Shahid Rauf

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Smart dynamic load simulator for RF power delivery control system
- Patent number 12,080,519
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Jie Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,935,724
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,587,766
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus to reduce polymers deposition
- Patent number 11,551,965
- Issue date Jan 10, 2023
- Applied Materials, Inc.
- Andrew Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 11,315,760
- Issue date Apr 26, 2022
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Showerhead with interlaced gas feed and removal and methods of use
- Patent number 11,189,502
- Issue date Nov 30, 2021
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with electrode array in ceiling
- Patent number 11,114,284
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion-ion plasma atomic layer etch process
- Patent number 11,101,113
- Issue date Aug 24, 2021
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,043,361
- Issue date Jun 22, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetrical plural-coil plasma source with side RF feeds and RF dis...
- Patent number 10,811,226
- Issue date Oct 20, 2020
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck with variable pixelated magnetic field
- Patent number 10,790,180
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Chih-Hsun Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for reducing particles in semiconductor proce...
- Patent number 10,770,269
- Issue date Sep 8, 2020
- Applied Materials, Inc.
- Andrew Nguyen
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,615,006
- Issue date Apr 7, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cooling base with spiral channels for ESC
- Patent number 10,586,718
- Issue date Mar 10, 2020
- Applied Materials, Inc.
- Vladimir Knyazik
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,580,620
- Issue date Mar 3, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma apparatus
- Patent number 10,573,493
- Issue date Feb 25, 2020
- Applied Materials, Inc.
- Valentin N. Todorow
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,546,728
- Issue date Jan 28, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,535,502
- Issue date Jan 14, 2020
- Applied Materials, Inc.
- James D. Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Processing tool with electrically switched electrode assembly
- Patent number 10,510,515
- Issue date Dec 17, 2019
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion-ion plasma atomic layer etch process and reactor
- Patent number 10,475,626
- Issue date Nov 12, 2019
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with variable pixelated magnetic field
- Patent number 10,460,968
- Issue date Oct 29, 2019
- Applied Materials, Inc.
- Chih-Hsun Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,453,656
- Issue date Oct 22, 2019
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for controlling temperature uniformity of a substrate
- Patent number 10,386,126
- Issue date Aug 20, 2019
- Applied Materials, Inc.
- Kallol Bera
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Symmetrical inductively coupled plasma source with coaxial RF feed...
- Patent number 10,249,470
- Issue date Apr 2, 2019
- Applied Materials, Inc.
- Jason A. Kenney
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus and liner assembly for tuning electrica...
- Patent number 10,242,847
- Issue date Mar 26, 2019
- Applied Materials, Inc.
- James D. Carducci
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Multiple coil inductively coupled plasma source with offset frequen...
- Patent number 10,170,279
- Issue date Jan 1, 2019
- Applied Materials, Inc.
- Jason A. Kenney
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multiple electrode substrate support assembly and phase control system
- Patent number 10,153,139
- Issue date Dec 11, 2018
- Applied Materials, Inc.
- Yang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma source with top coil over a ceiling and...
- Patent number 10,131,994
- Issue date Nov 20, 2018
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled plasma source with symmetrical RF feed
- Patent number 9,928,987
- Issue date Mar 27, 2018
- Applied Materials, Inc.
- Jason A. Kenney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma source with multiple dielectric windows...
- Patent number 9,896,769
- Issue date Feb 20, 2018
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
REDUCING ASPECT RATIO DEPENDENT ETCH WITH DIRECT CURRENT BIAS PULSING
- Publication number 20240162007
- Publication date May 16, 2024
- Applied Materials, Inc.
- Deyang LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SMART DYNAMIC LOAD SIMULATOR FOR RF POWER DELIVERY CONTROL SYSTEM
- Publication number 20230411119
- Publication date Dec 21, 2023
