Shien-Ping Feng

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Taipei, TW

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Patents Grantslast 30 patents

Information Patent Grant
Method of reducing the pattern effect in the CMP process
- Patent number 7,183,199
- Issue date Feb 27, 2007
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Wen Liu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method of reducing the pattern effect in the CMP process
- Publication number 20050118808
- Publication date Jun 2, 2005
- Chi-Wen Liu
- H01 - BASIC ELECTRIC ELEMENTS