Membership
Tour
Register
Log in
Sheeba J. Panayil
Follow
Person
Santa Clara, CA, US
People
Overview
Industries
Organizations
People
Information
Impact
Patents Grants
last 30 patents
Information
Patent Grant
Plasma reactor having an array of plural individually controlled ga...
Patent number
10,170,280
Issue date
Jan 1, 2019
Applied Materials, Inc.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Mask etch plasma reactor having an array of optical sensors viewing...
Patent number
9,218,944
Issue date
Dec 22, 2015
Applied Materials, Inc.
Madhavi R. Chandrachood
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method and apparatus for photomask plasma etching
Patent number
8,568,553
Issue date
Oct 29, 2013
Applied Materials, Inc.
Ajay Kumar
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma mask etch method of controlling a reactor tunable element in...
Patent number
8,017,029
Issue date
Sep 13, 2011
Applied Materials, Inc.
Madhavi R. Chandrachood
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Mask etch plasma reactor with variable process gas distribution
Patent number
7,976,671
Issue date
Jul 12, 2011
Applied Materials, Inc.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for photomask plasma etching
Patent number
7,943,005
Issue date
May 17, 2011
Applied Materials, Inc.
Ajay Kumar
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for photomask plasma etching
Patent number
7,909,961
Issue date
Mar 22, 2011
Applied Materials, Inc.
Ajay Kumar
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method of processing a workpiece in a plasma reactor with dynamic a...
Patent number
7,520,999
Issue date
Apr 21, 2009
Applied Materials, Inc.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of processing a workpiece in a plasma reactor employing a dy...
Patent number
7,504,041
Issue date
Mar 17, 2009
Applied Materials, Inc.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma reactor with a dynamically adjustable plasma source power ap...
Patent number
7,431,797
Issue date
Oct 7, 2008
Applied Materials, Inc.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma reactor with apparatus for dynamically adjusting the plasma...
Patent number
7,419,551
Issue date
Sep 2, 2008
Applied Materials, Inc.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Single wafer thermal CVD processes for hemispherical grained silico...
Patent number
7,341,907
Issue date
Mar 11, 2008
Applied Materials, Inc.
Ming Li
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method of forming a controlled and uniform lightly phosphorous dope...
Patent number
7,335,266
Issue date
Feb 26, 2008
Applied Materials, Inc.
Li Fu
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Deposition of nano-crystal silicon using a single wafer chamber
Patent number
7,265,036
Issue date
Sep 4, 2007
Applied Materials, Inc.
Sheeba J. Panayil
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method of forming a controlled and uniform lightly phosphorous dope...
Patent number
6,982,214
Issue date
Jan 3, 2006
Applied Materials, Inc.
Li Fu
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Patents Applications
last 30 patents
Information
Patent Application
PLASMA REACTOR HAVING AN ARRAY OF PLURAL INDIVIDUALLY CONTROLLED GA...
Publication number
20160042917
Publication date
Feb 11, 2016
Applied Materials, Inc.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
Publication number
20110162797
Publication date
Jul 7, 2011
Ajay Kumar
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma mask etch method of controlling a reactor tunable element in...
Publication number
20080099434
Publication date
May 1, 2008
Madhavi R. Chandrachood
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Mask etch plasma reactor with variable process gas distribution
Publication number
20080102202
Publication date
May 1, 2008
APPLIED MATERIALS, INC.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Mask etch plasma reactor having an array of optical sensors viewing...
Publication number
20080102001
Publication date
May 1, 2008
Madhavi R. Chandrachood
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
Publication number
20080099431
Publication date
May 1, 2008
APPLIED MATERIALS, INC.
Ajay Kumar
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
Publication number
20080099426
Publication date
May 1, 2008
Ajay Kumar
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Deposition of nano-crystal silicon using a single wafer chamber
Publication number
20070287271
Publication date
Dec 13, 2007
Sheeba J. Panayil
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Plasma reactor with a dynamically adjustable plasma source power ap...
Publication number
20070256787
Publication date
Nov 8, 2007
APPLIED MATERIALS, INC.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma reactor with apparatus for dynamically adjusting the plasma...
Publication number
20070256784
Publication date
Nov 8, 2007
APPLIED MATERIALS, INC.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of processing a workpiece in a plasma reactor with dynamic a...
Publication number
20070257008
Publication date
Nov 8, 2007
APPLIED MATERIALS, INC.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of processing a workpiece in a plasma reactor employing a dy...
Publication number
20070257009
Publication date
Nov 8, 2007
APPLIED MATERIALS, INC.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Single wafer thermal CVD processes for hemispherical grained silico...
Publication number
20060223333
Publication date
Oct 5, 2006
Ming Li
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Method of forming a controlled and uniform lightly phosphorous dope...
Publication number
20060024926
Publication date
Feb 2, 2006
Li Fu
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Deposition of nano-crystal silicon using a single wafer chamber
Publication number
20060019469
Publication date
Jan 26, 2006
APPLIED MATERIALS, INC.
Sheeba J. Panayil
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Method of forming a controlled and uniform lightly phosphorous dope...
Publication number
20040063301
Publication date
Apr 1, 2004
APPLIED MATERIALS, INC.
Li Fu
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...