Shao-Ming Wei

Person

Hsinchu, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Cleaning method, semiconductor manufacturing method and a system th...
- Patent number 11,600,484
- Issue date Mar 7, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Shao-Chi Wei
- B08 - CLEANING
Information Patent Grant
Method for cleaning substrate, method for manufacturing photomask a...
- Patent number 11,209,736
- Issue date Dec 28, 2021
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yu-Hsin Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming photomask and photolithography method
- Patent number 10,845,699
- Issue date Nov 24, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and fabrication method therefor
- Patent number 10,816,891
- Issue date Oct 27, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hao-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for processing substrate by chemical solution in...
- Patent number 10,508,953
- Issue date Dec 17, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Min-An Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank and fabrication method thereof, and method of fabricatin...
- Patent number 10,459,332
- Issue date Oct 29, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hao-Ming Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photo mask assembly and optical apparatus including the same
- Patent number 10,101,651
- Issue date Oct 16, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd
- SHao-Chi Wei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for repairing opaque defects on semiconductor mask reticles
- Patent number 7,223,503
- Issue date May 29, 2007
- Taiwan Semiconductor Manufacturing Company
- Wei-Lian Lin
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
CLEANING METHOD, SEMICONDUCTOR MANUFACTURING METHOD AND A SYSTEM TH...
- Publication number 20220359187
- Publication date Nov 10, 2022
- Taiwan Semiconductor Manufacturing company Ltd.
- SHAO-CHI WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING SUBSTRATE, METHOD FOR MANUFACTURING PHOTOMASK A...
- Publication number 20220113631
- Publication date Apr 14, 2022
- Taiwan Semiconductor Manufacturing company Ltd.
- YU-HSIN HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING METHOD, SEMICONDUCTOR MANUFACTURING METHOD AND A SYSTEM TH...
- Publication number 20210057209
- Publication date Feb 25, 2021
- Taiwan Semiconductor Manufacturing company Ltd.
- SHAO-CHI WEI
- B08 - CLEANING
Information Patent Application
METHOD FOR CLEANING SUBSTRATE, METHOD FOR MANUFACTURING PHOTOMASK A...
- Publication number 20200133118
- Publication date Apr 30, 2020
- Taiwan Semiconductor Manufacturing company Ltd.
- YU-HSIN HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING PHOTOMASK AND PHOTOLITHOGRAPHY METHOD
- Publication number 20190163051
- Publication date May 30, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Ming CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTO MASK ASSEMBLY AND OPTICAL APPARATUS INCLUDING THE SAME
- Publication number 20180299768
- Publication date Oct 18, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shao-Chi Wei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND FABRICATION METHOD THEREOF, AND METHOD OF FABRICATIN...
- Publication number 20180284601
- Publication date Oct 4, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hao-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR PROCESSING SUBSTRATE BY CHEMICAL SOLUTION IN...
- Publication number 20180161828
- Publication date Jun 14, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Min-An YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK AND FABRICATION METHOD THEREFOR
- Publication number 20180164675
- Publication date Jun 14, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hao-Ming CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reticle film stabilizing method
- Publication number 20050260503
- Publication date Nov 24, 2005
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Lian Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for repairing opaque defects on semiconductor mask reticles
- Publication number 20050146715
- Publication date Jul 7, 2005
- Wei-Lian Lin
- G01 - MEASURING TESTING
Information Patent Application
Circuit for enhancing scan testing capability of a digital IC tester
- Publication number 20040037227
- Publication date Feb 26, 2004
- Kuo-Hung Shih
- G01 - MEASURING TESTING

Shao-Ming Wei

Person

Patents Grantslast 30 patents

Cleaning method, semiconductor manufacturing method and a system th...

Method for cleaning substrate, method for manufacturing photomask a...

Method for forming photomask and photolithography method

Photomask and fabrication method therefor

Method and system for processing substrate by chemical solution in...

Mask blank and fabrication method thereof, and method of fabricatin...

Photo mask assembly and optical apparatus including the same

Method for repairing opaque defects on semiconductor mask reticles

Patents Applicationslast 30 patents

CLEANING METHOD, SEMICONDUCTOR MANUFACTURING METHOD AND A SYSTEM TH...

METHOD FOR CLEANING SUBSTRATE, METHOD FOR MANUFACTURING PHOTOMASK A...

CLEANING METHOD, SEMICONDUCTOR MANUFACTURING METHOD AND A SYSTEM TH...

METHOD FOR CLEANING SUBSTRATE, METHOD FOR MANUFACTURING PHOTOMASK A...

METHOD FOR FORMING PHOTOMASK AND PHOTOLITHOGRAPHY METHOD

PHOTO MASK ASSEMBLY AND OPTICAL APPARATUS INCLUDING THE SAME

BLANK MASK AND FABRICATION METHOD THEREOF, AND METHOD OF FABRICATIN...

METHOD AND SYSTEM FOR PROCESSING SUBSTRATE BY CHEMICAL SOLUTION IN...

PHOTOMASK AND FABRICATION METHOD THEREFOR

Reticle film stabilizing method

Method for repairing opaque defects on semiconductor mask reticles

Circuit for enhancing scan testing capability of a digital IC tester