Shifang Li

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods of high-resolution review for semiconductor ins...
- Patent number 11,544,838
- Issue date Jan 3, 2023
- KLA Corporation
- Shifang Li
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Determining metrology-like information for a specimen using an insp...
- Patent number 11,221,300
- Issue date Jan 11, 2022
- KLA Corp.
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
All surface film metrology system
- Patent number 10,563,973
- Issue date Feb 18, 2020
- KLA-Tencor Corporation
- Shifang Li
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Bonded wafer metrology
- Patent number 10,540,759
- Issue date Jan 21, 2020
- KLA-Tencor Corporation
- Kaushik Sah
- G01 - MEASURING TESTING
Information Patent Grant
Methods and apparatus for measuring height on a semiconductor wafer
- Patent number 10,495,446
- Issue date Dec 3, 2019
- KLA-Tencor Corporation
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Method for defocus detection
- Patent number 10,372,113
- Issue date Aug 6, 2019
- KLA-Tencor Corporation
- Xuguang Jiang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of improving lateral resolution for height sensor using diff...
- Patent number 10,088,298
- Issue date Oct 2, 2018
- KLA-Tencor Corporation
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Increasing dynamic range of a height sensor for inspection and metr...
- Patent number 9,958,257
- Issue date May 1, 2018
- KLA-Tencor Corporation
- Shifang Li
- G02 - OPTICS
Information Patent Grant
Line scan knife edge height sensor for semiconductor inspection and...
- Patent number 9,885,656
- Issue date Feb 6, 2018
- KLA-Tencor Corporation
- Shifang Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Line scan spectroscopic white light interferometry for semiconducto...
- Patent number 9,863,756
- Issue date Jan 9, 2018
- KLA-Tencor Corporation
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for enhancing inspection sensitivity of an insp...
- Patent number 9,747,520
- Issue date Aug 29, 2017
- KLA-Tencor Corporation
- Shifang Li
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Apparatus and methods for measuring properties in a TSV structure u...
- Patent number 9,709,386
- Issue date Jul 18, 2017
- KLA-Tencor Corporation
- Lena Nicolaides
- G01 - MEASURING TESTING
Information Patent Grant
System and method for semiconductor wafer inspection and metrology
- Patent number 9,658,150
- Issue date May 23, 2017
- KLA-Tencor Corporation
- Shifang Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automated inline inspection of wafer edge strain profiles using rap...
- Patent number 9,640,449
- Issue date May 2, 2017
- KLA-Tencor Corporation
- Timothy Goodwin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Computation efficiency by diffraction order truncation
- Patent number 9,625,937
- Issue date Apr 18, 2017
- KLA-Tencor Corporation
- Joerg Bischoff
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical metrology with multiple angles of incidence and/or azimuth...
- Patent number 9,115,987
- Issue date Aug 25, 2015
- Nanometrics Incorporated
- Zhuan Liu
- G01 - MEASURING TESTING
Information Patent Grant
Automated process control using an adjusted metrology output signal
- Patent number 9,103,664
- Issue date Aug 11, 2015
- Tokyo Electron Limited
- Shifang Li
- G05 - CONTROLLING REGULATING
Information Patent Grant
System for in-situ film stack measurement during etching and etch c...
- Patent number 9,059,038
- Issue date Jun 16, 2015
- Tokyo Electron Limited
- Shifang Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overlay measurement for a double patterning
- Patent number 8,980,651
- Issue date Mar 17, 2015
- Tokyo Electron Limited
- Hongyu Henry Yue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process control using ray tracing-based libraries and machine learn...
- Patent number 8,838,422
- Issue date Sep 16, 2014
- Tokyo Electron Limited
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Method of enhancing an optical metrology system using ray tracing a...
