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Shahram Y. Mehdizadeh
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Valley Village, CA, US
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Patents Grants
last 30 patents
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Patent Grant
Controlling the thickness of wafers during the electroplating process
Patent number
7,914,657
Issue date
Mar 29, 2011
Hitachi Global Storage Technologies, Netherlands B.V.
Wai B. Fu
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Patents Applications
last 30 patents
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Patent Application
Controlling the thickness of wafers during the electroplating process
Publication number
20070125656
Publication date
Jun 7, 2007
Wai B. Fu
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR