Sheng-feng Chung

Person

Hsinchu, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Method for the fabrication of an electroless-metal-plated sulfur na...
- Patent number 11,996,551
- Issue date May 28, 2024
- National Cheng Kung University
- Sheng Heng Chung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal-oxide-semiconductor transistor and method of fabricating the...
- Patent number 11,195,905
- Issue date Dec 7, 2021
- United Microelectronics Corp.
- Hsiang-Hua Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polysilicon design for replacement gate technology
- Patent number 11,018,241
- Issue date May 25, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Harry-Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate oxide forming process
- Patent number 10,985,071
- Issue date Apr 20, 2021
- United Microelectronics Corp.
- Yuan-Cheng Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polysilicon design for replacement gate technology
- Patent number 10,658,492
- Issue date May 19, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry-Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polysilicon design for replacement gate technology
- Patent number 10,403,736
- Issue date Sep 3, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry-Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polysilicon design for replacement gate technology
- Patent number 10,084,061
- Issue date Sep 25, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry-Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mesh electrode, sensing device, and electrode layer
- Patent number 10,001,889
- Issue date Jun 19, 2018
- Industrial Technology Research Institute
- Heng-Tien Lin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Polysilicon design for replacement gate technology
- Patent number 9,929,251
- Issue date Mar 27, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry-Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conductive line structure and sensing device using the same
- Patent number 9,921,699
- Issue date Mar 20, 2018
- Industrial Technology Research Institute
- Sheng-Feng Chung
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Sensing structure
- Patent number 9,811,222
- Issue date Nov 7, 2017
- Industrial Technology Research Institute
- Bao-Shun Yau
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Device for high-K and metal gate stacks
- Patent number 9,711,415
- Issue date Jul 18, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jyun-Ming Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polysilicon design for replacement gate technology
- Patent number 9,679,988
- Issue date Jun 13, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry-Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to stop contact metal from extruding into replacement gates
- Patent number 9,620,620
- Issue date Apr 11, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Lee-Wee Teo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gravure printing system and method of using the same
- Patent number 9,579,878
- Issue date Feb 28, 2017
- Industrial Technology Research Institute
- Sheng-Feng Chung
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Touch panel structure and fabrication method for the same
- Patent number 9,448,672
- Issue date Sep 20, 2016
- Industrial Technology Research Institute
- Sheng-Feng Chung
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Illumination device
- Patent number 9,395,072
- Issue date Jul 19, 2016
- Industrial Technology Research Institute
- Su-Tsai Lu
- F21 - LIGHTING
Information Patent Grant
Method for mechanical stress enhancement in semiconductor devices
- Patent number 9,349,655
- Issue date May 24, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Carlos H. Diaz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a metal gate semiconductor device
- Patent number 9,209,089
- Issue date Dec 8, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sheng-Chen Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMOS devices with metal gates and methods for forming the same
- Patent number 9,142,414
- Issue date Sep 22, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sheng-Chen Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of hybrid high-k/metal-gate stack fabrication
- Patent number 9,093,559
- Issue date Jul 28, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jin-Aun Ng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polysilicon design for replacement gate technology
- Patent number 8,890,260
- Issue date Nov 18, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact for high-k metal gate device
- Patent number 8,853,753
- Issue date Oct 7, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry-Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removing hard masks on gates in semiconductor manufactur...
- Patent number 8,796,084
- Issue date Aug 5, 2014
- Taiwan Semiconductor Manufacturing Company Ltd.
- Hung Chih Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of fabricating same
- Patent number 8,716,103
- Issue date May 6, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung Long Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact for high-K metal gate device
- Patent number 8,546,227
- Issue date Oct 1, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structures and methods to stop contact metal from extruding into re...
- Patent number 8,525,270
- Issue date Sep 3, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Lee-Wee Teo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device scheme of HKMG gate-last process
- Patent number 8,487,382
- Issue date Jul 16, 2013
- Taiwan Semiconductor Maufacturing Company, Ltd.
- Sheng-Chen Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of fabricating same
- Patent number 8,461,629
- Issue date Jun 11, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung Long Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device fabrication method including hard mask and sac...
- Patent number 8,372,706
- Issue date Feb 12, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shun-Jang Liao
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HOT-PRESSED CARBON/SULFUR COMPOSITE ENERGY-STORAGE CATHODE, A METHO...
- Publication number 20240145664
- Publication date May 2, 2024
