed Jafar Jafarian-Tehrani
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Adjusting current ratios in inductively coupled plasma processing s...
- Patent number 9,305,750
- Issue date Apr 5, 2016
- Lam Research Corporation
- Maolin Long
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Systems for detecting unconfined-plasma events
- Patent number 9,074,285
- Issue date Jul 7, 2015
- Lam Research Corporation
- John Pease
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma unconfinement sensor and methods thereof
- Patent number 8,894,804
- Issue date Nov 25, 2014
- Lam Research Corporation
- Jean-Paul Booth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency (RF) power filters and plasma processing systems in...
- Patent number 8,742,666
- Issue date Jun 3, 2014
- Lam Research Corporation
- Maolin Long
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Current control in plasma processing systems
- Patent number 8,736,175
- Issue date May 27, 2014
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arrangements for detecting discontinuity of flexible connections fo...
- Patent number 8,466,697
- Issue date Jun 18, 2013
- Lam Research Corporation
- Seyed Jafar Jafarian-Tehrani
- G01 - MEASURING TESTING
Information Patent Grant
ESC high voltage control and methods thereof
- Patent number 8,315,029
- Issue date Nov 20, 2012
- Lam Research Corporation
- Seyed Jafar Jafarian-Tehrani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing system ESC high voltage control and methods thereof
- Patent number 7,983,018
- Issue date Jul 19, 2011
- Lam Research Corporation
- Seyed Jafar Jafarian-Tehrani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing system ESC high voltage control
- Patent number 7,768,766
- Issue date Aug 3, 2010
- Lam Research Corporation
- Seyed Jafar Jafarian-Tehrani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and array for creating a mathematical model of a plasma pro...
- Patent number 7,435,926
- Issue date Oct 14, 2008
- Lam Research Corporation
- Seyed Jafar Jafarian-Tehrani
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for toolmatching and troubleshooting a plasma processing system
- Patent number 6,919,689
- Issue date Jul 19, 2005
- Lam Research Corporation
- Seyed Jafar Jafarian-Tehrani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for toolmatching and troubleshooting a plasma processing system
- Patent number 6,873,114
- Issue date Mar 29, 2005
- Lam Research Corporation
- Armen Avoyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Voltage control sensor and control interface for radio frequency po...
- Patent number 6,563,076
- Issue date May 13, 2003
- Lam Research Corporation
- Neil Benjamin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Voltage control sensor and control interface for radio frequency po...
- Patent number 6,509,542
- Issue date Jan 21, 2003
- LAM Research Corp.
- Neil Benjamin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatuses for controlling phase difference in plasma...
- Patent number 5,824,606
- Issue date Oct 20, 1998
- Lam Research Corporation
- Robert D. Dible
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dynamic feedback electrostatic wafer chuck
- Patent number 5,812,361
- Issue date Sep 22, 1998
- Lam Research Corporation
- Phillip Lawrence Jones
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Voltage controller for electrostatic chuck of vacuum plasma processors
- Patent number 5,708,250
- Issue date Jan 13, 1998
- Lam Resarch Corporation
- Neil Benjamin
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING SYSTEM INCLUDING RF MATCHING CIRCUIT FOR MULTI...
- Publication number 20240355588
- Publication date Oct 24, 2024
- LAM RESEARCH CORPORATION
- Seyed Jafar JAFARIAN-TEHRANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER CABLE FOR HEATED COMPONENTS IN RF ENVIRONMENT
- Publication number 20240105429
- Publication date Mar 28, 2024
- Lam Reseach Corporation
- Seyed Jafar JAFARIAN-TEHRANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF ETCH RATE USING MODELING, FEEDBACK AND IMPEDANCE MATCH
- Publication number 20190318919
- Publication date Oct 17, 2019
- LAM RESEARCH CORPORATION
- Bradford J. Lyndaker
- G05 - CONTROLLING REGULATING
Information Patent Application
