Sheik Ansar USMAN IBRAHIM

Person

Heverlee, BE

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical mechanical polishing composition
- Patent number 11,993,729
- Issue date May 28, 2024
- BASF SE
- Christian Daeschlein
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Use of a chemical mechanical polishing (CMP) composition for polish...
- Patent number 11,286,402
- Issue date Mar 29, 2022
- BASF SE
- Robert Reichardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of a chemical mechanical polishing (CMP) composition for polish...
- Patent number 11,264,250
- Issue date Mar 1, 2022
- BASF SE
- Robert Reichardt
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Use of a chemical mechanical polishing (CMP) composition for polish...
- Patent number 10,899,945
- Issue date Jan 26, 2021
- BASF SE
- Robert Reichardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of a chemical mechanical polishing (CMP) composition for polish...
- Patent number 10,738,219
- Issue date Aug 11, 2020
- BASF SE
- Robert Reichardt
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical mechanical polishing (CMP) composition
- Patent number 10,570,316
- Issue date Feb 25, 2020
- BASF SE
- Robert Reichardt
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Use of a chemical mechanical polishing (CMP) composition for polish...
- Patent number 10,385,236
- Issue date Aug 20, 2019
- BASF SE
- Robert Reichardt
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing (CMP) composition for high effective...
- Patent number 10,227,506
- Issue date Mar 12, 2019
- BASF SE
- Max Siebert
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20210102093
- Publication date Apr 8, 2021
- BASF SE
- Robert REICHARDT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING COMPOSITION
- Publication number 20200299547
- Publication date Sep 24, 2020
- BASF SE
- Christian DAESCHLEIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20200294813
- Publication date Sep 17, 2020
- BASF SE
- Robert REICHARDT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20180230333
- Publication date Aug 16, 2018
- BASF SE
- Robert REICHARDT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20180016468
- Publication date Jan 18, 2018
- BASF SE
- Robert REICHARDT
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR HIGH EFFECTIVE...
- Publication number 20170369743
- Publication date Dec 28, 2017
- BASF SE
- Max SIEBERT
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20170369741
- Publication date Dec 28, 2017
- BASF SE
- Robert REICHARDT
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20170362464
- Publication date Dec 21, 2017
- BASF SE
- Robert REICHARDT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION
- Publication number 20170158913
- Publication date Jun 8, 2017
- BASF SE
- Robert REICHARDT
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP COMPOSITION COMPRISING ABRASIVE PARTICLES CONTAINING CERIA
- Publication number 20160160083
- Publication date Jun 9, 2016
- BASF SE
- Michael LAUTER
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Sheik Ansar USMAN IBRAHIM

Person

Patents Grantslast 30 patents

Chemical mechanical polishing composition

Use of a chemical mechanical polishing (CMP) composition for polish...

Use of a chemical mechanical polishing (CMP) composition for polish...

Use of a chemical mechanical polishing (CMP) composition for polish...

Use of a chemical mechanical polishing (CMP) composition for polish...

Chemical mechanical polishing (CMP) composition

Use of a chemical mechanical polishing (CMP) composition for polish...

Chemical mechanical polishing (CMP) composition for high effective...

Patents Applicationslast 30 patents

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

CHEMICAL MECHANICAL POLISHING COMPOSITION

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR HIGH EFFECTIVE...

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION

CMP COMPOSITION COMPRISING ABRASIVE PARTICLES CONTAINING CERIA