Shiang-Bau Wang

Person

Hsinchu, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor structure with patterned fin structure
- Patent number 12,131,901
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Air spacer and method of forming same
- Patent number 12,107,149
- Issue date Oct 1, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ming-Jhe Sie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 12,057,342
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 12,027,594
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsu Ming Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 11,996,466
- Issue date May 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Huang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer bonding method and semiconductor structure obtained by the same
- Patent number 11,978,641
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pei-Yu Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 11,848,240
- Issue date Dec 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shu-Uei Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 11,823,958
- Issue date Nov 21, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal gate structure cutting process
- Patent number 11,810,909
- Issue date Nov 7, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field effect transistor (FinFET) device with protection layer
- Patent number 11,798,939
- Issue date Oct 24, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Partial directional etch method and resulting structures
- Patent number 11,728,407
- Issue date Aug 15, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Air spacer and method of forming same
- Patent number 11,652,155
- Issue date May 16, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ming-Jhe Sie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and manufacturing method thereof
- Patent number 11,631,750
- Issue date Apr 18, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 11,527,430
- Issue date Dec 13, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Partial directional etch method and resulting structures
- Patent number 11,374,110
- Issue date Jun 28, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Air spacer and method of forming same
- Patent number 11,349,014
- Issue date May 31, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ming-Jhe Sie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 11,329,140
- Issue date May 10, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Huang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and manufacturing method thereof
- Patent number 11,282,941
- Issue date Mar 22, 2022
- Taiwan Semiconductor Manufacturing Company Ltd.
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cut-fin isolation regions and method forming same
- Patent number 11,171,236
- Issue date Nov 9, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 11,069,579
- Issue date Jul 20, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal gate structure cutting process
- Patent number 11,056,478
- Issue date Jul 6, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Highly strained source/drain trenches in semiconductor devices
- Patent number 10,868,166
- Issue date Dec 15, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ta-Wei Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 10,861,746
- Issue date Dec 8, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shu-Uei Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography mask and method
- Patent number 10,859,902
- Issue date Dec 8, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shiang-Bau Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device and method
- Patent number 10,847,409
- Issue date Nov 24, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer measurement method and system
- Patent number 10,762,621
- Issue date Sep 1, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Peng-Ren Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor structure with etched fin structure
- Patent number 10,707,072
- Issue date Jul 7, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field effect transistor (FinFET) device with protection layer
- Patent number 10,504,893
- Issue date Dec 10, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography mask and method
- Patent number 10,481,483
- Issue date Nov 19, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shiang-Bau Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor structure and manufacturing method thereof
- Patent number 10,355,131
- Issue date Jul 16, 2019
- Taiwan Semiconductor Manufacturing Company Ltd.
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Semiconductor Device and Method
- Publication number 20240395598
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIR SPACER AND METHOD OF FORMING SAME
- Publication number 20240379820
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ming-Jhe Sie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTIAL DIRECTIONAL ETCH METHOD AND RESULTING STRUCTURES
- Publication number 20240379819
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shiang-Bau WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
- Publication number 20240290869
- Publication date Aug 29, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chen-Huang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVCE
- Publication number 20240128126
- Publication date Apr 18, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shu-Uei Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER BONDING METHOD AND SEMICONDUCTOR STRUCTURE OBTAINED BY THE SAME
- Publication number 20230395392
- Publication date Dec 7, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Yu CHOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD
- Publication number 20230377990
- Publication date Nov 23, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Partial Directional Etch Method and Resulting Structures
- Publication number 20230343853
- Publication date Oct 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shiang-Bau WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Air Spacer and Method of Forming Same
- Publication number 20230253479
- Publication date Aug 10, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ming-Jhe Sie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method
- Publication number 20230113320
- Publication date Apr 13, 2023
- Taiwan Semiconductor Manufacturing Co, LTD.
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...
- Publication number 20230060763
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsu Ming HSIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Partial Directional Etch Method and Resulting Structures
- Publication number 20220328656
- Publication date Oct 13, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shiang-Bau WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Air Spacer and Method of Forming Same
- Publication number 20220285530
- Publication date Sep 8, 2022
- Taiwan Semiconductor Manufacturing Co, LTD.
- Ming-Jhe Sie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method of Manufacture
- Publication number 20220262920
- Publication date Aug 18, 2022
- Taiwan Semiconductor Manufactuing Co., Ltd.
- Chen-Huang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
- Publication number 20220208993
- Publication date Jun 30, 2022
- Taiwan Semiconductor Manufacturing company Ltd.
- SHIANG-BAU WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cut-Fin Isolation Regions and Method Forming Same
- Publication number 20220059685
- Publication date Feb 24, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Air Spacer and Method of Forming Same
- Publication number 20210408266
- Publication date Dec 30, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ming-Jhe Sie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD
- Publication number 20210351084
- Publication date Nov 11, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Partial Directional Etch Method and Resulting Structures
- Publication number 20210265487
- Publication date Aug 26, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shiang-Bau WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal Gate Structure Cutting Process
- Publication number 20210242192
- Publication date Aug 5, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method of Manufacture
- Publication number 20210226033
- Publication date Jul 22, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chen-Huang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Manufacturing a Semiconductor Device
- Publication number 20210090958
- Publication date Mar 25, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shu-Uei Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method
- Publication number 20210074579
- Publication date Mar 11, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR WAFER MEASUREMENT METHOD AND SYSTEM
- Publication number 20200364844
- Publication date Nov 19, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Peng-Ren CHEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR STRUCTURE WITH PATTERNED FIN STRUCTURE
- Publication number 20200335323
- Publication date Oct 22, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shiang-Bau WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method of Manufacture
- Publication number 20200176318
- Publication date Jun 4, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shu-Uei Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method
- Publication number 20200126868
- Publication date Apr 23, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN FIELD EFFECT TRANSISTOR (FINFET) DEVICE WITH PROTECTION LAYER
- Publication number 20200119005
- Publication date Apr 16, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shiang-Bau WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method
- Publication number 20200105583
- Publication date Apr 2, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cut-Fin Isolation Regions and Method Forming Same
- Publication number 20200044070
- Publication date Feb 6, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS

