Shi-Woang Wang

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Grooved retaining ring
- Patent number 7,520,795
- Issue date Apr 21, 2009
- Applied Materials, Inc.
- Shi-Ping Wang
- B24 - GRINDING POLISHING
Information Patent Grant
Method of chemical mechanical polishing with high throughput and lo...
- Patent number 7,232,761
- Issue date Jun 19, 2007
- Applied Materials, Inc.
- Shijian Li
- B24 - GRINDING POLISHING
Information Patent Grant
Interface transmitter for communications among network elements
- Patent number 7,054,324
- Issue date May 30, 2006
- CIENA Corporation
- Raanan Ben-Zur
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Method and apparatus for polishing metal and dielectric substrates
- Patent number 6,960,521
- Issue date Nov 1, 2005
- Applied Materials, Inc.
- Yongsik Moon
- B24 - GRINDING POLISHING
Information Patent Grant
Methods and apparatus for polishing substrates comprising conductiv...
- Patent number 6,790,768
- Issue date Sep 14, 2004
- Applied Materials Inc.
- Yongsik Moon
- B24 - GRINDING POLISHING
Information Patent Grant
Method of chemical mechanical polishing with high throughput and lo...
- Patent number 6,780,773
- Issue date Aug 24, 2004
- Applied Materials Inc.
- Shijian Li
- B24 - GRINDING POLISHING
Information Patent Grant
Pad cleaning for a CMP system
- Patent number 6,669,538
- Issue date Dec 30, 2003
- Applied Materials Inc.
- Shijian Li
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for generating massive interrupts in random ac...
- Patent number 6,633,573
- Issue date Oct 14, 2003
- CIENA Corporation
- Raanan Ben-Zur
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Platen for retaining polishing material
- Patent number 6,592,439
- Issue date Jul 15, 2003
- Applied Materials, Inc.
- Shijian Li
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR IN-SITU HEAD RINSE
- Publication number 20080003931
- Publication date Jan 3, 2008
- Antoine P. Manens
- B24 - GRINDING POLISHING
Information Patent Application
Grooved Retaining Ring
- Publication number 20070044913
- Publication date Mar 1, 2007
- APPLIED MATERIALS, INC.
- Shi-Ping Wang
- B24 - GRINDING POLISHING
Information Patent Application
Metal CMP process on one or more polishing stations using slurries...
- Publication number 20060219663
- Publication date Oct 5, 2006
- APPLIED MATERIALS, INC.
- Shi-Ping Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for polishing metal and dielectric substrates
- Publication number 20050032381
- Publication date Feb 10, 2005
- Yongsik Moon
- B24 - GRINDING POLISHING
Information Patent Application
Method of chemical mechanical polishing with high throughput and lo...
- Publication number 20050026442
- Publication date Feb 3, 2005
- Shijian Li
- B24 - GRINDING POLISHING
Information Patent Application
Method and apparatus for polishing metal and dielectric substrates
- Publication number 20030029841
- Publication date Feb 13, 2003
- APPLIED MATERIALS, INC.
- Yongsik Moon
- B24 - GRINDING POLISHING
Information Patent Application
Method of chemical mechanical polishing with high throughput and lo...
- Publication number 20030022497
- Publication date Jan 30, 2003
- APPLIED MATERIALS, INC.
- Shijian Li
- B24 - GRINDING POLISHING
Information Patent Application
Pad Cleaning for a CMP system
- Publication number 20020090896
- Publication date Jul 11, 2002
- LI,ET AL
- Shijian Li
- B24 - GRINDING POLISHING

Shi-Woang Wang

Person

Patents Grantslast 30 patents

Grooved retaining ring

Method of chemical mechanical polishing with high throughput and lo...

Interface transmitter for communications among network elements

Method and apparatus for polishing metal and dielectric substrates

Methods and apparatus for polishing substrates comprising conductiv...

Method of chemical mechanical polishing with high throughput and lo...

Pad cleaning for a CMP system

Method and apparatus for generating massive interrupts in random ac...

Platen for retaining polishing material

Patents Applicationslast 30 patents

SYSTEM AND METHOD FOR IN-SITU HEAD RINSE

Grooved Retaining Ring

Metal CMP process on one or more polishing stations using slurries...

Method and apparatus for polishing metal and dielectric substrates

Method of chemical mechanical polishing with high throughput and lo...

Method and apparatus for polishing metal and dielectric substrates

Method of chemical mechanical polishing with high throughput and lo...

Pad Cleaning for a CMP system