Shigeo Kimura

Person

Toyama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Cationically polymerizable resist underlayer film-forming composition
- Patent number 10,437,151
- Issue date Oct 8, 2019
- Nissan Chemical Industries, Ltd.
- Hiroto Ogata
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Light-degradable material, substrate, and method for patterning the...
- Patent number 9,822,330
- Issue date Nov 21, 2017
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method using resist underlayer film
- Patent number 9,793,131
- Issue date Oct 17, 2017
- Nissan Chemical Industries, Ltd.
- Tomoya Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition
- Patent number 9,534,140
- Issue date Jan 3, 2017
- Nissan Chemical Industries, Ltd.
- Tomoya Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organic silicon compound and silane coupling agent containing the same
- Patent number 9,340,561
- Issue date May 17, 2016
- Nissan Chemical Industries, Ltd.
- Makiko Umezaki
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Photosensitive organic particles
- Patent number 9,140,989
- Issue date Sep 22, 2015
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Monolayer or multilayer forming composition
- Patent number 9,023,583
- Issue date May 5, 2015
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive resist underlayer film forming composition
- Patent number 8,685,615
- Issue date Apr 1, 2014
- Nissan Chemical Industries, Ltd.
- Shigeo Kimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Anti-reflective coating forming composition containing vinyl ether...
- Patent number 8,501,393
- Issue date Aug 6, 2013
- Nissan Chemical Industries, Ltd.
- Tadashi Hatanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Anti-reflective coating forming composition containing polyamic acid
- Patent number 7,598,182
- Issue date Oct 6, 2009
- Nissan Chemical Industries, Ltd.
- Tadashi Hatanaka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Sulfonate-containing anti-reflective coating forming composition fo...
- Patent number 7,595,144
- Issue date Sep 29, 2009
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
CATIONICALLY POLYMERIZABLE RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20180081274
- Publication date Mar 22, 2018
- Nissan Chemical Industries, Ltd.
- Hiroto OGATA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN FORMING METHOD USING RESIST UNDERLAYER FILM
- Publication number 20160218013
- Publication date Jul 28, 2016
- Nissan Chemical Industries, Ltd.
- Tomoya OHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20150337164
- Publication date Nov 26, 2015
- Nissan Chemical Industries, Ltd.
- Tomoya OHASHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
LIGHT-DEGRADABLE MATERIAL, SUBSTRATE, AND METHOD FOR PATTERNING THE...
- Publication number 20150267159
- Publication date Sep 24, 2015
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Application
ORGANIC SILICON COMPOUND AND SILANE COUPLING AGENT CONTAINING THE SAME
- Publication number 20140370182
- Publication date Dec 18, 2014
- Nissan Chemical Industries, Ltd.
- Makiko Umezaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTOSENSITIVE ORGANIC PARTICLES
- Publication number 20140045119
- Publication date Feb 13, 2014
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MONOLAYER OR MULTILAYER FORMING COMPOSITION
- Publication number 20130216956
- Publication date Aug 22, 2013
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTOSENSITIVE RESIST UNDERLAYER FILM FORMING COMPOSITION
- Publication number 20110311915
- Publication date Dec 22, 2011
- Nissan Chemical Industries, Ltd.
- Shigeo Kimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Anti-Reflective Coating Forming Composition Containing Vinyl Ether...
- Publication number 20080138744
- Publication date Jun 12, 2008
- Nissan Chemical Industries, Ltd.
- Tadashi Hatanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Sulfonate-Containing Anti-Reflective Coating Forming Composition fo...
- Publication number 20080003524
- Publication date Jan 3, 2008
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polyamide acid-containing composition for forming antireflective film
- Publication number 20070004228
- Publication date Jan 4, 2007
- Nissan Chemical Industries, Ltd.
- Tadashi Hatanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Shigeo Kimura

Person

Patents Grantslast 30 patents

Cationically polymerizable resist underlayer film-forming composition

Light-degradable material, substrate, and method for patterning the...

Pattern forming method using resist underlayer film

Resist underlayer film-forming composition

Organic silicon compound and silane coupling agent containing the same

Photosensitive organic particles

Monolayer or multilayer forming composition

Photosensitive resist underlayer film forming composition

Anti-reflective coating forming composition containing vinyl ether...

Anti-reflective coating forming composition containing polyamic acid

Sulfonate-containing anti-reflective coating forming composition fo...

Patents Applicationslast 30 patents

CATIONICALLY POLYMERIZABLE RESIST UNDERLAYER FILM-FORMING COMPOSITION

PATTERN FORMING METHOD USING RESIST UNDERLAYER FILM

RESIST UNDERLAYER FILM-FORMING COMPOSITION

LIGHT-DEGRADABLE MATERIAL, SUBSTRATE, AND METHOD FOR PATTERNING THE...

ORGANIC SILICON COMPOUND AND SILANE COUPLING AGENT CONTAINING THE SAME

PHOTOSENSITIVE ORGANIC PARTICLES

MONOLAYER OR MULTILAYER FORMING COMPOSITION

PHOTOSENSITIVE RESIST UNDERLAYER FILM FORMING COMPOSITION

Anti-Reflective Coating Forming Composition Containing Vinyl Ether...

Sulfonate-Containing Anti-Reflective Coating Forming Composition fo...

Polyamide acid-containing composition for forming antireflective film