Shailendra SRIVASTAVA

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Dynamic multi zone flow control for a processing system
- Patent number 12,159,785
- Issue date Dec 3, 2024
- Applied Materials, Inc.
- Daemian Raj Benjamin Raj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Faceplate having a curved surface
- Patent number 12,110,590
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Shailendra Srivastava
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Switchable delivery for semiconductor processing system
- Patent number 12,094,689
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Sai Susmita Addepalli
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for cleaning a process chamber
- Patent number 12,087,555
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Kalyanjit Ghosh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for controlling RF parameters at multiple fre...
- Patent number 11,956,883
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Faceplate having a curved surface
- Patent number 11,851,759
- Issue date Dec 26, 2023
- Applied Materials, Inc.
- Shailendra Srivastava
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dynamic multi zone flow control for a processing system
- Patent number 11,798,803
- Issue date Oct 24, 2023
- Applied Materials, Inc.
- Daemian Raj Benjamin Raj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Power supply signal conditioning for an electrostatic chuck
- Patent number 11,776,835
- Issue date Oct 3, 2023
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for controlling RF parameters at multiple fre...
- Patent number 11,570,879
- Issue date Jan 31, 2023
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Faceplate having a curved surface
- Patent number 11,530,482
- Issue date Dec 20, 2022
- Applied Materials, Inc.
- Shailendra Srivastava
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for cleaning a process chamber
- Patent number 11,532,462
- Issue date Dec 20, 2022
- Applied Materials, Inc.
- Kalyanjit Ghosh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor substrate supports with improved high temperature chu...
- Patent number 11,501,993
- Issue date Nov 15, 2022
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film stack overlay improvement
- Patent number 11,339,475
- Issue date May 24, 2022
- Applied Materials, Inc.
- Xinhai Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning a process chamber
- Patent number 10,636,628
- Issue date Apr 28, 2020
- Applied Materials, Inc.
- Kalyanjit Ghosh
- B08 - CLEANING
Information Patent Grant
System and method for substrate processing chambers
- Patent number 10,600,624
- Issue date Mar 24, 2020
- Applied Materials, Inc.
- Kalyanjit Ghosh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
DYNAMIC MULTI ZONE FLOW CONTROL FOR A PROCESSING SYSTEM
- Publication number 20250006487
- Publication date Jan 2, 2025
- Applied Materials, Inc.
- Daemian Raj BENJAMIN RAJ
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FACEPLATE HAVING A CURVED SURFACE
- Publication number 20240044000
- Publication date Feb 8, 2024
- Applied Materials, Inc.
- Shailendra SRIVASTAVA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DYNAMIC MULTI ZONE FLOW CONTROL FOR A PROCESSING SYSTEM
- Publication number 20230420245
- Publication date Dec 28, 2023
- Applied Materials, Inc.
- Daemian Raj BENJAMIN RAJ
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR CLEANING A PROCESS CHAMBER
- Publication number 20230128297
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Kalyanjit GHOSH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Apparatus for Controlling RF Parameters at Multiple Fre...
- Publication number 20230131809
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FACEPLATE HAVING A CURVED SURFACE
- Publication number 20230123089
- Publication date Apr 20, 2023
- APPLIED MATERIALS, INC.
- Shailendra SRIVASTAVA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POWER SUPPLY SIGNAL CONDITIONING FOR AN ELECTROSTATIC CHUCK
- Publication number 20220102179
- Publication date Mar 31, 2022
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SWITCHABLE DELIVERY FOR SEMICONDUCTOR PROCESSING SYSTEM
- Publication number 20220020570
- Publication date Jan 20, 2022
- Applied Materials, Inc.
- Sai Susmita Addepalli
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods and Apparatus for Controlling RF Parameters at Multiple Fre...
- Publication number 20210059037
- Publication date Feb 25, 2021
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER CONFIGURATIONS FOR CONTROLLED DEPOSITION
- Publication number 20210047730
- Publication date Feb 18, 2021
- Applied Materials, Inc.
- Sai Susmita Addepalli
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR SUBSTRATE SUPPORTS WITH IMPROVED HIGH TEMPERATURE CHU...
- Publication number 20210035843
- Publication date Feb 4, 2021
- Applied Materials, Inc.
- Jian Li
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
THERMALLY STABLE FLOW METERS FOR PRECISION FLUID DELIVERY
- Publication number 20210003340
- Publication date Jan 7, 2021
- Applied Materials, Inc.
- Shailendra SRIVASTAVA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FACEPLATE HAVING A CURVED SURFACE
- Publication number 20200385862
- Publication date Dec 10, 2020
- Applied Materials, Inc.
- Shailendra SRIVASTAVA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DYNAMIC MULTI ZONE FLOW CONTROL FOR A PROCESSING SYSTEM
- Publication number 20200365386
- Publication date Nov 19, 2020
- Applied Materials, Inc.
- Daemian Raj BENJAMIN RAJ
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR CLEANING A PROCESS CHAMBER
- Publication number 20200251311
- Publication date Aug 6, 2020
- Applied Materials, Inc.
- Kalyanjit GHOSH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM STACK OVERLAY IMPROVEMENT FOR 3D NAND APPLICATION
- Publication number 20200173022
- Publication date Jun 4, 2020
- Applied Materials, Inc.
- Xinhai HAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TECHNIQUE TO ENABLE HIGH TEMPERATURE CLEAN FOR RAPID PROCESSING OF...
- Publication number 20190382889
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- Venkata Sharat Chandra PARIMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PRESSURE SKEW SYSTEM FOR CONTROLLING CENTER-TO-EDGE PRESSURE CHANGE
- Publication number 20190338420
- Publication date Nov 7, 2019
- Applied Materials, Inc.
- Shailendra SRIVASTAVA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR SUBSTRATE PROCESSING CHAMBERS
- Publication number 20190122872
- Publication date Apr 25, 2019
- Applied Materials, Inc.
- Kalyanjit GHOSH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method And System For Cleaning A Process Chamber
- Publication number 20190080889
- Publication date Mar 14, 2019
- Applied Materials, Inc.
- Kalyanjit GHOSH
- H01 - BASIC ELECTRIC ELEMENTS