- Applied Materials, Inc.
- Jie Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR
- Publication number 20230197406
- Publication date Jun 22, 2023
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE EDGE RING THAT EXTENDS PROCESS ENVIRONMENT BEYOND SUBSTRA...
- Publication number 20220293397
- Publication date Sep 15, 2022
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20220254606
- Publication date Aug 11, 2022
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CHAMBER WITH A MULTIPHASE ROTATING MODULATED CROSS-FLOW
- Publication number 20220084794
- Publication date Mar 17, 2022
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Showerhead With Interlaced Gas Feed And Removal And Methods Of Use
- Publication number 20220051910
- Publication date Feb 17, 2022
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR
- Publication number 20210313147
- Publication date Oct 7, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK FOR HIGH BIAS RADIO FREQUENCY (RF) POWER APPLIC...
- Publication number 20200286717
- Publication date Sep 10, 2020
- Applied Materials, Inc.
- JAEYONG CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20200185192
- Publication date Jun 11, 2020
- Applied Materials, Inc.
- James D. Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
APPARATUS TO REDUCE POLYMERS DEPOSITION
- Publication number 20200185256
- Publication date Jun 11, 2020
- Applied Materials, Inc.
- Andrew NGUYEN
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
ION-ION PLASMA ATOMIC LAYER ETCH PROCESS
- Publication number 20200035454
- Publication date Jan 30, 2020
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK WITH VARIABLE PIXELATED MAGNETIC FIELD
- Publication number 20200013661
- Publication date Jan 9, 2020
- Applied Materials, Inc.
- Chih-Hsun Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF TAILORED VOLTAGE ON BIAS OPERATION
- Publication number 20190311884
- Publication date Oct 10, 2019
- Applied Materials, Inc.
- Satoru KOBAYASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWERHEAD WITH INTERLACED GAS FEED AND REMOVAL AND METHODS OF USE
- Publication number 20190311920
- Publication date Oct 10, 2019
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Reactor Having Radial Struts for Substrate Support
- Publication number 20190085467
- Publication date Mar 21, 2019
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA REACTOR WITH ELECTRODE ARRAY IN CEILING
- Publication number 20180374685
- Publication date Dec 27, 2018
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING TOOL WITH ELECTRICALLY SWITCHED ELECTRODE ASSEMBLY
- Publication number 20180374684
- Publication date Dec 27, 2018
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTIPLE ELECTRODE SUBSTRATE SUPPORT ASSEMBLY AND PHASE CONTROL SYSTEM
- Publication number 20180366306
- Publication date Dec 20, 2018
- Applied Materials, Inc.
- Yang YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH PHASE SHIFT APPLIED ACROSS ELECTRODE ARRAY
- Publication number 20180308663
- Publication date Oct 25, 2018
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA REACTOR WITH GROUPS OF ELECTRODES
- Publication number 20180308667
- Publication date Oct 25, 2018
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA REACTOR WITH FILAMENTS AND RF POWER APPLIED AT MULTIPLE FREQ...
- Publication number 20180308664
- Publication date Oct 25, 2018
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION-ION PLASMA ATOMIC LAYER ETCH PROCESS AND REACTOR
- Publication number 20180261429
- Publication date Sep 13, 2018
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA SOURCE WITH SYMMETRICAL RF FEED AND REAC...
- Publication number 20180218873
- Publication date Aug 2, 2018
- Applied Materials, Inc.
- Jason A. Kenney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SOURCE WITH SYMMETRICAL RF FEED
- Publication number 20180211811
- Publication date Jul 26, 2018
- Applied Materials, Inc.
- Jason A. Kenney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Symmetrical Plural-Coil Plasma Source with Side Rf Feeds and Rf Dis...
- Publication number 20180138014
- Publication date May 17, 2018
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Symmetric VHF Source for a Plasma Reactor
- Publication number 20180053630
- Publication date Feb 22, 2018
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low Electron Temperature Etch Chamber with Independent Control Over...
- Publication number 20180053631
- Publication date Feb 22, 2018
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductively Coupled Plasma Source with Multiple Dielectric Windows...
- Publication number 20170350018
- Publication date Dec 7, 2017
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Symmetrical Inductively Coupled Plasma Source with Symmetrical Flow...
- Publication number 20170350017
- Publication date Dec 7, 2017
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Shahid Rauf

