Sherjang Singh

Person

Guilderland, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for treating substrates with an aqueous liquid medium expose...
- Patent number 11,358,172
- Issue date Jun 14, 2022
- SUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO. KG
- Davide Dattilo
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Lithographic patterning to form fine pitch features
- Patent number 10,504,774
- Issue date Dec 10, 2019
- GLOBALFOUNDRIES Inc.
- Sunil K. Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pellicle replacement in EUV mask flow
- Patent number 10,401,724
- Issue date Sep 3, 2019
- GLOBALFOUNDRIES Inc.
- Oktawian Sobieraj
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for treating substrates
- Patent number 10,265,739
- Issue date Apr 23, 2019
- SUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO. KG
- Uwe Dietze
- B08 - CLEANING
Information Patent Grant
Method and apparatus for treating substrates
- Patent number 9,662,684
- Issue date May 30, 2017
- Suss Microtec Photomask Equipment GmbH & Co. KG
- Uwe Dietze
- B08 - CLEANING
Information Patent Grant
Mask structures and methods of manufacturing
- Patent number 9,195,132
- Issue date Nov 24, 2015
- Globalfoundries Inc.
- Suraj K. Patil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOLITHOGRAPHY SYSTEM AND METHOD INCORPORATING A PHOTOMASK-PELLIC...
- Publication number 20190258157
- Publication date Aug 22, 2019
- GLOBALFOUNDRIES INC.
- Yulu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE REPLACEMENT IN EUV MASK FLOW
- Publication number 20190137863
- Publication date May 9, 2019
- GLOBALFOUNDRIES INC.
- Oktawian Sobieraj
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DUAL DEVELOPING METHODS FOR LITHOGRAPHY PATTERNING
- Publication number 20190079408
- Publication date Mar 14, 2019
- GLOBALFOUNDRIES INC.
- Sohan Singh Mehta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) REFLECTIVE MASK
- Publication number 20180299765
- Publication date Oct 18, 2018
- GLOBALFOUNDRIES INC.
- SherJang Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LITHOGRAPHIC PATTERNING TO FORM FINE PITCH FEATURES
- Publication number 20180025936
- Publication date Jan 25, 2018
- GLOBALFOUNDRIES INC.
- Sunil K. Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND AN APPARATUS FOR CLEANING SUBSTRATES
- Publication number 20170271145
- Publication date Sep 21, 2017
- SUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO. KG
- Uwe Dietze
- B08 - CLEANING
Information Patent Application
METHOD FOR TREATING SUBSTRATES WITH AN AQUEOUS LIQUID MEDIUM EXPOSE...
- Publication number 20170087585
- Publication date Mar 30, 2017
- SUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO. KG
- Davide Dattilo
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
MASK STRUCTURES AND METHODS OF MANUFACTURING
- Publication number 20150212402
- Publication date Jul 30, 2015
- GLOBALFOUNDRIES INC.
- Suraj K. PATIL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR TREATING SUBSTRATES
- Publication number 20120211024
- Publication date Aug 23, 2012
- HamaTech APE GmbH & Co. KG
- Uwe Dietze
- B08 - CLEANING

Sherjang Singh

Person

Patents Grantslast 30 patents

Method for treating substrates with an aqueous liquid medium expose...

Lithographic patterning to form fine pitch features

Pellicle replacement in EUV mask flow

Method and apparatus for treating substrates

Method and apparatus for treating substrates

Mask structures and methods of manufacturing

Patents Applicationslast 30 patents

PHOTOLITHOGRAPHY SYSTEM AND METHOD INCORPORATING A PHOTOMASK-PELLIC...

PELLICLE REPLACEMENT IN EUV MASK FLOW

DUAL DEVELOPING METHODS FOR LITHOGRAPHY PATTERNING

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) REFLECTIVE MASK

LITHOGRAPHIC PATTERNING TO FORM FINE PITCH FEATURES

METHOD AND AN APPARATUS FOR CLEANING SUBSTRATES

METHOD FOR TREATING SUBSTRATES WITH AN AQUEOUS LIQUID MEDIUM EXPOSE...

MASK STRUCTURES AND METHODS OF MANUFACTURING

METHOD AND APPARATUS FOR TREATING SUBSTRATES