Shiang-Bau Wang

Person

Patents Grantslast 30 patents

Semiconductor structure with patterned fin structure

Air spacer and method of forming same

Semiconductor device and method

Method of manufacturing a semiconductor device and a semiconductor...

Semiconductor device and method of manufacture

Wafer bonding method and semiconductor structure obtained by the same

Method of manufacturing a semiconductor device

Semiconductor device and method

Metal gate structure cutting process

Fin field effect transistor (FinFET) device with protection layer

Partial directional etch method and resulting structures

Air spacer and method of forming same

Semiconductor structure and manufacturing method thereof

Semiconductor device and method

Partial directional etch method and resulting structures

Air spacer and method of forming same

Semiconductor device and method of manufacture

Semiconductor structure and manufacturing method thereof

Cut-fin isolation regions and method forming same

Semiconductor device and method

Metal gate structure cutting process

Highly strained source/drain trenches in semiconductor devices

Method of manufacturing a semiconductor device

Lithography mask and method

Semiconductor device and method

Semiconductor wafer measurement method and system

Semiconductor structure with etched fin structure

Fin field effect transistor (FinFET) device with protection layer

Lithography mask and method

Semiconductor structure and manufacturing method thereof

Patents Applicationslast 30 patents

Semiconductor Device and Method

AIR SPACER AND METHOD OF FORMING SAME

PARTIAL DIRECTIONAL ETCH METHOD AND RESULTING STRUCTURES

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVCE

WAFER BONDING METHOD AND SEMICONDUCTOR STRUCTURE OBTAINED BY THE SAME

SEMICONDUCTOR DEVICE AND METHOD

Partial Directional Etch Method and Resulting Structures

Air Spacer and Method of Forming Same

Semiconductor Device and Method

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...

Partial Directional Etch Method and Resulting Structures

Air Spacer and Method of Forming Same

Semiconductor Device and Method of Manufacture

SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF

Cut-Fin Isolation Regions and Method Forming Same

Air Spacer and Method of Forming Same

SEMICONDUCTOR DEVICE AND METHOD

Partial Directional Etch Method and Resulting Structures

Metal Gate Structure Cutting Process

Semiconductor Device and Method of Manufacture

Method of Manufacturing a Semiconductor Device

Semiconductor Device and Method

SEMICONDUCTOR WAFER MEASUREMENT METHOD AND SYSTEM

SEMICONDUCTOR STRUCTURE WITH PATTERNED FIN STRUCTURE

Semiconductor Device and Method of Manufacture

Semiconductor Device and Method

FIN FIELD EFFECT TRANSISTOR (FINFET) DEVICE WITH PROTECTION LAYER

Semiconductor Device and Method

Cut-Fin Isolation Regions and Method Forming Same