Shawming Ma

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Enhanced ignition in inductively coupled plasmas for workpiece proc...
- Patent number 12,347,677
- Issue date Jul 1, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etch process using plasma in conjunction with a rapid...
- Patent number 12,159,789
- Issue date Dec 3, 2024
- BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arc lamp with forming gas for thermal processing systems
- Patent number 12,119,216
- Issue date Oct 15, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable mode plasma chamber utilizing tunable plasma potential
- Patent number 12,002,652
- Issue date Jun 4, 2024
- Mattson Technology, Inc.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced ignition in inductively coupled plasmas for workpiece proc...
- Patent number 11,848,204
- Issue date Dec 19, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for the treatment of workpieces
- Patent number 11,791,181
- Issue date Oct 17, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for processing a workpiece using a multi-cycle thermal treat...
- Patent number 11,764,072
- Issue date Sep 19, 2023
- BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
- Michael X. Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Arc lamp with forming gas for thermal processing systems
- Patent number 11,721,539
- Issue date Aug 8, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus ring adjustment assembly of a system for processing workpiece...
- Patent number 11,508,560
- Issue date Nov 22, 2022
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Martin L. Zucker
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Plasma processing apparatus having a focus ring adjustment assembly
- Patent number 11,348,767
- Issue date May 31, 2022
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Martin L. Zucker
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Enhanced ignition in inductively coupled plasmas for workpiece proc...
- Patent number 11,348,784
- Issue date May 31, 2022
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing of semiconductors using vaporized solvents
- Patent number 11,289,323
- Issue date Mar 29, 2022
- Beijing E-Town Semiconductor Co, , Ltd.
- Shuang Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carbon containing hardmask removal process using sulfur containing...
- Patent number 11,264,249
- Issue date Mar 1, 2022
- Mattson Technology, Inc.
- Fen Dai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma strip tool with uniformity control
- Patent number 11,201,036
- Issue date Dec 14, 2021
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable mode plasma chamber utilizing tunable plasma potential
- Patent number 11,189,464
- Issue date Nov 30, 2021
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etch process using plasma in conjunction with a rapid...
- Patent number 11,062,912
- Issue date Jul 13, 2021
- Mattson Technology, Inc.
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for tuning plasma potential using variable mode plasma chamber
- Patent number 11,049,692
- Issue date Jun 29, 2021
- Mattson Technology, Inc.
- Stephen E. Savas
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Air leak detection in plasma processing apparatus with separation grid
- Patent number 11,039,527
- Issue date Jun 15, 2021
- Mattson Technology, Inc.
- Shuang Meng
- G01 - MEASURING TESTING
Information Patent Grant
Method for processing a workpiece
- Patent number 10,950,428
- Issue date Mar 16, 2021
- Mattson Technology, Inc.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Strip process for high aspect ratio structure
- Patent number 10,901,321
- Issue date Jan 26, 2021
- Mattson Technology, Inc.
- Vijay M. Vaniapura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus with post plasma gas injection
- Patent number 10,790,119
- Issue date Sep 29, 2020
- Mattson Technology, Inc.
- Shawming Ma
- B08 - CLEANING
Information Patent Grant
Strip process for high aspect ratio structure
- Patent number 10,599,039
- Issue date Mar 24, 2020
- Mattson Technology, Inc.
- Vijay M. Vaniapura
- B08 - CLEANING
Information Patent Grant
Atomic layer etch process using plasma in conjunction with a rapid...
- Patent number 10,580,661
- Issue date Mar 3, 2020
- Mattson Technology, Inc.
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for processing a workpiece using a multi-cycle thermal treat...
- Patent number 10,573,532
- Issue date Feb 25, 2020
- Mattson Technology, Inc.
- Michael X. Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Implanted photoresist stripping process
- Patent number 10,078,266
- Issue date Sep 18, 2018
- Mattson Technology, Inc.
- Wei-Hua Liou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching carbonaceous layers with sulfur-based etchants
- Patent number 8,133,819
- Issue date Mar 13, 2012
- Applied Materials, Inc.
- Judy Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to avoid unstable plasma states during a process transition
- Patent number 8,048,806
- Issue date Nov 1, 2011
- Applied Materials, Inc.
- Michael C. Kutney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch process with controlled critical dimension shrink
- Patent number 7,838,432
- Issue date Nov 23, 2010
- Applied Materials, Inc.
- Judy Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric plasma etch process with in-situ amorphous carbon mask w...
- Patent number 7,510,976
- Issue date Mar 31, 2009
- Applied Materials, Inc.
- Shing-Li Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process to open carbon based hardmask
- Patent number 7,432,210
- Issue date Oct 7, 2008
- Applied Materials, Inc.
- Judy Wang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid...
- Publication number 20250062133
- Publication date Feb 20, 2025
- Mattson Technology, Inc.
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Variable Mode Plasma Chamber Utilizing Tunable Plasma Potential