- Patent number 8,812,277
- Issue date Aug 19, 2014
- Tokyo Electron Limited
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Method of regenerating diffraction signals for optical metrology sy...
- Patent number 8,570,531
- Issue date Oct 29, 2013
- Tokyo Electron Limited
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Optimization of ray tracing and beam propagation parameters
- Patent number 8,289,527
- Issue date Oct 16, 2012
- Tokyo Electron Limited
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Generating simulated diffraction signal using a dispersion function...
- Patent number 8,069,020
- Issue date Nov 29, 2011
- Tokyo Electron Limited
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
System and method for azimuth angle calibration
- Patent number 7,990,534
- Issue date Aug 2, 2011
- Tokyo Electron Limited
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Optimizing sensitivity of optical metrology measurements
- Patent number 7,961,306
- Issue date Jun 14, 2011
- Tokyo Electron Limited
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Determining profile parameters of a structure using approximation a...
- Patent number 7,949,490
- Issue date May 24, 2011
- Tokyo Electron Limited
- Wei Liu
- G01 - MEASURING TESTING
Information Patent Grant
Pre-aligned metrology system and modules
- Patent number 7,940,391
- Issue date May 10, 2011
- Tokyo Electron Limited
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Determining profile parameters of a structure formed on a semicondu...
- Patent number 7,912,679
- Issue date Mar 22, 2011
- Tokyo Electron Limited
- Shifang Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Field replaceable units (FRUs) optimized for integrated metrology (IM)
- Patent number 7,742,163
- Issue date Jun 22, 2010
- Tokyo Electron Limited
- Shifang Li
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
HOLISTIC ANALYSIS OF MULTIDIMENSIONAL SENSOR DATA FOR SUBSTRATE PRO...
- Publication number 20230367302
- Publication date Nov 16, 2023
- Applied Materials, Inc.
- Chao Liu
- G05 - CONTROLLING REGULATING
Information Patent Application
TEMPERATURE-BASED METROLOGY CALIBRATION AT A MANUFACTURING SYSTEM
- Publication number 20230317481
- Publication date Oct 5, 2023
- Applied Materials, Inc.
- Shifang Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGING REFLECTOMETRY FOR INLINE SCREENING
- Publication number 20220307990
- Publication date Sep 29, 2022
- John Charles Robinson
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINING METROLOGY-LIKE INFORMATION FOR A SPECIMEN USING AN INSP...
- Publication number 20210293724
- Publication date Sep 23, 2021
- KLA Corporation
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Application
Systems and Methods of High-Resolution Review for Semiconductor Ins...
- Publication number 20210295495
- Publication date Sep 23, 2021
- KLA Corporation
- Shifang Li
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Bonded Wafer Metrology
- Publication number 20180150952
- Publication date May 31, 2018
- KLA-Tencor Corporation
- Kaushik Sah
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method for Defocus Detection
- Publication number 20180088560
- Publication date Mar 29, 2018
- KLA-Tencor Corporation
- Xuguang Jiang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ALL SURFACE FILM METROLOGY SYSTEM
- Publication number 20170278236
- Publication date Sep 28, 2017
- KLA-Tencor Corporation
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Application
Increasing Dynamic Range of a Height Sensor for Inspection and Metr...
- Publication number 20170082424
- Publication date Mar 23, 2017
- KLA-Tencor Corporation
- Shifang Li
- G02 - OPTICS
Information Patent Application
METHOD OF IMPROVING LATERAL RESOLUTION FOR HEIGHT SENSOR USING DIFF...
- Publication number 20170067732
- Publication date Mar 9, 2017
- KLA-Tencor Corporation
- Shifang Li
- G02 - OPTICS
Information Patent Application
METHODS AND APPARATUS FOR MEASURING HEIGHT ON A SEMICONDUCTOR WAFER
- Publication number 20160377412
- Publication date Dec 29, 2016
- KLA-Tencor Corporation