Person

Patents Grantslast 30 patents

Smart dynamic load simulator for RF power delivery control system

Symmetric VHF source for a plasma reactor

Symmetric VHF source for a plasma reactor

Apparatus to reduce polymers deposition

Symmetric plasma process chamber

Showerhead with interlaced gas feed and removal and methods of use

Plasma reactor with electrode array in ceiling

Ion-ion plasma atomic layer etch process

Symmetric VHF source for a plasma reactor

Symmetrical plural-coil plasma source with side RF feeds and RF dis...

Electrostatic chuck with variable pixelated magnetic field

Apparatus and methods for reducing particles in semiconductor proce...

Symmetric plasma process chamber

Cooling base with spiral channels for ESC

Symmetric plasma process chamber

Inductively coupled plasma apparatus

Symmetric plasma process chamber

Symmetric plasma process chamber

Processing tool with electrically switched electrode assembly

Ion-ion plasma atomic layer etch process and reactor

Electrostatic chuck with variable pixelated magnetic field

Symmetric plasma process chamber

Apparatus for controlling temperature uniformity of a substrate

Symmetrical inductively coupled plasma source with coaxial RF feed...

Plasma processing apparatus and liner assembly for tuning electrica...

Multiple coil inductively coupled plasma source with offset frequen...

Multiple electrode substrate support assembly and phase control system

Inductively coupled plasma source with top coil over a ceiling and...

Inductively coupled plasma source with symmetrical RF feed

Inductively coupled plasma source with multiple dielectric windows...

Patents Applicationslast 30 patents

REDUCING ASPECT RATIO DEPENDENT ETCH WITH DIRECT CURRENT BIAS PULSING

SMART DYNAMIC LOAD SIMULATOR FOR RF POWER DELIVERY CONTROL SYSTEM

SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR

SUBSTRATE EDGE RING THAT EXTENDS PROCESS ENVIRONMENT BEYOND SUBSTRA...

SYMMETRIC PLASMA PROCESS CHAMBER

PLASMA CHAMBER WITH A MULTIPHASE ROTATING MODULATED CROSS-FLOW

Showerhead With Interlaced Gas Feed And Removal And Methods Of Use

SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR

ELECTROSTATIC CHUCK FOR HIGH BIAS RADIO FREQUENCY (RF) POWER APPLIC...

SYMMETRIC PLASMA PROCESS CHAMBER

APPARATUS TO REDUCE POLYMERS DEPOSITION

ION-ION PLASMA ATOMIC LAYER ETCH PROCESS

ELECTROSTATIC CHUCK WITH VARIABLE PIXELATED MAGNETIC FIELD

RF TAILORED VOLTAGE ON BIAS OPERATION

SHOWERHEAD WITH INTERLACED GAS FEED AND REMOVAL AND METHODS OF USE

Plasma Reactor Having Radial Struts for Substrate Support

PLASMA REACTOR WITH ELECTRODE ARRAY IN CEILING

PROCESSING TOOL WITH ELECTRICALLY SWITCHED ELECTRODE ASSEMBLY

MULTIPLE ELECTRODE SUBSTRATE SUPPORT ASSEMBLY AND PHASE CONTROL SYSTEM

PLASMA REACTOR WITH PHASE SHIFT APPLIED ACROSS ELECTRODE ARRAY

PLASMA REACTOR WITH GROUPS OF ELECTRODES

PLASMA REACTOR WITH FILAMENTS AND RF POWER APPLIED AT MULTIPLE FREQ...

ION-ION PLASMA ATOMIC LAYER ETCH PROCESS AND REACTOR

INDUCTIVELY COUPLED PLASMA SOURCE WITH SYMMETRICAL RF FEED AND REAC...

PLASMA SOURCE WITH SYMMETRICAL RF FEED

Symmetrical Plural-Coil Plasma Source with Side Rf Feeds and Rf Dis...

Symmetric VHF Source for a Plasma Reactor

Low Electron Temperature Etch Chamber with Independent Control Over...

Inductively Coupled Plasma Source with Multiple Dielectric Windows...

Symmetrical Inductively Coupled Plasma Source with Symmetrical Flow...