- Publication number 20240297019
- Publication date Sep 5, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Enhanced Ignition in Inductively Coupled Plasmas For Workpiece Proc...
- Publication number 20240071754
- Publication date Feb 29, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Arc Lamp With Forming Gas For Thermal Processing Systems
- Publication number 20230352294
- Publication date Nov 2, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Enhanced Ignition in Inductively Coupled Plasmas For Workpiece Proc...
- Publication number 20220310359
- Publication date Sep 29, 2022
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing of Semiconductors Using Vaporized Solvents
- Publication number 20220223405
- Publication date Jul 14, 2022
- Beijing E-Town Semiconductor Technology, Co., LTD
- Shuang Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Arc Lamp With Forming Gas For Thermal Processing Systems
- Publication number 20220165561
- Publication date May 26, 2022
- Mattson Technology, Inc.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VARIABLE MODE PLASMA CHAMBER UTILIZING TUNABLE PLASMA POTENTIAL
- Publication number 20220084792
- Publication date Mar 17, 2022
- Mattson Technology, Inc.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Strip Tool with Multiple Gas Injection
- Publication number 20210398775
- Publication date Dec 23, 2021
- Mattson Technology, Inc.
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods And Apparatus For Pulsed Inductively Coupled Plasma For Sur...
- Publication number 20210343506
- Publication date Nov 4, 2021
- Mattson Technology, Inc.
- Ting Xie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid...
- Publication number 20210343541
- Publication date Nov 4, 2021
- Mattson Technology, Inc.
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Air Leak Detection In Plasma Processing Apparatus With Separation Grid
- Publication number 20210307151
- Publication date Sep 30, 2021
- Mattson Technology, Inc.
- Shuang Meng
- G01 - MEASURING TESTING
Information Patent Application
Plasma Processing Apparatus and Methods
- Publication number 20210257196
- Publication date Aug 19, 2021
- Mattson Technology, Inc.
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR THE TREATMENT OF WORKPIECES
- Publication number 20210082724
- Publication date Mar 18, 2021
- Mattson Technology, Inc.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Processing a Workpiece
- Publication number 20210066074
- Publication date Mar 4, 2021
- Mattson Technology, Inc.
- Ting Xie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Enhanced Ignition in Inductively Coupled Plasmas For Workpiece Proc...
- Publication number 20210050213
- Publication date Feb 18, 2021
- Mattson Technology, Inc.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VARIABLE MODE PLASMA CHAMBER UTILIZING TUNABLE PLASMA POTENTIAL
- Publication number 20210020411
- Publication date Jan 21, 2021
- Mattson Technology, Inc.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR TUNING PLASMA POTENTIAL USING VARIABLE MODE PLASMA CHAMBER
- Publication number 20210020404
- Publication date Jan 21, 2021
- Mattson Technology, Inc.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus With Post Plasma Gas Injection
- Publication number 20210005431
- Publication date Jan 7, 2021
- Mattson Technology, Inc.
- Shawming Ma
- B08 - CLEANING
Information Patent Application
PLASMA PROCESSING APPARATUS HAVING A FOCUS RING ADJUSTMENT ASSEMBLY
- Publication number 20200365377
- Publication date Nov 19, 2020
- Mattson Technology, Inc.
- Martin L. Zucker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS RING ADJUSTMENT ASSEMBLY OF A SYSTEM FOR PROCESSING WORKPIECE...
- Publication number 20200365405
- Publication date Nov 19, 2020
- Mattson Technology, Inc.
- Martin L. Zucker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas Supply With Angled Injectors In Plasma Processing Apparatus
- Publication number 20200258718
- Publication date Aug 13, 2020
- Mattson Technology, Inc.
- Tinghao F. Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Air Leak Detection In Plasma Processing Apparatus With Separation Grid
- Publication number 20200245444
- Publication date Jul 30, 2020
- Mattson Technology, Inc.
- Shuang Meng
- G01 - MEASURING TESTING
Information Patent Application
Method for Processing a Workpiece Using a Multi-Cycle Thermal Treat...
- Publication number 20200234983
- Publication date Jul 23, 2020
- Mattson Technology, Inc.
- Michael X. Yang
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Application
Electrostatic Shield for Inductive Plasma Sources
- Publication number 20200227239
- Publication date Jul 16, 2020
- Mattson Technology, Inc.
- Stephen Edward Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Strip Process for High Aspect Ratio Structure
- Publication number 20200218158
- Publication date Jul 9, 2020
- Mattson Technology, Inc.
- Vijay M. Vaniapura
- B08 - CLEANING
Information Patent Application
Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid...
- Publication number 20200203175
- Publication date Jun 25, 2020
- Mattson Technology, Inc.
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Carbon Containing Hardmask Removal Process Using Sulfur Containing...
- Publication number 20200194277
- Publication date Jun 18, 2020
- Mattson Technology, Inc.
- Fen Dai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Water Vapor Based Fluorine Containing Plasma For Removal Of Hardmask
- Publication number 20200135554
- Publication date Apr 30, 2020
- Mattson Technology, Inc.
- Li Hou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Processing a Workpiece Using a Multi-Cycle Thermal Treat...
- Publication number 20190385862
- Publication date Dec 19, 2019
- Mattson Technology, Inc.
- Michael X. Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Shawming Ma

Person

Patents Grantslast 30 patents

Enhanced ignition in inductively coupled plasmas for workpiece proc...

Atomic layer etch process using plasma in conjunction with a rapid...

Arc lamp with forming gas for thermal processing systems

Variable mode plasma chamber utilizing tunable plasma potential

Enhanced ignition in inductively coupled plasmas for workpiece proc...

Methods for the treatment of workpieces

Method for processing a workpiece using a multi-cycle thermal treat...

Arc lamp with forming gas for thermal processing systems

Focus ring adjustment assembly of a system for processing workpiece...

Plasma processing apparatus having a focus ring adjustment assembly

Enhanced ignition in inductively coupled plasmas for workpiece proc...

Processing of semiconductors using vaporized solvents

Carbon containing hardmask removal process using sulfur containing...

Plasma strip tool with uniformity control

Variable mode plasma chamber utilizing tunable plasma potential

Atomic layer etch process using plasma in conjunction with a rapid...

Methods for tuning plasma potential using variable mode plasma chamber

Air leak detection in plasma processing apparatus with separation grid

Method for processing a workpiece

Strip process for high aspect ratio structure

Plasma processing apparatus with post plasma gas injection

Strip process for high aspect ratio structure

Atomic layer etch process using plasma in conjunction with a rapid...

Method for processing a workpiece using a multi-cycle thermal treat...

Implanted photoresist stripping process

Plasma etching carbonaceous layers with sulfur-based etchants

Methods to avoid unstable plasma states during a process transition

Etch process with controlled critical dimension shrink

Dielectric plasma etch process with in-situ amorphous carbon mask w...

Process to open carbon based hardmask

Patents Applicationslast 30 patents

Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid...

Variable Mode Plasma Chamber Utilizing Tunable Plasma Potential

Enhanced Ignition in Inductively Coupled Plasmas For Workpiece Proc...

Arc Lamp With Forming Gas For Thermal Processing Systems

Enhanced Ignition in Inductively Coupled Plasmas For Workpiece Proc...

Processing of Semiconductors Using Vaporized Solvents

Arc Lamp With Forming Gas For Thermal Processing Systems

VARIABLE MODE PLASMA CHAMBER UTILIZING TUNABLE PLASMA POTENTIAL

Plasma Strip Tool with Multiple Gas Injection

Methods And Apparatus For Pulsed Inductively Coupled Plasma For Sur...

Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid...

Air Leak Detection In Plasma Processing Apparatus With Separation Grid

Plasma Processing Apparatus and Methods

METHODS FOR THE TREATMENT OF WORKPIECES

Method for Processing a Workpiece

Enhanced Ignition in Inductively Coupled Plasmas For Workpiece Proc...

VARIABLE MODE PLASMA CHAMBER UTILIZING TUNABLE PLASMA POTENTIAL

METHODS FOR TUNING PLASMA POTENTIAL USING VARIABLE MODE PLASMA CHAMBER

Plasma Processing Apparatus With Post Plasma Gas Injection

PLASMA PROCESSING APPARATUS HAVING A FOCUS RING ADJUSTMENT ASSEMBLY

FOCUS RING ADJUSTMENT ASSEMBLY OF A SYSTEM FOR PROCESSING WORKPIECE...

Gas Supply With Angled Injectors In Plasma Processing Apparatus

Air Leak Detection In Plasma Processing Apparatus With Separation Grid

Method for Processing a Workpiece Using a Multi-Cycle Thermal Treat...

Electrostatic Shield for Inductive Plasma Sources

Strip Process for High Aspect Ratio Structure

Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid...

Carbon Containing Hardmask Removal Process Using Sulfur Containing...

Water Vapor Based Fluorine Containing Plasma For Removal Of Hardmask

Method for Processing a Workpiece Using a Multi-Cycle Thermal Treat...