Sheri L. Ablaza

Person

Brookline, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Photoresist compositions
- Patent number 6,743,563
- Issue date Jun 1, 2004
- Shipley Company, L.L.C.
- James F. Cameron
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Narrow molecular weight distribution polymers and use of same as re...
- Patent number 6,107,425
- Issue date Aug 22, 2000
- Shipley Company, L.L.C.
- Roger F. Sinta
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive acid catalyzed resists
- Patent number 5,827,634
- Issue date Oct 27, 1998
- Shipley Company, L.L.C.
- James W. Thackeray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer for positive acid catalyzed resists
- Patent number 5,763,536
- Issue date Jun 9, 1998
- Shipley Company, L.L.C.
- James W. Thackeray
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer for positive acid catalyzed resists
- Patent number 5,731,386
- Issue date Mar 24, 1998
- Shipley Company, L.L.C.
- James W. Thackeray
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive acid catalyzed resists having an alkali soluble resin with...
- Patent number 5,700,624
- Issue date Dec 23, 1997
- Shipley Company, L.L.C.
- James W. Thackeray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer having inert blocking groups
- Patent number 5,541,263
- Issue date Jul 30, 1996
- Shipley Company, L.L.C.
- James W. Thackeray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive composition comprising polymer having inert blo...
- Patent number 5,514,520
- Issue date May 7, 1996
- Shipley Company, L.L.C.
- James W. Thackeray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Photoresist compositions with si-component
- Publication number 20050244745
- Publication date Nov 3, 2005
- Rohm and Haas Electronic Materials L.L.C.
- James F. Cameron
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist compositions
- Publication number 20030044716
- Publication date Mar 6, 2003
- James F. Cameron
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Sheri L. Ablaza

Person

Patents Grantslast 30 patents

Photoresist compositions

Narrow molecular weight distribution polymers and use of same as re...

Positive acid catalyzed resists

Polymer for positive acid catalyzed resists

Polymer for positive acid catalyzed resists

Positive acid catalyzed resists having an alkali soluble resin with...

Polymer having inert blocking groups

Radiation sensitive composition comprising polymer having inert blo...

Patents Applicationslast 30 patents

Photoresist compositions with si-component

Photoresist compositions