Shigemasa NAKASUGI

Person

Shizuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Ethynyl derived composite, a composition comprising thereof, a meth...
- Patent number 11,914,296
- Issue date Feb 27, 2024
- Merck Patent GmbH
- Shigemasa Nakasugi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Ethynyl derived composite, a composition comprising thereof, a meth...
- Patent number 11,609,498
- Issue date Mar 21, 2023
- Merck Patent GmbH
- Shigemasa Nakasugi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compound, semiconductor material, and methods for manufacturing coa...
- Patent number 11,450,805
- Issue date Sep 20, 2022
- Merck Patent GmbH
- Shigemasa Nakasugi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Allyloxy derivative, resist underlayer forming composition using th...
- Patent number 11,366,389
- Issue date Jun 21, 2022
- Merck Patent GmbH
- Shigemasa Nakasugi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming underlayer and method for forming underlaye...
- Patent number 10,451,971
- Issue date Oct 22, 2019
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Masato Suzuki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Void forming composition, semiconductor device provided with voids...
- Patent number 10,435,555
- Issue date Oct 8, 2019
- AZ Electronic Materials (Luxembourg) S.a.r.l.
- Shigemasa Nakasugi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for producing surface-modified silica nanoparticles, and sur...
- Patent number 10,106,428
- Issue date Oct 23, 2018
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Hiroshi Yanagita
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming fine resist pattern and pattern formation m...
- Patent number 9,360,756
- Issue date Jun 7, 2016
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Kazuma Yamamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming resist underlayer
- Patent number 9,328,198
- Issue date May 3, 2016
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Shigemasa Nakasugi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Developable bottom anti-reflective coating
- Patent number 8,900,797
- Issue date Dec 2, 2014
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Shigemasa Nakasugi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition for forming a developable bottom antireflective coating
- Patent number 8,697,336
- Issue date Apr 15, 2014
- AZ Electronic Materials USA Corp.
- Shigemasa Nakasugi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
ETHYNYL DERIVED COMPOSITE, A COMPOSITION COMPRISING THEREOF, A METH...
- Publication number 20230194989
- Publication date Jun 22, 2023
- Merck Patent GmbH
- Shigemasa NAKASUGI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR MANUFACTURING CURED FILM AND USE OF THE SAME
- Publication number 20220221794
- Publication date Jul 14, 2022
- Merck Patent GmbH
- Takashi SEKITO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ALLYLOXY DERIVATIVE, RESIST UNDERLAYER FORMING COMPOSITION USING TH...
- Publication number 20210181636
- Publication date Jun 17, 2021
- Merck Patent GmbH
- Shigemasa NAKASUGI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AN ETHYNYL DERIVED COMPOSITE, A COMPOSITION COMPRISING THEREOF, A M...
- Publication number 20200401046
- Publication date Dec 24, 2020
- Merck Patent GmbH
- Shigemasa NAKASUGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURI...
- Publication number 20200044158
- Publication date Feb 6, 2020
- Merck Patent GmbH
- Shigemasa NAKASUGI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
A POLYMER, COMPOSITION, FORMING SACRIFICIAL LAYER AND METHOD FOR SE...
- Publication number 20190048129
- Publication date Feb 14, 2019
- Shigemasa NAKASUGI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING UNDERLAYER AND METHOD FOR FORMING UNDERLAYE...
- Publication number 20180039178
- Publication date Feb 8, 2018
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Masato SUZUKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SACRIFICIAL FILM COMPOSITION, METHOD FOR PREPARING SAME, SEMICONDUC...
- Publication number 20170218227
- Publication date Aug 3, 2017
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Shigemasa NAKASUGI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
VOID FORMING COMPOSITION, SEMICONDUCTOR DEVICE PROVIDED WITH VOIDS...
- Publication number 20170210896
- Publication date Jul 27, 2017
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Shigemasa NAKASUGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING SURFACE-MODIFIED SILICA NANOPARTICLES, AND SUR...
- Publication number 20170190586
- Publication date Jul 6, 2017
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- HIROSHI YANAGITA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMATION M...
- Publication number 20150253669
- Publication date Sep 10, 2015
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Kazuma Yamamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER
- Publication number 20150118624
- Publication date Apr 30, 2015
- Shigemasa NAKASUGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING A DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING
- Publication number 20140193753
- Publication date Jul 10, 2014
- AZ Electronic Materials USA Corp.
- Shigemasa NAKASUGI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATING
- Publication number 20140087311
- Publication date Mar 27, 2014
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Shigemasa NAKASUGI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR FORMING A DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING
- Publication number 20130157196
- Publication date Jun 20, 2013
- AZ Electronic Materials USA Corp.
- Shigemasa Nakasugi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Shigemasa NAKASUGI

Person

Patents Grantslast 30 patents

Ethynyl derived composite, a composition comprising thereof, a meth...

Ethynyl derived composite, a composition comprising thereof, a meth...

Compound, semiconductor material, and methods for manufacturing coa...

Allyloxy derivative, resist underlayer forming composition using th...

Composition for forming underlayer and method for forming underlaye...

Void forming composition, semiconductor device provided with voids...

Method for producing surface-modified silica nanoparticles, and sur...

Composition for forming fine resist pattern and pattern formation m...

Composition for forming resist underlayer

Developable bottom anti-reflective coating

Composition for forming a developable bottom antireflective coating

Patents Applicationslast 30 patents

ETHYNYL DERIVED COMPOSITE, A COMPOSITION COMPRISING THEREOF, A METH...

METHOD FOR MANUFACTURING CURED FILM AND USE OF THE SAME

ALLYLOXY DERIVATIVE, RESIST UNDERLAYER FORMING COMPOSITION USING TH...

AN ETHYNYL DERIVED COMPOSITE, A COMPOSITION COMPRISING THEREOF, A M...

NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURI...

A POLYMER, COMPOSITION, FORMING SACRIFICIAL LAYER AND METHOD FOR SE...

COMPOSITION FOR FORMING UNDERLAYER AND METHOD FOR FORMING UNDERLAYE...

SACRIFICIAL FILM COMPOSITION, METHOD FOR PREPARING SAME, SEMICONDUC...

VOID FORMING COMPOSITION, SEMICONDUCTOR DEVICE PROVIDED WITH VOIDS...

METHOD FOR PRODUCING SURFACE-MODIFIED SILICA NANOPARTICLES, AND SUR...

COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMATION M...

COMPOSITION FOR FORMING RESIST UNDERLAYER

COMPOSITION FOR FORMING A DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING

DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATING

COMPOSITION FOR FORMING A DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING