SHAY YOGEV

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KIBBUTZ KFAR MENACHEM, IL

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Patents Grantslast 30 patents

Information Patent Grant
Layer detection for high aspect ratio etch control
- Patent number 11,929,291
- Issue date Mar 12, 2024
- Nova Ltd.
- Gil Loewenthal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Machine and deep learning methods for spectra-based metrology and p...
- Patent number 11,815,819
- Issue date Nov 14, 2023
- Nova Ltd.
- Barak Bringoltz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology and process control for semiconductor manufacturing
- Patent number 11,763,181
- Issue date Sep 19, 2023
- Nova Ltd.
- Eitan Rothstein
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process control of semiconductor fabrication based on spectra quali...
- Patent number 11,300,948
- Issue date Apr 12, 2022
- Nova Ltd.
- Taher Kagalwala
- G05 - CONTROLLING REGULATING
Information Patent Grant
Layer detection for high aspect ratio etch control
- Patent number 11,107,738
- Issue date Aug 31, 2021
- Nova Ltd.
- Gil Loewenthal
- G01 - MEASURING TESTING
Information Patent Grant
Metrology and process control for semiconductor manufacturing
- Patent number 11,093,840
- Issue date Aug 17, 2021
- Nova Measuring Instruments Ltd.
- Eitan Rothstein
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
MACHINE AND DEEP LEARNING METHODS FOR SPECTRA-BASED METROLOGY AND P...
- Publication number 20240310737
- Publication date Sep 19, 2024
- NOVA LTD
- Barak BRINGOLTZ
- G05 - CONTROLLING REGULATING
Information Patent Application
MACHINE LEARNING BASED EXAMINATION FOR PROCESS MONITORING
- Publication number 20240281956
- Publication date Aug 22, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Noam TAL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MACHINE LEARNING BASED YIELD PREDICTION
- Publication number 20240281958
- Publication date Aug 22, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Boris LEVANT
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING
- Publication number 20240078450
- Publication date Mar 7, 2024
- NOVA LTD
- EITAN ROTHSTEIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MACHINE AND DEEP LEARNING METHODS FOR SPECTRA-BASED METROLOGY AND P...
- Publication number 20230124431
- Publication date Apr 20, 2023
- NOVA LTD
- Barak BRINGOLTZ
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LAYER DETECTION FOR HIGH ASPECT RATIO ETCH CONTROL
- Publication number 20220044975
- Publication date Feb 10, 2022
- NOVA LTD
- Gil Loewenthal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING
- Publication number 20220036218
- Publication date Feb 3, 2022
- NOVA LTD
- EITAN ROTHSTEIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING
- Publication number 20210150387
- Publication date May 20, 2021
- NOVA MEASURING INSTRUMENTS LTD.
- EITAN ROTHSTEIN
- G01 - MEASURING TESTING
Information Patent Application
PROCESS CONTROL OF SEMICONDUCTOR FABRICATION BASED ON SPECTRA QUALI...
- Publication number 20200409345
- Publication date Dec 31, 2020
- GLOBALFOUNDRIES INC.
- TAHER KAGALWALA
- G05 - CONTROLLING REGULATING
Information Patent Application
PROCESS CONTROL OF SEMICONDUCTOR FABRICATION BASED ON LINKAGE BETWE...
- Publication number 20200279783
- Publication date Sep 3, 2020
- GLOBALFOUNDRIES INC.
- PADRAIG TIMONEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LAYER DETECTION FOR HIGH ASPECT RATIO ETCH CONTROL
- Publication number 20200194320
- Publication date Jun 18, 2020
- NOVA MEASURING INSTRUMENTS LTD.
- GIL LOEWENTHAL
- G01 - MEASURING TESTING

Person

Patents Grantslast 30 patents

Layer detection for high aspect ratio etch control

Machine and deep learning methods for spectra-based metrology and p...

Metrology and process control for semiconductor manufacturing

Process control of semiconductor fabrication based on spectra quali...

Layer detection for high aspect ratio etch control

Metrology and process control for semiconductor manufacturing

Patents Applicationslast 30 patents

MACHINE AND DEEP LEARNING METHODS FOR SPECTRA-BASED METROLOGY AND P...

MACHINE LEARNING BASED EXAMINATION FOR PROCESS MONITORING

MACHINE LEARNING BASED YIELD PREDICTION

METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING

MACHINE AND DEEP LEARNING METHODS FOR SPECTRA-BASED METROLOGY AND P...

LAYER DETECTION FOR HIGH ASPECT RATIO ETCH CONTROL

METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING

METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING

PROCESS CONTROL OF SEMICONDUCTOR FABRICATION BASED ON SPECTRA QUALI...

PROCESS CONTROL OF SEMICONDUCTOR FABRICATION BASED ON LINKAGE BETWE...

LAYER DETECTION FOR HIGH ASPECT RATIO ETCH CONTROL