Sharon Aharon

Person

Hanaton, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Reduction or elimination of pattern placement error in metrology me...
- Patent number 12,013,634
- Issue date Jun 18, 2024
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Reduction or elimination of pattern placement error in metrology me...
- Patent number 11,537,043
- Issue date Dec 27, 2022
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Parameter-stable misregistration measurement amelioration in semico...
- Patent number 11,101,153
- Issue date Aug 24, 2021
- KLA Corporation
- Vladimir Levinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Determining the impacts of stochastic behavior on overlay metrology...
- Patent number 10,901,325
- Issue date Jan 26, 2021
- KLA-Tencor Corporation
- Evgeni Gurevich
- G01 - MEASURING TESTING
Information Patent Grant
Process compatibility improvement by fill factor modulation
- Patent number 10,579,768
- Issue date Mar 3, 2020
- KLA-Tencor Corporation
- Vladimir Levinski
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...
- Publication number 20230099105
- Publication date Mar 30, 2023
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...
- Publication number 20210149296
- Publication date May 20, 2021
- KLA-Tencor Corporation
- Yoel Feler
- G01 - MEASURING TESTING
Information Patent Application
PARAMETER-STABLE MISREGISTRATION MEASUREMENT AMELIORATION IN SEMICO...
- Publication number 20210020480
- Publication date Jan 21, 2021
- KLA Corporation
- Vladimir LEVINSKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...
- Publication number 20190250504
- Publication date Aug 15, 2019
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINING THE IMPACTS OF STOCHASTIC BEHAVIOR ON OVERLAY METROLOGY...
- Publication number 20190049858
- Publication date Feb 14, 2019
- KLA-Tencor Corporation
- Evgeni GUREVICH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process Compatibility Improvement by Fill Factor Modulation
- Publication number 20180157784
- Publication date Jun 7, 2018
- KLA-Tencor Corporation
- Vladimir Levinski
- G06 - COMPUTING CALCULATING COUNTING

Sharon Aharon

Person

Patents Grantslast 30 patents

Reduction or elimination of pattern placement error in metrology me...

Reduction or elimination of pattern placement error in metrology me...

Parameter-stable misregistration measurement amelioration in semico...

Determining the impacts of stochastic behavior on overlay metrology...

Process compatibility improvement by fill factor modulation

Patents Applicationslast 30 patents

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...

PARAMETER-STABLE MISREGISTRATION MEASUREMENT AMELIORATION IN SEMICO...

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...

DETERMINING THE IMPACTS OF STOCHASTIC BEHAVIOR ON OVERLAY METROLOGY...

Process Compatibility Improvement by Fill Factor Modulation