HIGH-POWER RADIO-FREQUENCY SPIRAL-COIL FILTER
- Publication number 20190207579
- Publication date Jul 4, 2019
- LAM RESEARCH CORPORATION
- Sean Kelly O'Brien
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
HIGH POWER CABLE FOR HEATED COMPONENTS IN RF ENVIRONMENT
- Publication number 20190035608
- Publication date Jan 31, 2019
- LAM RESEARCH CORPORATION
- Seyed Jafar JAFARIAN-TEHRANI
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
Identifying Components Associated With A Fault In A Plasma System
- Publication number 20180100885
- Publication date Apr 12, 2018
- LAM RESEARCH CORPORATION
- Seyed Jafar Jafarian-Tehrani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONTROL OF ETCH RATE USING MODELING, FEEDBACK AND IMPEDANCE MATCH
- Publication number 20170194130
- Publication date Jul 6, 2017
- LAM RESEARCH CORPORATION
- Bradford J. Lyndaker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR PROVIDING CHARACTERISTICS OF AN IMPEDANCE M...
- Publication number 20160343548
- Publication date Nov 24, 2016
- LAM RESEARCH CORPORATION
- Arthur M. Howald
- G01 - MEASURING TESTING
Information Patent Application
Identifying Components Associated With A Fault In A Plasma System
- Publication number 20160109498
- Publication date Apr 21, 2016
- LAM RESEARCH CORPORATION
- Seyed Jafar Jafarian-Tehrani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH POWER FILTER WITH SINGLE ADJUST FOR MULTIPLE CHANNELS
- Publication number 20160028362
- Publication date Jan 28, 2016
- LAM RESEARCH CORPORATION
- Seyed Jafar JAFARIAN-TEHRANI
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
Control of Etch Rate Using Modeling, Feedback and Impedance Match
- Publication number 20140195033
- Publication date Jul 10, 2014
- LAM RESEARCH CORPORATION
- Bradford J. Lyndaker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO FREQUENCY (RF) POWER FILTERS AND PLASMA PROCESSING SYSTEMS IN...
- Publication number 20120032756
- Publication date Feb 9, 2012
- Maolin LONG
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
ESC HIGH VOLTAGE CONTROL AND METHODS THEREOF
- Publication number 20120018095
- Publication date Jan 26, 2012
- Seyed Jafar Jafarian-Tehrani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA UNCONFINEMENT SENSOR AND METHODS THEREOF
- Publication number 20110128017
- Publication date Jun 2, 2011
- Jean-Paul Booth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CURRENT CONTROL IN PLASMA PROCESSING SYSTEMS
- Publication number 20110115379
- Publication date May 19, 2011
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEM ESC HIGH VOLTAGE CONTROL AND METHODS THEREOF
- Publication number 20110051307
- Publication date Mar 3, 2011
- Seyed Jafar Jafarian-Tehrani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTING CURRENT RATIOS IN INDUCTIVELY COUPLED PLASMA PROCESSING S...
- Publication number 20100314048
- Publication date Dec 16, 2010
- Maolin Long
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ARRANGEMENTS FOR DETECTING DISCONTINUITY OF FLEXIBLE CONNECTIONS FO...
- Publication number 20100271040
- Publication date Oct 28, 2010
- SEYED JAFAR JAFARIAN-TEHRANI
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING SYSTEM ESC HIGH VOLTAGE CONTROL
- Publication number 20080297971
- Publication date Dec 4, 2008
- Seyed Jafar Jafarian-Tehrani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and array for creating a mathematical model of a plasma pro...
- Publication number 20050217797
- Publication date Oct 6, 2005
- Seyed Jafar Jafarian-Tehrani
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method for toolmatching and troubleshooting a plasma processing system
- Publication number 20050151479
- Publication date Jul 14, 2005
- Lam Research Corporation, a Delaware Corporation
- Armen Avoyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for toolmatching and troubleshooting a plasma processing system
- Publication number 20040104734
- Publication date Jun 3, 2004
- Lam Research Inc., a Delaware Corporation
- Seyed Jafar Jafarian-Tehrani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for toolmatching and troubleshooting a plasma processing system
- Publication number 20040061448
- Publication date Apr 1, 2004
- Lam Research Corporation, a Delaware Corporation
- Armen Avoyan
- H01 - BASIC ELECTRIC ELEMENTS

