Shigenori Sakamori

Person

Hyogo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device with conductive contact layer structure
- Patent number 6,731,008
- Issue date May 4, 2004
- Renesas Technology Corp.
- Kazuo Tomita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having improved contact hole structure, and me...
- Patent number 6,686,269
- Issue date Feb 3, 2004
- Renesas Technology Corp.
- Shigenori Sakamori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of etching
- Patent number 6,638,777
- Issue date Oct 28, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Shigenori Sakamori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having an improved contact structure and a man...
- Patent number 6,346,482
- Issue date Feb 12, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Junko Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having improved contact hole structure, and me...
- Patent number 6,340,844
- Issue date Jan 22, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Shigenori Sakamori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 6,232,209
- Issue date May 15, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Nobuo Fujiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing contact structure
- Patent number 6,156,639
- Issue date Dec 5, 2000
- Mitsubishi Denki Kabushiki Kaisha
- Tetsuhiro Fukao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,156,152
- Issue date Dec 5, 2000
- Mitsubishi Denki Kabushiki Kaisha
- Satoshi Ogino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 5,877,081
- Issue date Mar 2, 1999
- Mitsubishi Denki Kabushiki Kaisha
- Junko Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 5,668,052
- Issue date Sep 16, 1997
- Mitsubishi Denki Kabushiki Kaisha
- Junko Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Apparatus for and method of etching
- Publication number 20030082911
- Publication date May 1, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Shigenori Sakamori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and processing method using the same, a...
- Publication number 20020192971
- Publication date Dec 19, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Shigenori Sakamori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having improved contact hole structure, and me...
- Publication number 20020056921
- Publication date May 16, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Shigenori Sakamori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20010052319
- Publication date Dec 20, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Shigenori Sakamori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE HAVING AN IMPROVED CONTACT STRUCTURE AND A MAN...
- Publication number 20010041450
- Publication date Nov 15, 2001
- JUNKO MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS

Shigenori Sakamori

Person

Patents Grantslast 30 patents

Semiconductor device with conductive contact layer structure

Semiconductor device having improved contact hole structure, and me...

Apparatus for and method of etching

Semiconductor device having an improved contact structure and a man...

Semiconductor device having improved contact hole structure, and me...

Semiconductor device and manufacturing method thereof

Method for manufacturing contact structure

Plasma processing apparatus

Method of manufacturing semiconductor device

Method of manufacturing semiconductor device

Patents Applicationslast 30 patents

Apparatus for and method of etching

Plasma processing apparatus and processing method using the same, a...

Semiconductor device having improved contact hole structure, and me...

Plasma processing apparatus and plasma processing method

SEMICONDUCTOR DEVICE HAVING AN IMPROVED CONTACT STRUCTURE AND A MAN...