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Application
Systems and Methods for Enhancing Inspection Sensitivity of an Insp...
- Publication number 20160275671
- Publication date Sep 22, 2016
- KLA-Tencor Corporation
- Shifang Li
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM AND METHOD FOR SEMICONDUCTOR WAFER INSPECTION AND METROLOGY
- Publication number 20160202177
- Publication date Jul 14, 2016
- KLA-Tencor Corporation
- Shifang LI
- G01 - MEASURING TESTING
Information Patent Application
LINE SCAN KNIFE EDGE HEIGHT SENSOR FOR SEMICONDUCTOR INSPECTION AND...
- Publication number 20160178514
- Publication date Jun 23, 2016
- KLA-Tencor Corporation
- Shifang LI
- G01 - MEASURING TESTING
Information Patent Application
Automated Inline Inspection of Wafer Edge Strain Profiles Using Rap...
- Publication number 20150371910
- Publication date Dec 24, 2015
- KLA-Tencor Corporation
- Timothy Goodwin
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL METROLOGY WITH MULTIPLE ANGLES OF INCIDENCE AND/OR AZUMITH...
- Publication number 20150153165
- Publication date Jun 4, 2015
- Nanometrics Incorporated
- Zhuan Liu
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM FOR IN-SITU FILM STACK MEASUREMENT DURING ETCHING AND ETCH C...
- Publication number 20140024143
- Publication date Jan 23, 2014
- TOKYO ELECTRON LIMITED
- Shifang LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF REGENERATING DIFFRACTION SIGNALS FOR OPTICAL METROLOGY SY...
- Publication number 20130151440
- Publication date Jun 13, 2013
- TOKYO ELECTRON LIMITED
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Application
PROCESS CONTROL USING RAY TRACING-BASED LIBRARIES AND MACHINE LEARN...
- Publication number 20130148130
- Publication date Jun 13, 2013
- TOKYO ELECTRON LIMITED
- SHIFANG LI
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF ENHANCING AN OPTICAL METROLOGY SYSTEM USING RAY TRACING A...
- Publication number 20130151211
- Publication date Jun 13, 2013
- TOKYO ELECTRON LIMITED
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Application
OVERLAY MEASUREMENT FOR A DOUBLE PATTERNING
- Publication number 20130084655
- Publication date Apr 4, 2013
- Hongyu Henry Yue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AUTOMATED PROCESS CONTROL USING AN ADJUSTED METROLOGY OUTPUT SIGNAL
- Publication number 20110245955
- Publication date Oct 6, 2011
- TOKYO ELECTRON LIMITED
- SHIFANG LI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTIMIZATION OF RAY TRACING AND BEAM PROPAGATION PARAMETERS
- Publication number 20110246142
- Publication date Oct 6, 2011
- TOKYO ELECTRON LIMITED
- SHIFANG LI
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM FOR OPTICAL METROLOGY OPTIMIZATION USING RAY TRACING
- Publication number 20110246400
- Publication date Oct 6, 2011
- TOKYO ELECTRON LIMITED
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF OPTICAL METROLOGY OPTIMIZATION USING RAY TRACING
- Publication number 20110246141
- Publication date Oct 6, 2011
- TOKYO ELECTRON LIMITED
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Application
OPTIMIZING SENSITIVITY OF OPTICAL METROLOGY MEASUREMENTS
- Publication number 20100245807
- Publication date Sep 30, 2010
- TOKYO ELECTRON LIMITED
- SHIFANG LI
- G01 - MEASURING TESTING
Information Patent Application
COMPUTATION EFFICIENCY BY DIFFRACTION ORDER TRUNCATION
- Publication number 20100042388
- Publication date Feb 18, 2010
- Joerg Bischoff
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Field Replaceable Units (FRUs) Optimized for Integrated Metrology (IM)
- Publication number 20100007875
- Publication date Jan 14, 2010
- TOKYO ELECTRON LIMITED
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Application
Pre-Aligned Metrology System and Modules
- Publication number 20100007885
- Publication date Jan 14, 2010
- TOKYO ELECTRON LIMITED
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Application
System and Method for Azimuth Angle Calibration
- Publication number 20100010765
- Publication date Jan 14, 2010
- TOKYO ELECTRON LIMITED
- Shifang Li
- G01 - MEASURING TESTING