Seyed Jafar Jafarian-Tehrani

Person

Patents Grantslast 30 patents

High power cable for heated components in RF environment

High-power radio-frequency spiral-coil filter

Identifying components associated with a fault in a plasma system

Control of etch rate using modeling, feedback and impedance match

Identifying components associated with a fault in a plasma system

Systems and methods for providing characteristics of an impedance m...

Control of etch rate using modeling, feedback and impedance match

High power filter with single adjust for multiple channels

Adjusting current ratios in inductively coupled plasma processing s...

Systems for detecting unconfined-plasma events

Plasma unconfinement sensor and methods thereof

Radio frequency (RF) power filters and plasma processing systems in...

Current control in plasma processing systems

Arrangements for detecting discontinuity of flexible connections fo...

ESC high voltage control and methods thereof

Plasma processing system ESC high voltage control and methods thereof

Plasma processing system ESC high voltage control

Methods and array for creating a mathematical model of a plasma pro...

Method for toolmatching and troubleshooting a plasma processing system

Method for toolmatching and troubleshooting a plasma processing system

Voltage control sensor and control interface for radio frequency po...

Voltage control sensor and control interface for radio frequency po...

Methods and apparatuses for controlling phase difference in plasma...

Dynamic feedback electrostatic wafer chuck

Voltage controller for electrostatic chuck of vacuum plasma processors

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING SYSTEM INCLUDING RF MATCHING CIRCUIT FOR MULTI...

HIGH POWER CABLE FOR HEATED COMPONENTS IN RF ENVIRONMENT

CONTROL OF ETCH RATE USING MODELING, FEEDBACK AND IMPEDANCE MATCH

HIGH-POWER RADIO-FREQUENCY SPIRAL-COIL FILTER

HIGH POWER CABLE FOR HEATED COMPONENTS IN RF ENVIRONMENT

Identifying Components Associated With A Fault In A Plasma System

CONTROL OF ETCH RATE USING MODELING, FEEDBACK AND IMPEDANCE MATCH

SYSTEMS AND METHODS FOR PROVIDING CHARACTERISTICS OF AN IMPEDANCE M...

Identifying Components Associated With A Fault In A Plasma System

HIGH POWER FILTER WITH SINGLE ADJUST FOR MULTIPLE CHANNELS

Control of Etch Rate Using Modeling, Feedback and Impedance Match

RADIO FREQUENCY (RF) POWER FILTERS AND PLASMA PROCESSING SYSTEMS IN...

ESC HIGH VOLTAGE CONTROL AND METHODS THEREOF

PLASMA UNCONFINEMENT SENSOR AND METHODS THEREOF

CURRENT CONTROL IN PLASMA PROCESSING SYSTEMS

PLASMA PROCESSING SYSTEM ESC HIGH VOLTAGE CONTROL AND METHODS THEREOF

ADJUSTING CURRENT RATIOS IN INDUCTIVELY COUPLED PLASMA PROCESSING S...

ARRANGEMENTS FOR DETECTING DISCONTINUITY OF FLEXIBLE CONNECTIONS FO...

PLASMA PROCESSING SYSTEM ESC HIGH VOLTAGE CONTROL

Methods and array for creating a mathematical model of a plasma pro...

Method for toolmatching and troubleshooting a plasma processing system

Method for toolmatching and troubleshooting a plasma processing system

Method for toolmatching and troubleshooting a plasma processing system