Shashank SHARMA

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods, systems, and apparatus for conducting a radical treatment...
- Patent number 11,901,195
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Pradeep Sampath Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for radical and thermal processing of substrates
- Patent number 11,823,901
- Issue date Nov 21, 2023
- Applied Materials Inc.
- Xinming Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for metal silicide deposition
- Patent number 11,615,986
- Issue date Mar 28, 2023
- Applied Materials, Inc.
- Xuebin Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for radical and thermal processing of substrates
- Patent number 11,587,789
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Xinming Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogen management in plasma deposited films
- Patent number 11,562,902
- Issue date Jan 24, 2023
- Applied Materials, Inc.
- Rui Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of post treating dielectric films with microwave radiation
- Patent number 11,469,100
- Issue date Oct 11, 2022
- Applied Materials, Inc.
- Yong Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Annealing processes for memory devices
- Patent number 11,362,275
- Issue date Jun 14, 2022
- Applied Materials, Inc.
- Nicolas Louis Gabriel Breil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for metal silicide deposition
- Patent number 11,152,221
- Issue date Oct 19, 2021
- Applied Materials, Inc.
- Xuebin Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing system and method of forming a contact
- Patent number 11,114,320
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Gaurav Thareja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogenation and nitridization processes for reducing oxygen conte...
- Patent number 10,504,779
- Issue date Dec 10, 2019
- Applied Materials, Inc.
- Johanes S. Swenberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rotating substrate laser anneal
- Patent number 10,256,005
- Issue date Apr 9, 2019
- Applied Materials, Inc.
- Joseph M. Ranish
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Hydrogenation and nitridization processes for reducing oxygen conte...
- Patent number 10,236,207
- Issue date Mar 19, 2019
- Applied Materials, Inc.
- Johanes S. Swenberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogenation and nitridization processes for modifying effective o...
- Patent number 10,103,027
- Issue date Oct 16, 2018
- Applied Materials, Inc.
- Johanes S. Swenberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Crystallization of amorphous films and grain growth using combinati...
- Patent number 9,263,265
- Issue date Feb 16, 2016
- Applied Materials, Inc.
- Shashank Sharma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical device and method of making the same
- Patent number 8,154,127
- Issue date Apr 10, 2012
- Hewlett-Packard Development Company, L.P.
- Theodore I. Kamins
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Nanowire-based device having isolated electrode pair
- Patent number 7,928,568
- Issue date Apr 19, 2011
- Hewlett-Packard Development Company, L.P.
- Shashank Sharma
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Methods of making nano-scale structures having controlled size, nan...
- Patent number 7,906,778
- Issue date Mar 15, 2011
- Hewlett-Packard Development Company, L.P.
- Nobuhiko Kobayashi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Interconnection between different circuit types
- Patent number 7,659,631
- Issue date Feb 9, 2010
- Hewlett-Packard Development Company, L.P.
- Theodore I. Kamins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite nanostructure apparatus and method
- Patent number 7,638,431
- Issue date Dec 29, 2009
- Hewlett-Packard Development Company, L.P.
- Amir A. Yasseri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanowire-based device and method of making same
- Patent number 7,609,432
- Issue date Oct 27, 2009
- Hewlett-Packard Development Company, L.P.
- Theodore I. Kamins
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method of creating isolated electrodes in a nanowire-based device
- Patent number 7,544,591
- Issue date Jun 9, 2009
- Hewlett-Packard Development Company, L.P.
- Shashank Sharma
- B81 - MICRO-STRUCTURAL TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
HIGHER PRESSURE PURGE FOR IMPURITY REDUCTION IN RADICAL TREATMENT C...
- Publication number 20240290585
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Pradeep SAMPATH KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT LAYER FORMATION WITH MICROWAVE ANNEALING FOR NMOS DEVICES
- Publication number 20240203742
- Publication date Jun 20, 2024
- Applied Materials, Inc.
- Nicolas Louis BREIL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS, SYSTEMS, AND APPARATUS FOR CONDUCTING A RADICAL TREATMENT...
- Publication number 20240178004
- Publication date May 30, 2024
- Applied Materials, Inc.
- Pradeep SAMPATH KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR RADICAL AND THERMAL PROCESSING OF SUBSTRATES
- Publication number 20240087889
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Xinming ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT METHODS FOR SILICON NANOSHEET SURFACES