Person

Patents Grantslast 30 patents

Systems and methods of high-resolution review for semiconductor ins...

Determining metrology-like information for a specimen using an insp...

All surface film metrology system

Bonded wafer metrology

Methods and apparatus for measuring height on a semiconductor wafer

Method for defocus detection

Method of improving lateral resolution for height sensor using diff...

Increasing dynamic range of a height sensor for inspection and metr...

Line scan knife edge height sensor for semiconductor inspection and...

Line scan spectroscopic white light interferometry for semiconducto...

Systems and methods for enhancing inspection sensitivity of an insp...

Apparatus and methods for measuring properties in a TSV structure u...

System and method for semiconductor wafer inspection and metrology

Automated inline inspection of wafer edge strain profiles using rap...

Computation efficiency by diffraction order truncation

Optical metrology with multiple angles of incidence and/or azimuth...

Automated process control using an adjusted metrology output signal

System for in-situ film stack measurement during etching and etch c...

Overlay measurement for a double patterning

Process control using ray tracing-based libraries and machine learn...

Method of enhancing an optical metrology system using ray tracing a...

Method of regenerating diffraction signals for optical metrology sy...

Optimization of ray tracing and beam propagation parameters

Generating simulated diffraction signal using a dispersion function...

System and method for azimuth angle calibration

Optimizing sensitivity of optical metrology measurements

Determining profile parameters of a structure using approximation a...

Pre-aligned metrology system and modules

Determining profile parameters of a structure formed on a semicondu...

Field replaceable units (FRUs) optimized for integrated metrology (IM)

Patents Applicationslast 30 patents

HOLISTIC ANALYSIS OF MULTIDIMENSIONAL SENSOR DATA FOR SUBSTRATE PRO...

TEMPERATURE-BASED METROLOGY CALIBRATION AT A MANUFACTURING SYSTEM

IMAGING REFLECTOMETRY FOR INLINE SCREENING

DETERMINING METROLOGY-LIKE INFORMATION FOR A SPECIMEN USING AN INSP...

Systems and Methods of High-Resolution Review for Semiconductor Ins...

Bonded Wafer Metrology

Method for Defocus Detection

ALL SURFACE FILM METROLOGY SYSTEM

Increasing Dynamic Range of a Height Sensor for Inspection and Metr...

METHOD OF IMPROVING LATERAL RESOLUTION FOR HEIGHT SENSOR USING DIFF...

METHODS AND APPARATUS FOR MEASURING HEIGHT ON A SEMICONDUCTOR WAFER

Systems and Methods for Enhancing Inspection Sensitivity of an Insp...

SYSTEM AND METHOD FOR SEMICONDUCTOR WAFER INSPECTION AND METROLOGY

LINE SCAN KNIFE EDGE HEIGHT SENSOR FOR SEMICONDUCTOR INSPECTION AND...

Automated Inline Inspection of Wafer Edge Strain Profiles Using Rap...

OPTICAL METROLOGY WITH MULTIPLE ANGLES OF INCIDENCE AND/OR AZUMITH...

SYSTEM FOR IN-SITU FILM STACK MEASUREMENT DURING ETCHING AND ETCH C...

METHOD OF REGENERATING DIFFRACTION SIGNALS FOR OPTICAL METROLOGY SY...

PROCESS CONTROL USING RAY TRACING-BASED LIBRARIES AND MACHINE LEARN...

METHOD OF ENHANCING AN OPTICAL METROLOGY SYSTEM USING RAY TRACING A...

OVERLAY MEASUREMENT FOR A DOUBLE PATTERNING

AUTOMATED PROCESS CONTROL USING AN ADJUSTED METROLOGY OUTPUT SIGNAL

OPTIMIZATION OF RAY TRACING AND BEAM PROPAGATION PARAMETERS

SYSTEM FOR OPTICAL METROLOGY OPTIMIZATION USING RAY TRACING

METHOD OF OPTICAL METROLOGY OPTIMIZATION USING RAY TRACING

OPTIMIZING SENSITIVITY OF OPTICAL METROLOGY MEASUREMENTS

COMPUTATION EFFICIENCY BY DIFFRACTION ORDER TRUNCATION

Field Replaceable Units (FRUs) Optimized for Integrated Metrology (IM)

Pre-Aligned Metrology System and Modules

System and Method for Azimuth Angle Calibration