Shailendra SRIVASTAVA

Person

Patents Grantslast 30 patents

Dynamic multi zone flow control for a processing system

Faceplate having a curved surface

Switchable delivery for semiconductor processing system

Method and system for cleaning a process chamber

Methods and apparatus for controlling RF parameters at multiple fre...

Faceplate having a curved surface

Dynamic multi zone flow control for a processing system

Power supply signal conditioning for an electrostatic chuck

Methods and apparatus for controlling RF parameters at multiple fre...

Faceplate having a curved surface

Method and system for cleaning a process chamber

Semiconductor substrate supports with improved high temperature chu...

Film stack overlay improvement

Method for cleaning a process chamber

System and method for substrate processing chambers

Patents Applicationslast 30 patents

DYNAMIC MULTI ZONE FLOW CONTROL FOR A PROCESSING SYSTEM

FACEPLATE HAVING A CURVED SURFACE

DYNAMIC MULTI ZONE FLOW CONTROL FOR A PROCESSING SYSTEM

METHOD AND SYSTEM FOR CLEANING A PROCESS CHAMBER

Methods and Apparatus for Controlling RF Parameters at Multiple Fre...

FACEPLATE HAVING A CURVED SURFACE

POWER SUPPLY SIGNAL CONDITIONING FOR AN ELECTROSTATIC CHUCK

SWITCHABLE DELIVERY FOR SEMICONDUCTOR PROCESSING SYSTEM

Methods and Apparatus for Controlling RF Parameters at Multiple Fre...

CHAMBER CONFIGURATIONS FOR CONTROLLED DEPOSITION

SEMICONDUCTOR SUBSTRATE SUPPORTS WITH IMPROVED HIGH TEMPERATURE CHU...

THERMALLY STABLE FLOW METERS FOR PRECISION FLUID DELIVERY

FACEPLATE HAVING A CURVED SURFACE

DYNAMIC MULTI ZONE FLOW CONTROL FOR A PROCESSING SYSTEM

METHOD AND SYSTEM FOR CLEANING A PROCESS CHAMBER

FILM STACK OVERLAY IMPROVEMENT FOR 3D NAND APPLICATION

TECHNIQUE TO ENABLE HIGH TEMPERATURE CLEAN FOR RAPID PROCESSING OF...

PRESSURE SKEW SYSTEM FOR CONTROLLING CENTER-TO-EDGE PRESSURE CHANGE

SYSTEM AND METHOD FOR SUBSTRATE PROCESSING CHAMBERS

Method And System For Cleaning A Process Chamber