- National Cheng Kung University
- Sheng-Heng CHUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CORE-SHELL CATHODE AND A LITHIUM-SULFUR BATTERY USING THE SAME
- Publication number 20240145706
- Publication date May 2, 2024
- National Cheng Kung University
- Sheng-Heng CHUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-DIE PACKAGE
- Publication number 20230116312
- Publication date Apr 13, 2023
- Realtek Semiconductor Corp.
- Sheng-Feng Chung
- G11 - INFORMATION STORAGE
Information Patent Application
Method for the fabrication of an electroless-metal-plated sulfur na...
- Publication number 20220293914
- Publication date Sep 15, 2022
- NATIONAL CHENG KUNG UNIVERSITY
- SHENG HENG CHUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Polysilicon Design for Replacement Gate Technology
- Publication number 20210288163
- Publication date Sep 16, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry-Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE OXIDE FORMING PROCESS
- Publication number 20210134679
- Publication date May 6, 2021
- UNITED MICROELECTRONICS CORP.
- Yuan-Cheng Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polysilicon Design for Replacement Gate Technology
- Publication number 20200279935
- Publication date Sep 3, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry-Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL-OXIDE-SEMICONDUCTOR TRANSISTOR AND METHOD OF FABRICATING THE...
- Publication number 20200266267
- Publication date Aug 20, 2020
- United Microelectronics Corp.
- HSIANG-HUA HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polysilicon Design for Replacement Gate Technology
- Publication number 20190386116
- Publication date Dec 19, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry-Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE INVOLVING FORMING EPITA...
- Publication number 20190103492
- Publication date Apr 4, 2019
- United Microelectronics Corp.
- Cheng-Pu Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polysilicon Design for Replacement Gate Technology
- Publication number 20190035914
- Publication date Jan 31, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry-Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polysilicon Design for Replacement Gate Technology
- Publication number 20180212036
- Publication date Jul 26, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry-Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polysilicon Design for Replacement Gate Technology
- Publication number 20170278948
- Publication date Sep 28, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry-Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONDUCTIVE LINE STRUCTURE AND SENSING DEVICE USING THE SAME
- Publication number 20160139709
- Publication date May 19, 2016
- Industrial Technology Research Institute
- Sheng-Feng Chung
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MESH ELECTRODE, SENSING DEVICE, AND ELECTRODE LAYER
- Publication number 20160132153
- Publication date May 12, 2016
- Industrial Technology Research Institute
- Heng-Tien Lin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SENSING STRUCTURE
- Publication number 20160018348
- Publication date Jan 21, 2016
- Industrial Technology Research Institute
- Bao-Shun Yau
- G01 - MEASURING TESTING
Information Patent Application
ILLUMINATION DEVICE
- Publication number 20150338078
- Publication date Nov 26, 2015
- Industrial Technology Research Institute
- Su-Tsai LU
- F21 - LIGHTING
Information Patent Application
Touch panel structure and fabrication method for the same
- Publication number 20150177867
- Publication date Jun 25, 2015
- Industrial Technology Research Institute
- Sheng-Feng CHUNG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
POLYSILICON DESIGN FOR REPLACEMENT GATE TECHNOLOGY
- Publication number 20150132902
- Publication date May 14, 2015
- Taiwan Semiconductor Manufacturing Company Ltd.
- Harry-Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT FOR HIGH-K METAL GATE DEVICE
- Publication number 20150021672
- Publication date Jan 22, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry-Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Contact for High-K Metal Gate Device
- Publication number 20130328115
- Publication date Dec 12, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry-Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS TO STOP CONTACT METAL FROM EXTRUDING INTO REPLACEMENT GATES
- Publication number 20130323919
- Publication date Dec 5, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Lee-Wee TEO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method of Fabricating Same
- Publication number 20130316504
- Publication date Nov 28, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung Long Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHODS FOR HIGH-K AND METAL GATE STACKS
- Publication number 20130299913
- Publication date Nov 14, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jyun-Ming Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING A METAL GATE SEMICONDUCTOR DEVICE
- Publication number 20130260547
- Publication date Oct 3, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd., ("TSMC")
- Sheng-Chen Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF HYBRID HIGH-K/METAL-GATE STACK FABRICATION
- Publication number 20130234254
- Publication date Sep 12, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jin-Aun Ng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMOS Devices with Metal Gates and Methods for Forming the Same
- Publication number 20130154022
- Publication date Jun 20, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sheng-Chen Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT FOR HIGH-K METAL GATE DEVICE
- Publication number 20130069174
- Publication date Mar 21, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONDUCTIVE FILM STRUCTURE CAPABLE OF RESISTING MOISTURE AND OXYGEN...
- Publication number 20130008687
- Publication date Jan 10, 2013
- Industrial Technology Research Institute
- Mike Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOVEL DEVICE SCHEME OF HMKG GATE-LAST PROCESS
- Publication number 20120056269
- Publication date Mar 8, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sheng-Chen Chung
- H01 - BASIC ELECTRIC ELEMENTS