- Publication number 20240055265
- Publication date Feb 15, 2024
- Applied Materials, Inc.
- Pradeep SAMPATH KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT FORMATION PROCESS FOR CMOS DEVICES
- Publication number 20240014075
- Publication date Jan 11, 2024
- Applied Materials, Inc.
- Nicolas Louis BREIL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING WORK FUNCTION MODULATING LAYERS
- Publication number 20230178375
- Publication date Jun 8, 2023
- Applied Materials, Inc.
- Kunal Bhatnagar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGEN MANAGEMENT IN PLASMA DEPOSITED FILMS
- Publication number 20230146981
- Publication date May 11, 2023
- Applied Materials, Inc.
- Rui Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING WITH TUNABLE NITRIDATION
- Publication number 20230127138
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Wei LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS, SYSTEMS, AND APPARATUS FOR CONDUCTING A RADICAL TREATMENT...
- Publication number 20230128128
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Pradeep SAMPATH KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED OXIDATION WITH HYDROGEN RADICAL PRETREATMENT
- Publication number 20220298620
- Publication date Sep 22, 2022
- Applied Materias, Inc.
- Matthew Spuller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Treatment methods for titanium nitride films
- Publication number 20220108914
- Publication date Apr 7, 2022
- Applied Materials, Inc.
- Xinming ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGEN MANAGEMENT IN PLASMA DEPOSITED FILMS
- Publication number 20220020583
- Publication date Jan 20, 2022
- Applied Materials, Inc.
- Rui Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR METAL SILICIDE DEPOSITION
- Publication number 20220005705
- Publication date Jan 6, 2022
- Applied Materials, Inc.
- Xuebin LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR METAL SILICIDE DEPOSITION
- Publication number 20220005704
- Publication date Jan 6, 2022
- Applied Materials, Inc.
- Xuebin LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR RADICAL AND THERMAL PROCESSING OF SUBSTRATES
- Publication number 20210280428
- Publication date Sep 9, 2021
- Applied Materials, Inc.
- Xinming ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR RADICAL AND THERMAL PROCESSING OF SUBSTRATES
- Publication number 20210280418
- Publication date Sep 9, 2021
- Applied Materials, Inc.
- Xinming ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXYGEN RADICAL ASSISTED DIELECTRIC FILM DENSIFICATION
- Publication number 20210175075
- Publication date Jun 10, 2021
- Applied Materials, Inc.
- SHASHANK SHARMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF POST TREATING DIELECTRIC FILMS WITH MICROWAVE RADIATION
- Publication number 20200381248
- Publication date Dec 3, 2020
- Applied Materials, Inc.
- Yong SUN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ANNEALING PROCESSES FOR MEMORY DEVICES
- Publication number 20200357993
- Publication date Nov 12, 2020
- Applied Materials, Inc.
- Nicolas Louis Gabriel Breil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR METAL SILICIDE DEPOSITION
- Publication number 20200266068
- Publication date Aug 20, 2020
- Applied Materials, Inc.
- Xuebin LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEM AND METHOD OF FORMING A CONTACT
- Publication number 20200203481
- Publication date Jun 25, 2020
- Applied Materials, Inc.
- Gaurav THAREJA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGENATION AND NITRIDIZATION PROCESSES FOR MODIFYING EFFECTIVE O...
- Publication number 20190172716
- Publication date Jun 6, 2019
- Applied Materials, Inc.
- Houda GRAOUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGENATION AND NITRIDIZATION PROCESSES FOR REDUCING OXYGEN CONTE...
- Publication number 20190157143
- Publication date May 23, 2019
- Applied Materials, Inc.
- Johanes S. SWENBERG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGENATION AND NITRIDIZATION PROCESSES FOR MODIFYING EFFECTIVE O...
- Publication number 20190115219
- Publication date Apr 18, 2019
- Applied Materials, Inc.
- Johanes S. SWENBERG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGENATION AND NITRIDIZATION PROCESSES FOR MODIFYING EFFECTIVE O...
- Publication number 20170365480
- Publication date Dec 21, 2017
- Applied Materials, Inc.
- Johanes S. SWENBERG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGENATION AND NITRIDIZATION PROCESSES FOR REDUCING OXYGEN CONTE...
- Publication number 20170365512
- Publication date Dec 21, 2017
- Applied Materials, Inc.
- Johanes S. SWENBERG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING METHOD AND SEMICONDUCTOR DEVICE
- Publication number 20170148726
- Publication date May 25, 2017
- Applied Materials, Inc.
- Stephen MOFFATT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROTATING SUBSTRATE LASER ANNEAL
- Publication number 20170032865
- Publication date Feb 2, 2017
- Applied Materials, Inc.
- Joseph M. RANISH
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MILLISECOND ANNEALING IN AMMONIA AMBIENT FOR PRECISE PLACEMENT OF N...
- Publication number 20150311067
- Publication date Oct 29, 2015
- Applied Materials, Inc.
- Shashank SHARMA
- H01 - BASIC ELECTRIC ELEMENTS

