Shankar Krishnan

Person

Chatham, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective compact lens for magneto-optic Kerr effect metrology system
- Patent number 12,164,093
- Issue date Dec 10, 2024
- Alex Zheng
- G02 - OPTICS
Information Patent Grant
Monolithic optical retarder
- Patent number 11,906,770
- Issue date Feb 20, 2024
- KLA Corporal
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Grant
Scatterometry modeling in the presence of undesired diffraction orders
- Patent number 11,422,095
- Issue date Aug 23, 2022
- KLA Corporation
- Phillip Atkins
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay metrology on bonded wafers
- Patent number 11,309,202
- Issue date Apr 19, 2022
- KLA Corporation
- Shankar Krishnan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-environment polarized infrared reflectometer for semiconducto...
- Patent number 11,231,362
- Issue date Jan 25, 2022
- KLA Corporation
- Guorong V. Zhuang
- G01 - MEASURING TESTING
Information Patent Grant
Mid-infrared spectroscopy for measurement of high aspect ratio stru...
- Patent number 11,137,350
- Issue date Oct 5, 2021
- KLA Corporation
- David Y. Wang
- G01 - MEASURING TESTING
Information Patent Grant
Methods and systems for measurement of thick films and high aspect...
- Patent number 11,119,050
- Issue date Sep 14, 2021
- KLA Corporation
- Noam Sapiens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample transport device with integrated metrology
- Patent number 11,056,366
- Issue date Jul 6, 2021
- KLA Corporation
- Giampietro Bieli
- G01 - MEASURING TESTING
Information Patent Grant
Magneto-optic Kerr effect metrology systems
- Patent number 11,043,239
- Issue date Jun 22, 2021
- KLA Corporation
- Jun Wang
- G11 - INFORMATION STORAGE
Information Patent Grant
Methods and systems for measurement of thick films and high aspect...
- Patent number 10,690,602
- Issue date Jun 23, 2020
- KLA-Tencor Corporation
- Noam Sapiens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement of multiple patterning parameters
- Patent number 10,612,916
- Issue date Apr 7, 2020
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Metrology system calibration refinement
- Patent number 10,605,722
- Issue date Mar 31, 2020
- KLA-Tencor Corporation
- Hidong Kwak
- G01 - MEASURING TESTING
Information Patent Grant
Optical measurement of a highly absorbing film layer over highly re...
- Patent number 10,551,166
- Issue date Feb 4, 2020
- KLA-Tencor Corporation
- Carlos L. Ygartua
- G01 - MEASURING TESTING
Information Patent Grant
Spectral reflectometry for in-situ process monitoring and control
- Patent number 10,438,825
- Issue date Oct 8, 2019
- KLA-Tencor Corporation
- Prateek Jain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Guided image upsampling using bitmap tracing
- Patent number 10,402,941
- Issue date Sep 3, 2019
- AT&T Intellectual Property I, L.P.
- Shankar Krishnan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Critical dimension measurements with gaseous adsorption
- Patent number 10,281,263
- Issue date May 7, 2019
- KLA-Tencor Corporation
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Grant
Infrared spectroscopic reflectometer for measurement of high aspect...
- Patent number 10,215,693
- Issue date Feb 26, 2019
- KLA-Tencor Corporation
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for image filtering
- Patent number 10,152,779
- Issue date Dec 11, 2018
- AT&T Intellectual Property I, L.P.
- Chao Tian
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measurement of semiconductor structures with capillary condensation
- Patent number 10,145,674
- Issue date Dec 4, 2018
- KLA-Tencor Corporation
- Shankar Krishnan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Porosity measurement of semiconductor structures
- Patent number 10,041,873
- Issue date Aug 7, 2018
- KLA-Tencor Corporation
- Shankar Krishnan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical metrology with reduced focus error sensitivity
- Patent number 9,970,863
- Issue date May 15, 2018
- KLA-Tencor Corporation
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Grant
Small spot size spectroscopic ellipsometer
- Patent number 9,952,140
- Issue date Apr 24, 2018
- KLA-Tencor Corporation
- Haiming Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Simultaneous multi-angle spectroscopy
- Patent number 9,921,104
- Issue date Mar 20, 2018
- KLA-Tencor Corporation
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for extended infrared spectroscopic ellipsometry
- Patent number 9,921,152
- Issue date Mar 20, 2018
- KLA-Tencor Corporation
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Grant
Metrology system calibration refinement
- Patent number 9,857,291
- Issue date Jan 2, 2018
- KLA-Tencor Corporation
- Hidong Kwak
- G01 - MEASURING TESTING
Information Patent Grant
Measurement of multiple patterning parameters
- Patent number 9,816,810
- Issue date Nov 14, 2017
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Guided image upsampling using bitmap tracing
- Patent number 9,741,096
- Issue date Aug 22, 2017
- AT&T Intellectual Property I, L.P.
- Shankar Krishnan
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Method and apparatus for image filtering
- Patent number 9,514,520
- Issue date Dec 6, 2016
- AT&T Intellectual Property I, L.P.
- Chao Tian
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measurement of multiple patterning parameters
- Patent number 9,490,182
- Issue date Nov 8, 2016
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Guided image upsampling using bitmap tracing
- Patent number 9,491,472
- Issue date Nov 8, 2016
- AT&T Intellectual Property I, L.P.
- Shankar Krishnan
- H04 - ELECTRIC COMMUNICATION TECHNIQUE