Sheng-feng Chung

Person

Patents Grantslast 30 patents

Method for the fabrication of an electroless-metal-plated sulfur na...

Metal-oxide-semiconductor transistor and method of fabricating the...

Polysilicon design for replacement gate technology

Gate oxide forming process

Polysilicon design for replacement gate technology

Polysilicon design for replacement gate technology

Polysilicon design for replacement gate technology

Mesh electrode, sensing device, and electrode layer

Polysilicon design for replacement gate technology

Conductive line structure and sensing device using the same

Sensing structure

Device for high-K and metal gate stacks

Polysilicon design for replacement gate technology

Methods to stop contact metal from extruding into replacement gates

Gravure printing system and method of using the same

Touch panel structure and fabrication method for the same

Illumination device

Method for mechanical stress enhancement in semiconductor devices

Method of fabricating a metal gate semiconductor device

CMOS devices with metal gates and methods for forming the same

Method of hybrid high-k/metal-gate stack fabrication

Polysilicon design for replacement gate technology

Contact for high-k metal gate device

Method for removing hard masks on gates in semiconductor manufactur...

Semiconductor device and method of fabricating same

Contact for high-K metal gate device

Structures and methods to stop contact metal from extruding into re...

Device scheme of HKMG gate-last process

Semiconductor device and method of fabricating same

Semiconductor device fabrication method including hard mask and sac...

Patents Applicationslast 30 patents

HOT-PRESSED CARBON/SULFUR COMPOSITE ENERGY-STORAGE CATHODE, A METHO...

CORE-SHELL CATHODE AND A LITHIUM-SULFUR BATTERY USING THE SAME

MULTI-DIE PACKAGE

Method for the fabrication of an electroless-metal-plated sulfur na...

Polysilicon Design for Replacement Gate Technology

GATE OXIDE FORMING PROCESS

Polysilicon Design for Replacement Gate Technology

METAL-OXIDE-SEMICONDUCTOR TRANSISTOR AND METHOD OF FABRICATING THE...

Polysilicon Design for Replacement Gate Technology

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE INVOLVING FORMING EPITA...

Polysilicon Design for Replacement Gate Technology

Polysilicon Design for Replacement Gate Technology

Polysilicon Design for Replacement Gate Technology

CONDUCTIVE LINE STRUCTURE AND SENSING DEVICE USING THE SAME

MESH ELECTRODE, SENSING DEVICE, AND ELECTRODE LAYER

SENSING STRUCTURE

ILLUMINATION DEVICE

Touch panel structure and fabrication method for the same

POLYSILICON DESIGN FOR REPLACEMENT GATE TECHNOLOGY

CONTACT FOR HIGH-K METAL GATE DEVICE

Contact for High-K Metal Gate Device

METHODS TO STOP CONTACT METAL FROM EXTRUDING INTO REPLACEMENT GATES

Semiconductor Device and Method of Fabricating Same

DEVICE AND METHODS FOR HIGH-K AND METAL GATE STACKS

METHOD OF FABRICATING A METAL GATE SEMICONDUCTOR DEVICE

METHOD OF HYBRID HIGH-K/METAL-GATE STACK FABRICATION

CMOS Devices with Metal Gates and Methods for Forming the Same

CONTACT FOR HIGH-K METAL GATE DEVICE

CONDUCTIVE FILM STRUCTURE CAPABLE OF RESISTING MOISTURE AND OXYGEN...

NOVEL DEVICE SCHEME OF HMKG GATE-LAST PROCESS