Shashank SHARMA

Person

Patents Grantslast 30 patents

Methods, systems, and apparatus for conducting a radical treatment...

System and method for radical and thermal processing of substrates

Methods and apparatus for metal silicide deposition

System and method for radical and thermal processing of substrates

Hydrogen management in plasma deposited films

Methods of post treating dielectric films with microwave radiation

Annealing processes for memory devices

Methods and apparatus for metal silicide deposition

Processing system and method of forming a contact

Hydrogenation and nitridization processes for reducing oxygen conte...

Rotating substrate laser anneal

Hydrogenation and nitridization processes for reducing oxygen conte...

Hydrogenation and nitridization processes for modifying effective o...

Crystallization of amorphous films and grain growth using combinati...

Optical device and method of making the same

Nanowire-based device having isolated electrode pair

Methods of making nano-scale structures having controlled size, nan...

Interconnection between different circuit types

Composite nanostructure apparatus and method

Nanowire-based device and method of making same

Method of creating isolated electrodes in a nanowire-based device

Patents Applicationslast 30 patents

HIGHER PRESSURE PURGE FOR IMPURITY REDUCTION IN RADICAL TREATMENT C...

CONTACT LAYER FORMATION WITH MICROWAVE ANNEALING FOR NMOS DEVICES

METHODS, SYSTEMS, AND APPARATUS FOR CONDUCTING A RADICAL TREATMENT...

SYSTEM AND METHOD FOR RADICAL AND THERMAL PROCESSING OF SUBSTRATES

TREATMENT METHODS FOR SILICON NANOSHEET SURFACES

CONTACT FORMATION PROCESS FOR CMOS DEVICES

METHODS FOR FORMING WORK FUNCTION MODULATING LAYERS

HYDROGEN MANAGEMENT IN PLASMA DEPOSITED FILMS

PLASMA PROCESSING WITH TUNABLE NITRIDATION

METHODS, SYSTEMS, AND APPARATUS FOR CONDUCTING A RADICAL TREATMENT...

ENHANCED OXIDATION WITH HYDROGEN RADICAL PRETREATMENT

Treatment methods for titanium nitride films

HYDROGEN MANAGEMENT IN PLASMA DEPOSITED FILMS

METHODS AND APPARATUS FOR METAL SILICIDE DEPOSITION

METHODS AND APPARATUS FOR METAL SILICIDE DEPOSITION

SYSTEM AND METHOD FOR RADICAL AND THERMAL PROCESSING OF SUBSTRATES

SYSTEM AND METHOD FOR RADICAL AND THERMAL PROCESSING OF SUBSTRATES

OXYGEN RADICAL ASSISTED DIELECTRIC FILM DENSIFICATION

METHODS OF POST TREATING DIELECTRIC FILMS WITH MICROWAVE RADIATION

ANNEALING PROCESSES FOR MEMORY DEVICES

METHODS AND APPARATUS FOR METAL SILICIDE DEPOSITION

PROCESSING SYSTEM AND METHOD OF FORMING A CONTACT

HYDROGENATION AND NITRIDIZATION PROCESSES FOR MODIFYING EFFECTIVE O...

HYDROGENATION AND NITRIDIZATION PROCESSES FOR REDUCING OXYGEN CONTE...

HYDROGENATION AND NITRIDIZATION PROCESSES FOR MODIFYING EFFECTIVE O...

HYDROGENATION AND NITRIDIZATION PROCESSES FOR MODIFYING EFFECTIVE O...

HYDROGENATION AND NITRIDIZATION PROCESSES FOR REDUCING OXYGEN CONTE...

SEMICONDUCTOR PROCESSING METHOD AND SEMICONDUCTOR DEVICE

ROTATING SUBSTRATE LASER ANNEAL

MILLISECOND ANNEALING IN AMMONIA AMBIENT FOR PRECISE PLACEMENT OF N...