Patents Applicationslast 30 patents

Information Patent Application
Optics For Measurement Of Thick Films And High Aspect Ratio Structures
- Publication number 20240418635
- Publication date Dec 19, 2024
- KLA Corporation
- David Y. Wang
- G01 - MEASURING TESTING
Information Patent Application
COMBINATION OF MULTIWAVELENGTH RAMAN AND SPECTROSCOPIC ELLIPSOMETRY...
- Publication number 20240418633
- Publication date Dec 19, 2024
- KLA Corporation
- Shova Subedi
- G01 - MEASURING TESTING
Information Patent Application
Combined Spectroscopic Reflectometry And Pattern Recognition Based...
- Publication number 20240353321
- Publication date Oct 24, 2024
- KLA Corporation
- David Y. Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Methods And Systems For Scatterometry Based Metrology Of Structures...
- Publication number 20240201073
- Publication date Jun 20, 2024
- KLA Corporation
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Application
Methods And Systems For Measurement Of Semiconductor Structures Wit...
- Publication number 20240162074
- Publication date May 16, 2024
- KLA Corporation
- Phalguna Rachinayani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods And Systems For Systematic Error Compensation Across A Flee...
- Publication number 20240053280
- Publication date Feb 15, 2024
- KLA Corporation
- Ming Di
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASUREMENT OF THICK FILMS AND HIGH ASPECT RATIO STRUCTURES
- Publication number 20230341337
- Publication date Oct 26, 2023
- KLA Corporation
- David Y. Wang
- G01 - MEASURING TESTING
Information Patent Application
MONOLITHIC OPTICAL RETARDER
- Publication number 20230131913
- Publication date Apr 27, 2023
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Application
Spectroscopic Reflectometry And Ellipsometry Measurements With Elec...
- Publication number 20230109008
- Publication date Apr 6, 2023
- KLA Corporation
- William McGahan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE COMPACT LENS FOR MAGNETO-OPTIC KERR EFFECT METROLOGY SYSTEM
- Publication number 20220137380
- Publication date May 5, 2022
- KLA Corporation
- Alex ZHENG
- G02 - OPTICS
Information Patent Application
OVERLAY METROLOGY ON BONDED WAFERS
- Publication number 20210242060
- Publication date Aug 5, 2021
- KLA Corporation
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Application
MAGNETO-OPTIC KERR EFFECT METROLOGY SYSTEMS
- Publication number 20200302965
- Publication date Sep 24, 2020
- KLA Corporation
- Jun Wang
- G11 - INFORMATION STORAGE
Information Patent Application
Methods And Systems For Measurement Of Thick Films And High Aspect...
- Publication number 20200284733
- Publication date Sep 10, 2020
- KLA Corporation
- Noam Sapiens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Improved Optimization of Machine-Learned Mo...
- Publication number 20200250515
- Publication date Aug 6, 2020
- Google LLC
- Ryan Rifkin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Mid-Infrared Spectroscopy For Measurement Of High Aspect Ratio Stru...
- Publication number 20200240907
- Publication date Jul 30, 2020
- KLA Corporation
- David Y. Wang
- G01 - MEASURING TESTING
Information Patent Application
Scatterometry Modeling in the Presence of Undesired Diffraction Orders
- Publication number 20200232909
- Publication date Jul 23, 2020
- KLA-Tencor Corporation
- Phillip Atkins
- G01 - MEASURING TESTING
Information Patent Application
Sample Transport Device With Integrated Metrology
- Publication number 20190295874
- Publication date Sep 26, 2019
- KLA-Tencor Corporation
- Giampietro Bieli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optical Measurement Of A Highly Absorbing Film Layer Over Highly Re...
- Publication number 20190107384
- Publication date Apr 11, 2019
- KLA-Tencor Corporation
- Carlos L. Ygartua
- G01 - MEASURING TESTING
Information Patent Application
Methods And Systems For Measurement Of Thick Films And High Aspect...
- Publication number 20180238814
- Publication date Aug 23, 2018
- KLA-Tencor Corporation
- Noam Sapiens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY SYSTEM CALIBRATION REFINEMENT
- Publication number 20180100796
- Publication date Apr 12, 2018
- KLA-Tencor Corporation
- Hidong Kwak
- G01 - MEASURING TESTING
Information Patent Application
Infrared Spectroscopic Reflectometer For Measurement Of High Aspect...
- Publication number 20180088040
- Publication date Mar 29, 2018
- KLA-Tencor Corporation
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Application
Spectral Reflectometry For In-Situ Process Monitoring And Control
- Publication number 20180061691
- Publication date Mar 1, 2018
- KLA-Tencor Corporation
- Prateek Jain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Measurement Of Multiple Patterning Parameters
- Publication number 20180051984
- Publication date Feb 22, 2018
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
Simultaneous Multi-Angle Spectroscopy
- Publication number 20170356800
- Publication date Dec 14, 2017
- KLA-Tencor Corporation
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Application
Porosity Measurement Of Semiconductor Structures
- Publication number 20170315044
- Publication date Nov 2, 2017
- KLA-Tencor Corporation
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Application
GUIDED IMAGE UPSAMPLING USING BITMAP TRACING
- Publication number 20170316546
- Publication date Nov 2, 2017
- AT&T INTELLECTUAL PROPERTY I, L.P.
- Shankar Krishnan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Measurement Of Semiconductor Structures With Capillary Condensation
- Publication number 20170314912
- Publication date Nov 2, 2017
- KLA-Tencor Corporation
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Application
Critical Dimension Measurements With Gaseous Adsorption
- Publication number 20170314913
- Publication date Nov 2, 2017
- KLA-Tencor Corporation
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Application
Systems And Methods For Extended Infrared Spectroscopic Ellipsometry
- Publication number 20170205342
- Publication date Jul 20, 2017
- KLA-Tencor Corporation
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR IMAGE FILTERING
- Publication number 20170046822
- Publication date Feb 16, 2017
- AT&T INTELLECTUAL PROPERTY I, L.P.
- Chao Tian
- G06 - COMPUTING CALCULATING COUNTING

Shankar Krishnan

Person

Patents Grantslast 30 patents

Reflective compact lens for magneto-optic Kerr effect metrology system

Monolithic optical retarder

Scatterometry modeling in the presence of undesired diffraction orders

Overlay metrology on bonded wafers

Multi-environment polarized infrared reflectometer for semiconducto...

Mid-infrared spectroscopy for measurement of high aspect ratio stru...

Methods and systems for measurement of thick films and high aspect...

Sample transport device with integrated metrology

Magneto-optic Kerr effect metrology systems

Methods and systems for measurement of thick films and high aspect...

Measurement of multiple patterning parameters

Metrology system calibration refinement

Optical measurement of a highly absorbing film layer over highly re...

Spectral reflectometry for in-situ process monitoring and control

Guided image upsampling using bitmap tracing

Critical dimension measurements with gaseous adsorption

Infrared spectroscopic reflectometer for measurement of high aspect...

Method and apparatus for image filtering

Measurement of semiconductor structures with capillary condensation

Porosity measurement of semiconductor structures

Optical metrology with reduced focus error sensitivity

Small spot size spectroscopic ellipsometer

Simultaneous multi-angle spectroscopy

Systems and methods for extended infrared spectroscopic ellipsometry

Metrology system calibration refinement

Measurement of multiple patterning parameters

Guided image upsampling using bitmap tracing

Method and apparatus for image filtering

Measurement of multiple patterning parameters

Guided image upsampling using bitmap tracing

Patents Applicationslast 30 patents

Optics For Measurement Of Thick Films And High Aspect Ratio Structures

COMBINATION OF MULTIWAVELENGTH RAMAN AND SPECTROSCOPIC ELLIPSOMETRY...

Combined Spectroscopic Reflectometry And Pattern Recognition Based...

Methods And Systems For Scatterometry Based Metrology Of Structures...

Methods And Systems For Measurement Of Semiconductor Structures Wit...

Methods And Systems For Systematic Error Compensation Across A Flee...

MEASUREMENT OF THICK FILMS AND HIGH ASPECT RATIO STRUCTURES

MONOLITHIC OPTICAL RETARDER

Spectroscopic Reflectometry And Ellipsometry Measurements With Elec...

REFLECTIVE COMPACT LENS FOR MAGNETO-OPTIC KERR EFFECT METROLOGY SYSTEM

OVERLAY METROLOGY ON BONDED WAFERS

MAGNETO-OPTIC KERR EFFECT METROLOGY SYSTEMS

Methods And Systems For Measurement Of Thick Films And High Aspect...

Systems and Methods for Improved Optimization of Machine-Learned Mo...

Mid-Infrared Spectroscopy For Measurement Of High Aspect Ratio Stru...

Scatterometry Modeling in the Presence of Undesired Diffraction Orders

Sample Transport Device With Integrated Metrology

Optical Measurement Of A Highly Absorbing Film Layer Over Highly Re...

Methods And Systems For Measurement Of Thick Films And High Aspect...

METROLOGY SYSTEM CALIBRATION REFINEMENT

Infrared Spectroscopic Reflectometer For Measurement Of High Aspect...

Spectral Reflectometry For In-Situ Process Monitoring And Control

Measurement Of Multiple Patterning Parameters

Simultaneous Multi-Angle Spectroscopy

Porosity Measurement Of Semiconductor Structures

GUIDED IMAGE UPSAMPLING USING BITMAP TRACING

Measurement Of Semiconductor Structures With Capillary Condensation

Critical Dimension Measurements With Gaseous Adsorption

Systems And Methods For Extended Infrared Spectroscopic Ellipsometry

METHOD AND APPARATUS FOR IMAGE FILTERING